Mr. Tae-Yong Lee Profile

Tae-Yong Lee

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 24 March 2009 Paper

Development of a novel methodology for effective partial die inspection and monitoring

Byoung-Ho Lee, Tae-Yong Lee, Andrew Cross, Masami Aoki, HeungSoo Choi, YeonHo Pae

Proceedings Volume 7272, 72723K (2009) https://doi.org/10.1117/12.813994

KEYWORDS: Inspection, Semiconducting wafers, Yield improvement, Defect inspection, Wafer inspection, Reticles, Signal processing, Electronics, Semiconductors, Contamination

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Proceedings Article | 16 April 2008 Paper

AWV: high-throughput cross-array cross-wafer variation mapping

Jeong-Ho Yeo, Byoung-Ho Lee, Tae-Yong Lee, Gadi Greenberg, Doron Meshulach, Erez Ravid, Shimon Levi, Kobi Kan, Saar Shabtay, Yehuda Cohen, Ofer Rotlevi

Proceedings Volume 6922, 69221S (2008) https://doi.org/10.1117/12.772402

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Finite element methods, Polarization, Inspection, Deep ultraviolet, Reflectivity, Wafer inspection, Etching, Computer simulations

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Proceedings Article | 24 March 2006 Paper

Study of critical dimension and overlay measurement methodology using SEM image analysis for process control

Tae Yong Lee, Byoung Ho Lee, Soo Bok Chin, Young Sun Cho, Jun Sik Hong, Jong Seo Hong, Chang Lyong Song

Proceedings Volume 6152, 61522E (2006) https://doi.org/10.1117/12.656736

KEYWORDS: Semiconducting wafers, Wafer-level optics, Overlay metrology, Scanning electron microscopy, Process control, Image processing, Semiconductors, Lithography, Optical testing, Metrology

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Proceedings Article | 10 May 2005 Paper

Characterization analysis study of µ-bridge defect using simulation and wafer inspection tools

Tae-yong Lee, Byoung-ho Lee, Soo-bok Chin, Do-hyun Cho, Chang-lyong Song, Jorge Fernandez, Domingo Choi, Luca Grella

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.596473

KEYWORDS: Wafer inspection, Inspection, Monte Carlo methods, Wafer-level optics, Capacitors, Defect detection, Semiconducting wafers, Semiconductors, Scattering, Interference (communication)

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Proceedings Article | 10 May 2005 Paper

Experimental study of contact edge roughness on sub-100 nm various circular shapes

Tae Lee, Dongchul Ihm, Hyo Kang, Jum Lee, Byoung Lee, Soo Chin, Do Cho, Chang Song

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.597948

KEYWORDS: Semiconducting wafers, Edge roughness, Critical dimension metrology, Line edge roughness, Distortion, Line width roughness, Metrology, Semiconductors, Image analysis, Image filtering

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Proceedings Article | 10 May 2005 Paper

Methodology and mechanism study on high aspect ratio (HAR) contact bottom image in scanning electron microscopy

H. Kang, J. Lim, J. Choi, T. Lee, B. Lee, S. Chin, D. Cho

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.596832

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Image quality, Sensors, Critical dimension metrology, Electron microscopes, Electron transport, Image analysis, Control systems, Electronics

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Proceedings Article | 24 May 2004 Paper

Electrical defect SEM review under the various electric circumstances on SAC layer

Tae Yong Lee, Nam-Koong Whan, Byoung Ho Lee, Soo-Bok Chin, Do Hyun Cho, Jong Il Choi, Seo Shik Hur, Ki Hwa Ko, Jeong-Ho Yeo

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534494

KEYWORDS: Inspection, Scanning electron microscopy, Semiconducting wafers, Image quality, Semiconductors, Defect inspection, Image resolution, Holmium, Defect detection, Optical inspection

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Proceedings Article | 24 May 2004 Paper

Experimental methodology of contact edge roughness on sub-100-nm pattern

Tae Yong Lee, Dongchul Ihm, Hyo Chun Kang, Jun Bum Lee, Byoung-Ho Lee, Soo-Bok Chin, Do-Hyun Cho, Yang Hyong Kim, Ho Dong Yang, Kyoung Mo Yang

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534496

KEYWORDS: Semiconducting wafers, Edge roughness, Line width roughness, Line edge roughness, Semiconductors, Critical dimension metrology, Distortion, Metrology, Optical lithography, Holmium

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Showing 5 of 8 publications

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