Mr. Syed A. Rizvi Profile

Syed A. Rizvi

Retired

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Author

Publications (8)

Proceedings Article | 1 July 2002 Paper

Lithography: a historical perspective and shape of things to come

Syed Rizvi

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472355

KEYWORDS: Molecules, Lithography, Electrons, Semiconductors, Chemical species, Quantum dots, Silicon, Particles, Crystals, Photomasks

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Proceedings Article | 14 June 1999 Paper

Atomic force microscopy: a diagnostic tool (in) for mask making in the coming years

Syed Rizvi, A. Meyyappan

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350861

KEYWORDS: Mask making, Diagnostics, Atomic force microscopy, Surface roughness, Atomic force microscope, Image quality, Manufacturing, Phase shifts, Silicon, Semiconducting wafers

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Proceedings Article | 14 June 1999 Paper

2001 and beyond: a challenge for metrology

Syed Rizvi

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350845

KEYWORDS: Tolerancing, Calibration, Error analysis, Metrology, Fourier transforms, Critical dimension metrology, Reticles, Cadmium, Statistical analysis, Wavelets

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Proceedings Article | 18 December 1998 Paper

The AIMS tool: its potentials, applications, and issues

Syed Rizvi, Nathan Diachun

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332851

KEYWORDS: Semiconducting wafers, Reticles, Image quality, Photomasks, Metrology, Calibration, Optics manufacturing, Tolerancing, Wafer-level optics, Manufacturing

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Proceedings Article | 1 September 1998 Paper

Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography

John Petersen, Robert Socha, Alex Naderi, Catherine Baker, Syed Rizvi, Douglas Van Den Broeke, Nishrin Kachwala, J. Fung Chen, Thomas Laidig, Kurt Wampler, Roger Caldwell, Susumu Takeuchi, Yoshiro Yamada, Takashi Senoh, Martin McCallum

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328861

KEYWORDS: Etching, Optical proximity correction, Diffraction, Photomasks, Reticles, Phase shifts, Quartz, Anisotropic etching, Lithography, Phase measurement

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Proceedings Article | 5 June 1998 Paper

National technology roadmap for semiconductors: an analysis and perspective

Syed Rizvi

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309572

KEYWORDS: Lithography, Overlay metrology, Photomasks, Semiconducting wafers, Tolerancing, Semiconductors, Manufacturing, Critical dimension metrology, Distortion, Manufacturing equipment

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Proceedings Article | 14 August 1997 Paper

Analyzing the tolerance and controls on critical dimensions and overlays as prescribed by the National Technology Roadmap for Semiconductors

Syed Rizvi

Proceedings Volume 3183, (1997) https://doi.org/10.1117/12.280543

KEYWORDS: Overlay metrology, Tolerancing, Control systems, Semiconductors, Metrology, Critical dimension metrology

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Proceedings Article | 12 February 1997 Paper

Measuring critical dimensions and overlays as prescribed by the National Technology Roadmap for Semiconductors

Syed Rizvi

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.284025

KEYWORDS: Overlay metrology, Metrology, Critical dimension metrology, Precision measurement, Cadmium, Cesium, Chromium, Semiconductors, Tolerancing, Promethium

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Showing 5 of 8 publications

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