Mr. Tadahito Fujisawa Profile

Tadahito Fujisawa

at Toshiba Corp

SPIE Involvement:

Author

Publications (12)

SPIE Journal Paper | 1 April 2004

Novel in-situ focus monitor technology in attenuated phase shift mask under actual illumination conditions

Kyoko Izuha, Masafumi Asano, Tadahito Fujisawa, Soichi Inoue

JM3, Vol. 3, Issue 02, (April 2004) https://doi.org/10.1117/12.10.1117/1.1669541

KEYWORDS: Photomasks, Transmittance, Semiconducting wafers, Phase shifts, Optical testing, Data conversion, Phase shifting, Wafer-level optics, Reticles, Critical dimension metrology

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Proceedings Article | 26 June 2003 Paper

Desirable wafer edge flatness for CD control in photolithography

Tadahito Fujisawa, Soichi Inoue, Tsuneyuki Hagiwara, Kodama Kennichi, Makoto Kobayashi, Katsuya Okumura

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485522

KEYWORDS: Semiconducting wafers, Optical lithography, Tolerancing, Scanners, Semiconductors, Critical dimension metrology, Lithography, Error analysis, Shape analysis, Finite element methods

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Proceedings Article | 26 June 2003 Paper

Novel in-situ focus monitor technology in attenuated PSM under actual illumination condition

Kyoko Izuha, Masafumi Asano, Tadahito Fujisawa, Soichi Inoue

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485364

KEYWORDS: Photomasks, Semiconducting wafers, Transmittance, Phase shifting, Reticles, Phase shifts, Critical dimension metrology, Calibration, Optical lithography, Illumination engineering

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Proceedings Article | 2 June 2003 Paper

Run-to-run CD error analysis and control with monitoring of effective dose and focus

Masafumi Asano, Tadahito Fujisawa, Kyoko Izuha, Soichi Inoue

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.482807

KEYWORDS: Critical dimension metrology, Reticles, Error analysis, Semiconducting wafers, Error control coding, Monte Carlo methods, Control systems, Optical lithography, Metrology, Etching

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SPIE Journal Paper | 1 April 2003

Effective exposure-dose monitor technique for critical dimension control in optical lithography

Masafumi Asano, Kyoko Izuha, Tadahito Fujisawa, Soichi Inoue

JM3, Vol. 2, Issue 02, (April 2003) https://doi.org/10.1117/12.10.1117/1.1564594

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Reticles, Photoresist processing, Optical lithography, Lithography, Metrology, Error analysis, Control systems, Optical testing

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Proceedings Article | 30 July 2002 Paper

Wafer flatness for CD control in photolithography

Tadahito Fujisawa, Masafumi Asano, T. Sutani, Soichi Inoue, Hiroaki Yamada, Junji Sugamoto, Katsuya Okumura, Tsuneyuki Hagiwara, Satoshi Oka

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474630

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Optical lithography, Scanners, Adsorption, Lithography, Error analysis, Surface finishing, Semiconductors, Polishing

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Proceedings Article | 30 July 2002 Paper

CD control with effective exposure dose monitor technique in photolithography

Masafumi Asano, Kyoko Izuha, Tadahito Fujisawa, Soichi Inoue

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474577

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Reticles, Photoresist processing, Optical lithography, Control systems, Scanners, Metrology, Lithography, Optical testing

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SPIE Journal Paper | 1 October 2001

Effective exposure dose measurement technologies: multitone flood exposure by unresolved gratings with multilevel opening ratio

Soichi Inoue, Tadahito Fujisawa, Kyoko Izuha

OE, Vol. 40, Issue 10, (October 2001) https://doi.org/10.1117/12.10.1117/1.1403737

KEYWORDS: Semiconducting wafers, Photoresist materials, Calibration, Photomasks, Diffraction, Floods, Image processing, Silicon, Optical lithography, Photoresist developing

Proceedings Article | 2 June 2000 Paper

Effective exposure-dose measurement in optical microlithography

Soichi Inoue, Tadahito Fujisawa, Kyoko Izuha

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386445

KEYWORDS: Semiconducting wafers, Photoresist materials, Photomasks, Calibration, Optical lithography, Image processing, Optical testing, Diffraction, Lithography, Photoresist developing

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Proceedings Article | 26 July 1999 Paper

Measurement of effective source shift using a grating-pinhole mask

Kazuya Sato, Satoshi Tanaka, Tadahito Fujisawa, Soichi Inoue

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354402

KEYWORDS: Photomasks, Semiconducting wafers, Diffraction, Diffraction gratings, Projection systems, Photoresist materials, Phase shifts, Lithographic illumination, Optical design, Optical microscopes

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Proceedings Article | 26 May 1995 Paper

Automatic optical proximity correction with optimization of stepper condition

Soichi Inoue, Tadahito Fujisawa, Satoshi Tanaka, Shoji Mimotogi, Akiko Nikki, Ichiro Mori

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209255

KEYWORDS: Optical proximity correction, Annealing, Photomasks, Optimization (mathematics), Algorithms, Phase shifting, Monte Carlo methods, Projection systems, Semiconductor manufacturing, Integrated optics

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Proceedings Article | 8 August 1993 Paper

Phase-contrast lithography

Soichi Inoue, Tadahito Fujisawa, Satoshi Tanaka, Shuichi Tamamushi, Yoji Ogawa, Makoto Nakase

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150449

KEYWORDS: Phase modulation, Lithography, Phase shift keying, Photomasks, Phase contrast, Lithographic illumination, Solids, Modulation, Projection systems, Halftones

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Showing 5 of 12 publications

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