Tae-Seung Eom
Principal Engineer at SK Hynix Inc
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Optical lithography, Scanners, Manufacturing, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Overlay metrology

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Optical lithography, Data modeling, Control systems, Distortion, Process control, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Diffraction, Optical lithography, Polarization, Scanners, Chromium, Transmittance, Photomasks, Nanoimprint lithography, Binary data

Proceedings Article | 18 March 2009 Paper
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Optical lithography, Deep ultraviolet, Scanners, Silicon, Laser scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 18 March 2009 Paper
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Optical lithography, Etching, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Immersion lithography, Critical dimension metrology

Showing 5 of 21 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top