Dr. Sung-Woo Lee
R&D Engineer at Synopsys Korea Inc
SPIE Involvement:
Publications (18)

Proceedings Article | 1 October 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Nano opto mechanical systems, Image processing, Image quality, Design for manufacturing, Image enhancement, Optical proximity correction, Nanoimprint lithography, Neodymium, Optimization (mathematics), Resolution enhancement technologies

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Cadmium, Photomasks, Extreme ultraviolet, Transistors, Optical proximity correction, Critical dimension metrology, Model-based design, 193nm lithography

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Electronics, Image segmentation, Manufacturing, Electroluminescence, Inverse problems, Photomasks, Optical proximity correction, SRAF, Optimization (mathematics)

Proceedings Article | 29 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Calibration, Diffusion, Scanning electron microscopy, Photomasks, Cadmium sulfide, Optical proximity correction, SRAF, Critical dimension metrology, Performance modeling

Proceedings Article | 22 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Semiconductors, Lithography, Electronics, Cadmium, Scanners, 3D modeling, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers

Showing 5 of 18 publications
Conference Committee Involvement (4)
Alternative Lithographic Technologies III
1 March 2011 | San Jose, California, United States
Alternative Lithographic Technologies II
23 February 2010 | San Jose, California, United States
Alternative Lithographic Technologies
24 February 2009 | San Jose, California, United States
Emerging Lithographic Technologies XII
26 February 2008 | San Jose, California, United States
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