Tadao Yasuzato
Engineer at Micron Memory Japan Inc
SPIE Involvement:
Publications (10)

Proceedings Article | 14 September 2001 Paper
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Photomasks, Critical dimension metrology, Lithography, Scanners, Semiconducting wafers, Monochromatic aberrations, Electroluminescence, Binary data, Control systems, Inspection

Proceedings Article | 25 August 1999 Paper
Proc. SPIE. 3748, Photomask and X-Ray Mask Technology VI
KEYWORDS: Photomasks, Etching, Phase shifts, Lithography, Quartz, Critical dimension metrology, Binary data, Destructive interference, Light scattering, Mask making

Proceedings Article | 1 September 1998 Paper
Proc. SPIE. 3412, Photomask and X-Ray Mask Technology V
KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Critical dimension metrology, Lithography, Dry etching, Excimer lasers, Defect detection, Photography, Manufacturing

Proceedings Article | 28 July 1997 Paper
Proc. SPIE. 3096, Photomask and X-Ray Mask Technology IV
KEYWORDS: Scattering, Photomasks, Phase shifts, Quartz, Excimer lasers, Semiconducting wafers, Lithographic illumination, Lithography, Etching, Light scattering

Proceedings Article | 7 July 1997 Paper
Proc. SPIE. 3051, Optical Microlithography X
KEYWORDS: Optical proximity correction, Photomasks, Lithography, Phase shifts, Excimer lasers, Monochromatic aberrations

Showing 5 of 10 publications
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