Mr. Sven Glabisch Profile

Sven Glabisch

at RWTH Aachen University TOS

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 21 November 2024 Poster + Paper

Broadband reflective spectrometer for high-resolution spectral characterization of radiation sources

Ismael Gisch, Sophia Schröder, Sven Glabisch, Sascha Brose, Serhiy Danylyuk, Jochen Stollenwerk, Carlo Holly

Proceedings Volume 13215, 1321515 (2024) https://doi.org/10.1117/12.3034671

KEYWORDS: Spectroscopy, Reflection, Tunable filters, Optical filters, Diffraction gratings, Metrology, Infrared radiation, Diffraction, Calibration, CCD image sensors

Read Abstract +

Proceedings Article | 1 December 2022 Presentation + Paper

Investigation of stochastic roughness effects for nanoscale grating characterization with a stand-alone EUV spectrometer

Sven Glabisch, Sophia Schröder, Sascha Brose, Henning Heiming, Jochen Stollenwerk, Carlo Holly

Proceedings Volume 12293, 122930K (2022) https://doi.org/10.1117/12.2641625

KEYWORDS: Line edge roughness, Line width roughness, Reflectivity, Extreme ultraviolet, Diffraction gratings, Diffraction, Spectroscopy, Grazing incidence

Read Abstract +

Fast and non-destructive non-imaging metrology of nanostructures is crucial for the development of integrated circuits and for the corresponding in-situ metrology within fabrication processes. Stochastic variations related to the gratings local period (line edge roughness, LER) and line width (line width roughness, LWR) are of special interest due to their key role for the minimal achievable structure size. Non-imaging metrology approaches taking these statistic variations into account are quite limited. For scatterometry, models predict a change of the grating’s diffraction efficiency according to a DebyeWaller factor but only in the non-zeroth diffraction orders. The authors perform simulations of nanoscale gratings that suggest an influence of LER and LWR on the reflectance (zeroth diffraction order efficiency) which motivate an extended study on LER and LWR measured by spectrally resolved EUV reflectometry here described as EUV spectrometry. The authors present reconstruction results of nanoscale gratings measured with a compact spectrometer utilizing extreme ultraviolet (EUV) radiation emitted by a discharged-produced plasma (DPP) EUV source. The use of two sequential spectrographs, one for the reference measurement of the source spectrum, the other one for the measurement of the spectrum after sample interaction, combined within the experimental setup allows to measure the broadband reflectance with 2% relative uncertainty of samples under various grazing incidence angles. The method offers a proven sub-nm reconstruction accuracy for critical grating parameters. Within the presented study, the measured samples are dedicated test samples, fabricated to exhibit well-defined LER and LWR at different grating periods and linewidths. In addition, the samples are also cross-characterized by the Physikalisch-Technische Bundesanstalt (PTB, Berlin). Experimental and simulative results are discussed to derive approaches to include LER and LWR as parameters in the physical model for reconstruction.

Proceedings Article | 1 November 2022 Paper

High-precision optical constant characterization of materials in the EUV spectral range: from large research facilities to laboratory-based instruments

V. Soltwisch, S. Glabisch, A. Andrle, V. Philipsen, Q. Saadeh, S. Schröder, L. Lohr, R. Ciesielski, S. Brose

Proceedings Volume 12472, 124720Q (2022) https://doi.org/10.1117/12.2640176

KEYWORDS: Extreme ultraviolet, Scatterometry, Diffraction, Reflectivity, X-rays, Photomasks, Reflectometry, Scattering, Ruthenium, Optical components

Read Abstract +

SPIE Journal Paper | 20 April 2022 Open Access

Latent image characterization by spectroscopic reflectometry in the extreme ultraviolet

Sophia Schröder, Lukas Bahrenberg, Bernhard Lüttgenau, Sven Glabisch, Sascha Brose, Serhiy Danylyuk, Jochen Stollenwerk, Peter Loosen, Carlo Holly

JM3, Vol. 21, Issue 02, 021208, (April 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.021208

KEYWORDS: Extreme ultraviolet, Reflectance spectroscopy, Reflectivity, Extreme ultraviolet lithography, Spectroscopy, Reflectometry, Photoresist materials, Imaging spectroscopy, Grazing incidence, Image processing

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 22 February 2021 Poster + Paper

Broadband scatterometry at extreme ultraviolet wavelengths for nanograting characterization

Moein Ghafoori, Lukas Bahrenberg, Sven Glabisch, Sophia Schroeder, Serhiy Danylyuk, Sascha Brose, Jochen Stollenwerk, Larissa Juschkin, Peter Loosen

Proceedings Volume 11611, 116112F (2021) https://doi.org/10.1117/12.2584738

KEYWORDS: Scatterometry, Extreme ultraviolet, Diffraction, Metrology, Diffraction gratings, Nanostructures, Inspection, Grazing incidence, Statistical modeling, Spectroscopy

Read Abstract +

Proceedings Article | 22 February 2021 Presentation + Paper

Latent image characterization by spectroscopic reflectometry in the extreme ultraviolet

Sophia Schröder, Lukas Bahrenberg, Bernhard Lüttgenau, Sven Glabisch, Serhiy Danylyuk, Sascha Brose, Jochen Stollenwerk, Peter Loosen

Proceedings Volume 11611, 116111M (2021) https://doi.org/10.1117/12.2583830

KEYWORDS: Reflectance spectroscopy, Extreme ultraviolet, Photoresist materials, Reflectometry, Reflectivity, Spectroscopy, Imaging spectroscopy, Statistical modeling, Extreme ultraviolet lithography, Photoresist developing

Read Abstract +

Proceedings Article | 13 October 2020 Presentation + Paper

Accuracy analysis of a stand-alone EUV spectrometer for the characterization of ultrathin films and nanoscale gratings

Sophia Schröder, Lukas Bahrenberg, Nimet Kutay Eryilmaz, Sven Glabisch, Serhiy Danylyuk, Sascha Brose, Jochen Stollenwerk, Peter Loosen

Proceedings Volume 11517, 115170S (2020) https://doi.org/10.1117/12.2573148

KEYWORDS: Extreme ultraviolet, Spectroscopy, Reflectivity, Reflectance spectroscopy, Reflectometry, Optical components, Model-based design, Statistical modeling, Statistical analysis, Plasma

Read Abstract +

Proceedings Article | 20 March 2020 Paper

Nanoscale grating characterization through EUV spectroscopy aided by machine learning techniques

Lukas Bahrenberg, Sven Glabisch, Serhiy Danylyuk, Moein Ghafoori, Sophia Schröder, Sascha Brose, Jochen Stollenwerk, Peter Loosen

Proceedings Volume 11325, 113250X (2020) https://doi.org/10.1117/12.2550508

KEYWORDS: Extreme ultraviolet, Reflectivity, Diffraction gratings, Diffraction, Databases, Spectroscopy, Neural networks, Silica, Chromium, Machine learning

Read Abstract +

Proceedings Article | 26 September 2019 Paper

Laboratory-based EUV spectroscopy for the characterization of thin films, membranes and nanostructured surfaces

Lukas Bahrenberg, Sven Glabisch, Moein Ghafoori, Sascha Brose, Serhiy Danylyuk, Jochen Stollenwerk, Peter Loosen

Proceedings Volume 11147, 111471X (2019) https://doi.org/10.1117/12.2536884

KEYWORDS: Extreme ultraviolet, Spectroscopy, Reflectivity, Thin films, Extreme ultraviolet lithography, Interfaces, Metrology, Transmittance, Pellicles, Reflectance spectroscopy

Read Abstract +

Proceedings Article | 26 March 2019 Paper

Spectroscopic reflectometry in the extreme ultraviolet for critical dimension metrology

Lukas Bahrenberg, Serhiy Danylyuk, Robert Michels, Sven Glabisch, Moein Ghafoori, Sascha Brose, Jochen Stollenwerk, Peter Loosen

Proceedings Volume 10959, 109591X (2019) https://doi.org/10.1117/12.2513173

KEYWORDS: Reflectivity, Extreme ultraviolet, Reflectance spectroscopy, Metrology, Critical dimension metrology, Spectroscopy, Reflectometry, Grazing incidence, Scanning electron microscopy, Scatterometry

Read Abstract +

Showing 5 of 10 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years