This study involved installation of a real-time refractive index monitoring system into a simulated photoresist feed line as
would be used for delivery to a lithography tool. The goal was to determine whether this refractive index technology
could be used to differentiate among all possible photoresists that could potentially be delivered to a lithography tool and
resolve each one, separate from the others. The main intention is to use this technology to prevent the wrong photoresist
from being used. The use of the wrong photoresist could result in hundreds of thousands of dollars per year in wafers
scrapped in late stages of the process flow. A Swagelok(R) CR-288(R) concentration monitor, using refractive index (RI)
sensing, was installed into a simulated photoresist feed line to monitor and detect each one in real time. By integrating
the CR-288 concentration monitor into the lithographic process system, the capability for uniquely identifying and
resolving 10 out of 10 Deep Ultra Violet (DUV) photoresists was demonstrated, potentially leading to a large cost
avoidance and reduced cost of ownership.
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