Dr. Sylvia Pas
Photomask Technologist
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Photomasks, Ions, Inspection, Reticles, Raman spectroscopy, Crystals, Contamination, Chemical analysis, Fluorine, Lithography

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Photomasks, Reticles, Inspection, Lithography, Semiconducting wafers, Data modeling, Failure analysis, Statistical analysis, 193nm lithography, Crystals

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Photomasks, Ions, Reticles, Contamination, Inspection, Crystals, Chemical analysis, Fluorine, Air contamination, Manufacturing

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