Mr. Taian Fan Profile

Taian Fan

Research Engineer at Institute of Microelectronics CAS

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Author

Publications (14)

Proceedings Article | 10 April 2024 Poster + Paper

A new stochastic EUV resist model based on a modified minimal process algorithm

Jing Xue, Guangjian He, Taian Fan, Yun Wang, Tianchun Ye, Yayi Wei

Proceedings Volume 12953, 1295314 (2024) https://doi.org/10.1117/12.3010234

KEYWORDS: Stochastic processes, Systems modeling, Diffusion, Monte Carlo methods, Photoresist materials, Computer simulations, Molecules, Extreme ultraviolet, Photoresist processing, Particles

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Proceedings Article | 28 April 2023 Paper

Probability model of bridging defects for random logic via in 3nm double patterning technology at 0.33 NA

Xiaojing Su, Jingjing Li, Taian Fan, Jiashuo Wang, Lisong Dong, Yajuan Su, Yayi Wei

Proceedings Volume 12495, 124950C (2023) https://doi.org/10.1117/12.2658126

KEYWORDS: Double patterning technology, Optical lithography, Extreme ultraviolet, Logic, Critical dimension metrology, Source mask optimization, Overlay metrology, Design and modelling

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SPIE Journal Paper | 20 December 2022

Mitigating the forbidden pitch of extreme ultraviolet lithography using mask optimization based on genetic algorithm

Ling Ma, Lisong Dong, Taian Fan, Xu Ma, Yayi Wei

JM3, Vol. 21, Issue 04, 043204, (December 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.043204

KEYWORDS: Source mask optimization, Extreme ultraviolet lithography, Diffraction, Nanoimprint lithography, Lithography, Genetic algorithms, Mathematical optimization, Extreme ultraviolet, Lithographic illumination, Incident light

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Proceedings Article | 26 May 2022 Poster + Presentation + Paper

Optimization of the EUV mask structures for mitigating the forbidden pitch in 5nm node

Ling Ma, Lisong Dong, Taian Fan, Yayi Wei

Proceedings Volume 12052, 1205214 (2022) https://doi.org/10.1117/12.2622286

KEYWORDS: Photomasks, Diffraction, Nanoimprint lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Lithographic illumination, Lithography, Metals, Source mask optimization, Molybdenum

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Proceedings Article | 26 May 2022 Poster + Presentation + Paper

Source optimization for forbidden pitch resolving in metal layer of 5nm technology node

Ling Ma, Lisong Dong, Taian Fan, Yayi Wei

Proceedings Volume 12052, 1205218 (2022) https://doi.org/10.1117/12.2614008

KEYWORDS: Nanoimprint lithography, Extreme ultraviolet lithography, Lithography, Deep ultraviolet, Lithographic illumination, Metals, Photomasks, Extreme ultraviolet, SRAF, Image quality

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SPIE Journal Paper | 3 November 2021

Rigorous EUV absorber model for the mask modeling with deep learning techniques

Pengpeng Yuan, Peng Xu, Taian Fan, Yayi Wei

JM3, Vol. 20, Issue 04, 041207, (November 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041207

KEYWORDS: Near field, Extreme ultraviolet, Photomasks, 3D modeling, Gallium nitride, Finite element methods, Process modeling, Data modeling, Near field optics, Electronic filtering

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Proceedings Article | 20 September 2020 Poster + Paper

Analysis and mitigation of forbidden pitch effects for EUV lithography

Ling Ma, Lisong Dong, Taian Fan, Xiaojing Su, Jianfang He, Ruixuan Wu, Yumei Zhou, Yayi Wei

Proceedings Volume 11517, 115171B (2020) https://doi.org/10.1117/12.2573145

KEYWORDS: Extreme ultraviolet lithography, Lithography, Nanoimprint lithography, Computational lithography, Source mask optimization, Deep ultraviolet, Manufacturing, Photomasks, Optimization (mathematics)

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Proceedings Article | 23 March 2020 Paper

Impact of flare on source mask optimization in EUVL for 7nm technology node

Lisong Dong, Rui Chen, Taian Fan, Rongbo Zhao, Yayi Wei, Jianjun Jia, Zac Levinson, Thuc Dam, Jay Lee, Yongdong Wang, Larry Melvin

Proceedings Volume 11323, 113232E (2020) https://doi.org/10.1117/12.2552008

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, Lithography, Extreme ultraviolet, Electroluminescence, Reflectivity, Critical dimension metrology, Light scattering

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Proceedings Article | 23 March 2020 Paper

Compressive sensing method for EUV source optimization using different bases

Jiaxin Lin, Lisong Dong, Taian Fan, Xu Ma, Rui Chen, Xiaoran Zhang, Hans-Juergen Stock, Yayi Wei

Proceedings Volume 11323, 113232J (2020) https://doi.org/10.1117/12.2551897

KEYWORDS: Extreme ultraviolet, Compressed sensing, Extreme ultraviolet lithography, Computer simulations

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Proceedings Article | 26 September 2019 Paper

Impact of EUV multilayer mask defects on imaging performance and its correction methods

Yunyun Hao, Lisong Dong, Xi Chen, Rui Chen, Taian Fan, Yayi Wei, Tianchun Ye

Proceedings Volume 11147, 111471B (2019) https://doi.org/10.1117/12.2536707

KEYWORDS: Photomasks, Extreme ultraviolet, Lithography, Deep ultraviolet, Reflectivity, Manufacturing, Polishing, Plasma etching, Optical proximity correction, Extreme ultraviolet lithography

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SPIE Journal Paper | 30 May 2019

Probability prediction model for bridging defects induced by combined influences from lithography and etch variations

Xiaojing Su, Dong Shen, Yayi Wei, Taian Fan, Lisong Dong, Libin Zhang, Yajuan Su, Rui Chen, Tianchun Ye

JM3, Vol. 18, Issue 02, 023503, (May 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.2.023503

KEYWORDS: Line edge roughness, Failure analysis, Bridges, Etching, Lithography, Probability theory, Overlay metrology, Photomasks, Metals, Optical proximity correction

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SPIE Journal Paper | 20 December 2018

Optimized parameters selected on the basis of the development defect model

Ling Ma, Buqing Xu, Qiang Wu, Lisong Dong, Taian Fan, Yuntao Jiang, Yayi Wei

JM3, Vol. 17, Issue 04, 043508, (December 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.043508

KEYWORDS: Semiconducting wafers, Lithography, Nitrogen, Photoresist materials, Particles, Microelectronics, Computer simulations, Fluctuations and noise, Semiconductor manufacturing, Polymers

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Proceedings Article | 3 October 2018 Paper

Optimization of absorber and multilayer in EUV mask for 1D and 2D patterns

Zhizhen Yang, Taian Fan, Lisong Dong, Yayi Wei, Yanrong Wang, Jing Zhang, Jiang Yan

Proceedings Volume 10809, 1080919 (2018) https://doi.org/10.1117/12.2501463

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Image resolution, Image quality, Light sources, Lithographic illumination, 3D modeling

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Proceedings Article | 16 October 2017 Paper

Applications of RCWA on EUV mask optics

Taian Fan, Lisong Dong, Yayi Wei

Proceedings Volume 10450, 104501X (2017) https://doi.org/10.1117/12.2280445

KEYWORDS: Photomasks, Extreme ultraviolet, Near field, Diffraction, 3D modeling, EUV optics, Spatial frequencies

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Showing 5 of 14 publications

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