Dr. Tae-Gon Kim
Senior Metrology Researcher at imec
SPIE Involvement:
Publications (5)

Proceedings Article | 29 March 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Silica, Particles, Silicon, Atomic force microscopy, Humidity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Semiconducting wafers

Proceedings Article | 21 March 2008 Paper
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Deep ultraviolet, Image processing, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Molybdenum, Binary data, Phase shifts

Proceedings Article | 23 March 2006 Paper
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Deep ultraviolet, Etching, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Aluminum, Optical simulations, Extreme ultraviolet lithography, Ruthenium

SPIE Journal Paper | 1 August 2004
OE Vol. 43 Issue 08
KEYWORDS: Holograms, Image restoration, Target detection, 3D acquisition, Remote sensing, Holography, Digital holography, 3D image reconstruction, Target recognition, 3D image processing

Proceedings Article | 27 May 1996 Paper
Proc. SPIE. 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI
KEYWORDS: Quantum wells, High power lasers, Gallium arsenide, Semiconductor lasers, Photoresist materials, Photomasks, Metalorganic chemical vapor deposition, Submicron lithography, Photoresist developing, Floods

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