Mr. Tadashi Matsuo Profile

Tadashi Matsuo

Assistant Chief Researcher at Toppan Printing Co Ltd

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 11 May 2009 Paper

Novel absorber materials for EUV lithography mask

Tadashi Matsuo, Koichiro Kanayama, Yasuhiro Okumoto

Proceedings Volume 7379, 73792G (2009) https://doi.org/10.1117/12.824330

KEYWORDS: Extreme ultraviolet, Reflectivity, Photomasks, Ruthenium, Etching, Binary data, Phase shifts, Deep ultraviolet, Extreme ultraviolet lithography, Coating

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Proceedings Article | 20 October 2006 Paper

Evaluation of bi-layer TaSix absorber on buffer for EUV mask

Koichiro Kanayama, Shinpei Tamura, Yasushi Nishiyama, Masashi Kawashita, Tadashi Matsuo, Akira Tamura, Susumu Nagashige, Kenji Hiruma, Doohoon Goo, Iwao Nishiyama

Proceedings Volume 6349, 63493A (2006) https://doi.org/10.1117/12.686388

KEYWORDS: Extreme ultraviolet, Gallium, Printing, Photomasks, Atomic force microscopy, Reflectivity, Silicon, Etching, Transparency, Inspection

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Proceedings Article | 20 May 2006 Paper

Optimization of TaSix absorber stack for EUV mask

Shinpei Tamura, Koichiro Kanayama, Yasushi Nishiyama, Tadashi Matsuo, Akira Tamura

Proceedings Volume 6283, 62830J (2006) https://doi.org/10.1117/12.681842

KEYWORDS: Extreme ultraviolet, Silicon, Reflectivity, Radium, Inspection, Tantalum, Refractive index, Photomasks, Optical properties, Etching

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Proceedings Article | 5 September 2001 Paper

ZrSiON as a material for high-transmittance attenuated PSM

Koichiro Kanayama, Takashi Haraguchi, Tsukasa Yamazaki, Toshihiro Ii, Tadashi Matsuo, Nobuhiko Fukuhara, Tadashi Saga, Yusuke Hattori, Takashi Ooshima, Masao Otaki

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438336

KEYWORDS: Transmittance, Chromium, Lithography, Phase shifts, Inspection, Atrial fibrillation, Etching, Resolution enhancement technologies, Silicon, Sputter deposition

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Proceedings Article | 22 January 2001 Paper

Realization of mass production for 130-nm node and future applicatiton for high transmission using ZrSi-based attenuated phase-shift mask in ArF lithography

Toshihiro Ii, Tadashi Saga, Yusuke Hattori, Takashi Ohshima, Masao Otaki, Masahide Iwakata, Takashi Haraguchi, Koichiro Kanayama, Tsukasa Yamazaki, Nobuhiko Fukuhara, Tadashi Matsuo

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410706

KEYWORDS: Transmittance, Phase shifts, Photomasks, Lithography, Atrial fibrillation, Inspection, Etching, Dry etching, Defect inspection, Resistance

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Proceedings Article | 22 January 2001 Paper

Materials for an attenuated phase-shifting mask in 157-nm lithography

Takahiro Matsuo, Toshio Onodera, Toshiro Itani, Hiroaki Morimoto, Takashi Haraguchi, Koichiro Kanayama, Tadashi Matsuo, Masao Otaki

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410703

KEYWORDS: Transmittance, Chromium, Laser irradiation, Atrial fibrillation, Vacuum ultraviolet, Phase shifts, Photomasks, Lithography, Defect inspection, Quartz

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Proceedings Article | 30 December 1999 Paper

Development of ZrSiO attenuated phase-shift mask for ArF excimer laser lithography

Nobuhiko Fukuhara, Takashi Haraguchi, Koichiro Kanayama, Tadashi Matsuo, Susumu Takeuchi, Kozue Tomiyama, Tadashi Saga, Yusuke Hattori, Takashi Ooshima, Masao Otaki

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373291

KEYWORDS: Reflectivity, Transmittance, Photomasks, Phase shifts, Inspection, Dry etching, Excimer lasers, Lithography, Etching, Sputter deposition

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Proceedings Article | 30 December 1999 Paper

ZrSiO: a new and robust material for attenuated phase-shift mask in ArF lithography

Toshio Onodera, Takahiro Matsuo, Keisuke Nakazawa, Junji Miyazaki, Tohru Ogawa, Hiroaki Morimoto, Takashi Haraguchi, Nobuhiko Fukuhara, Tadashi Matsuo, Masao Otaki, Susumu Takeuchi

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373329

KEYWORDS: Lithographic illumination, Resolution enhancement technologies, Photomasks, Lithography, Reticles, Transmittance, Critical dimension metrology, Silicon films, Semiconducting wafers, Oxygen

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