Dr. Tae-Gon Kim Profile

Dr. Tae-Gon Kim

Senior Metrology Researcher at imec

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Publications (5)

Proceedings Article | 29 March 2011 Paper

Influence of environments on the footprint of particle contamination on EUV mask

Tae-Gon Kim, Els Kesters, Herbert Struyf, Paul Mertens, Stefan De Gendt, Marc Heyns

Proceedings Volume 7969, 79690L (2011) https://doi.org/10.1117/12.881608

KEYWORDS: Particles, Silica, Humidity, Extreme ultraviolet, Atomic force microscopy, Silicon, Semiconducting wafers, Photomasks, Extreme ultraviolet lithography, Neodymium

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Proceedings Article | 21 March 2008 Paper

The study of attenuated PSM structure for extreme ultraviolet lithography with minimized mask shadowing effect

Chang Young Jeong, Byung Hun Kim, Tae Geun Kim, Sangsul Lee, Eun Jin Kim, Hye-Keun Oh, In-Sung Park, Jinho Ahn

Proceedings Volume 6921, 69213Q (2008) https://doi.org/10.1117/12.772533

KEYWORDS: Reflectivity, Photomasks, Critical dimension metrology, Binary data, Phase shifts, Extreme ultraviolet lithography, Molybdenum, Extreme ultraviolet, Deep ultraviolet, Image processing

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Proceedings Article | 23 March 2006 Paper

Combined absorber stack for optimization of the EUVL mask

Seung Lee, Tae Kim, Chung Kim, In-Yong Kang, Yong-Chae Chung, Jinho Ahn

Proceedings Volume 6151, 61511Y (2006) https://doi.org/10.1117/12.656928

KEYWORDS: Reflectivity, Deep ultraviolet, Extreme ultraviolet, Aluminum, Ruthenium, Extreme ultraviolet lithography, Photomasks, Etching, Optical simulations, Inspection

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SPIE Journal Paper | 1 August 2004

Experiments of depth detection and image recovery of a remote target using a complex hologram

Tae-Geun Kim, Ting-Chung Poon

OE, Vol. 43, Issue 08, (August 2004) https://doi.org/10.1117/12.10.1117/1.1764574

KEYWORDS: Holograms, Image restoration, Target detection, 3D acquisition, Remote sensing, Holography, Digital holography, 3D image reconstruction, Target recognition, 3D image processing

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Proceedings Article | 27 May 1996 Paper

Formation of submicrometer current-blocking layer for high-power GaAs/AlGaAs quantum wire array laser

Tae-Geun Kim, Sung Min Hwang, Seong-Il Kim, Chang-Sik Son, Eun Kim, Suk-Ki Min, Jung-Ho Park, Kyung Hyun Park

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240497

KEYWORDS: Gallium arsenide, Photoresist materials, Quantum wells, Photomasks, Semiconductor lasers, Metalorganic chemical vapor deposition, High power lasers, Floods, Photoresist developing, Submicron lithography

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