Dr. Takahiro Ikeda Profile

Dr. Takahiro Ikeda

CEO at Pi Photonics

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Author

Publications (9)

SPIE Journal Paper | 1 November 2005

Erythrocyte structure and dynamics quantified by Hilbert phase microscopy

Gabriel Popescu, Takahiro Ikeda, Catherine Best, Kamran Badizadegan, Ramachandra Dasari, Michael Feld

JBO Vol. 10 Issue 06

KEYWORDS: Microscopy, High power microwaves, Blood, Microscopes, Photonics, Phase measurement, Refractive index, Collimation, Charge-coupled devices, Spectroscopy

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Proceedings Article | 1 September 2005 Paper

Nanometer fluctuations of erythrocytes imaged by Hilbert phase microscopy

Gabriel Popescu, Takahiro Ikeda, Kamran Badizadegan, Ramachandra Dasari, Michael Feld

Proc. SPIE. 5864, Novel Optical Instrumentation for Biomedical Applications II

KEYWORDS: Microscopes, Beam splitters, Blood, Microscopy, Imaging spectroscopy, Atomic force microscopy, Objectives, Charge-coupled devices, High power microwaves, Phase shifts

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Proceedings Article | 20 August 2004 Paper

A photomask defect evaluation system

Eiji Yamanaka, Shingo Kanamitsu, Takashi Hirano, Satoshi Tanaka, Takahiro Ikeda, Osamu Ikenaga, Tsukasa Kawashima, Syogo Narukawa, Hideaki Kobayashi

Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI

KEYWORDS: Lithography, Defect detection, Manufacturing, Inspection, Image resolution, Scanning electron microscopy, Photomasks, Data conversion, Semiconducting wafers, Standards development

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Proceedings Article | 20 August 2004 Paper

Tolerance-based process proximity correction (PPC) verification methodology

Kohji Hashimoto, Hiroharu Fujise, Shigeki Nojima, Takeshi Ito, Takahiro Ikeda

Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI

KEYWORDS: Lithography, Optical lithography, Metals, Image processing, Manufacturing, Feature extraction, Scanning electron microscopy, Optical proximity correction, Computer aided design, Tolerancing

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Proceedings Article | 24 May 2004 Paper

Measurement precision of CD-SEM for 65-nm technology node

Hideaki Abe, Hiroshi Motoki, Takahiro Ikeda, Yuichiro Yamazaki

Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII

KEYWORDS: Semiconductors, Pattern recognition, Error analysis, Quality measurement, Scanning electron microscopy, Image quality, Critical dimension metrology, Neodymium, Semiconducting wafers, Factor analysis

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Proceedings Article | 17 December 2003 Paper

Fine pixel CD-SEM for measurements of two-dimensional patterns

Shinji Yamaguchi, Masamitsu Itoh, Takahiro Ikeda, Yumiko Miyano, Tadashi Mitsui, Masuo Amma, Shoichi Horikawa

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Semiconductors, Electron beams, Image acquisition, Quality measurement, Scanning electron microscopy, Head, Image quality, Photomasks, Optical proximity correction, Algorithm development

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Proceedings Article | 26 June 2003 Paper

Model-based PPC verification methodology with two dimentional pattern feature extraction

Kohji Hashimoto, Takeshi Ito, Takahiro Ikeda, Shigeki Nojima, Soichi Inoue

Proc. SPIE. 5040, Optical Microlithography XVI

KEYWORDS: Lithography, Optical lithography, Feature extraction, Photomasks, Feedback loops, Computer aided design, Photoresist processing, Semiconducting wafers, Model-based design, Solid modeling

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Proceedings Article | 2 June 2003 Paper

Pattern shape comparison methods using SEM image

Takahiro Ikeda, Toshiya Kotani, Takashi Sato, Kusuo Ueno, Ryoichi Matsuoka

Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII

KEYWORDS: Lithography, Data modeling, Inspection, Scanning electron microscopy, Data acquisition, Image filtering, Photomasks, Computer aided design, Algorithm development, Semiconducting wafers

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Proceedings Article | 29 June 1998 Paper

Enhancement of process latitude by reducing resist thickness for KrF excimer laser lithography

Masafumi Asano, Yumiko Maruyama, Toru Koike, Kenji Chiba, Eishi Shiobara, Takahiro Ikeda

Proc. SPIE. 3333, Advances in Resist Technology and Processing XV

KEYWORDS: Lithography, Lithographic illumination, Etching, Image processing, Scanning electron microscopy, Excimer lasers, Critical dimension metrology, Geometrical optics, Reactive ion etching, Photoresist processing

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Showing 5 of 9 publications

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