Sunyoung Koo
Technical Staff/Researcher at SK Hynix Inc
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 5 May 2017 Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Nanoimprint lithography, Photomasks, Stochastic processes, Diffraction, Extreme ultraviolet lithography, Optical lithography, Lithographic illumination, Scanners, Immersion lithography, Stray light, Extreme ultraviolet, Calibration, Fiber optic illuminators, Contamination

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Optical lithography, Nanoimprint lithography, Lithographic illumination, Source mask optimization, Resolution enhancement technologies, Line width roughness, Stochastic processes, Scanners, Photomasks, Semiconducting wafers, Lithography, Critical dimension metrology

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Extreme ultraviolet, Manufacturing, Neodymium, Nanoimprint lithography, Extreme ultraviolet lithography, Ions, Source mask optimization, Ultraviolet radiation, Line edge roughness, Optical lithography

Proceedings Article | 6 April 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Photomasks, Particles, Scanners, Extreme ultraviolet lithography, Semiconducting wafers, Pellicles, Extreme ultraviolet, Inspection, Reticles, Scanning electron microscopy

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Etching, Liquid phase epitaxy, Stochastic processes, Photomasks, Metrology, Critical dimension metrology, Printing, Scanning electron microscopy, Extreme ultraviolet, Error analysis

Showing 5 of 18 publications
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