Dr. Takahiro Matsuo Profile

Dr. Takahiro Matsuo

Researcher at Panasonic Corp

SPIE Involvement:

Author

Publications (20)

Proceedings Article | 24 September 2012 Paper

Paper

Key science drivers for MICHI: a mid-IR instrument concept for the TMT

Chris Packham, M. Honda, M. Richter, Y. Okamoto, H. Kataza, T. Onaka, T. Fujiyoshi, A. Tokunaga, M. Chun, A. Alonso-Herrero, J. Carr, M. Chiba, K Enya, H. Fujiwara, P Gandhi, M. Imanishi, K. Ichikawa, Y. Ita, N. Kawakatsu, T. Kotani, N. Levenson, T. Matsuo, M. Matsuura, T. Minezaki, J. Najita, N. Oi, T. Ootsubo, I. Sakon, M. Takami, C. Telesco, C. Wright, T. Yamashita

Proceedings Volume 8446, 84467G (2012) https://doi.org/10.1117/12.924996

KEYWORDS: Stars, Planets, Galactic astronomy, Spatial resolution, Telescopes, Spectroscopy, James Webb Space Telescope, Adaptive optics, Spectral resolution, Thirty Meter Telescope

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Proceedings Article | 16 May 2008 Paper

Paper

Gas sensor based on PBG fiber: possibilities and limitations

Joanna Pawat, Takahiro Matsuo, Xuefeng Li, Tadashi Sugiyama, Toshitsugu Ueda

Proceedings Volume 7004, 70044R (2008) https://doi.org/10.1117/12.786133

KEYWORDS: Absorption, Laser cutting, Gas sensors, Geometrical optics, Nitrogen, Cladding, Lamps, Molecules, Ion beams, Tunable lasers

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Proceedings Article | 12 May 2005 Paper

Paper

Mask enhancer technology for 45-nm node contact hole fabrication

Takashi Yuito, Vincent Wiaux, Lieve Van Look, Geert Vandenberghe, Shigeo Irie, Takahiro Matsuo, Akio Misaka, Hisashi Watanabe, Masaru Sasago

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598977

KEYWORDS: Thin films, Photomasks, Transmittance, Printing, Lithography, Halftones, Semiconducting wafers, Critical dimension metrology, Quartz, Resolution enhancement technologies

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Proceedings Article | 4 May 2005 Paper

Paper

Impact of water and top-coats on lithographic performance in 193-nm immersion lithography

Shinji Kishimura, Roel Gronheid, Monique Ercken, Mireille Maenhoudt, Takahiro Matsuo, Masayuki Endo, Masaru Sasago

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598532

KEYWORDS: Ions, Immersion lithography, Water, Lithography, Optical lithography, Analytical research, Quartz, Crystals, Semiconducting wafers, Surface roughness

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Proceedings Article | 26 June 2003 Paper

Paper

Novel strong-resolution enhancement technology with phase-shifting mask for logic gate pattern fabrication

Takahiro Matsuo, Akio Misaka, Masaru Sasago

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485363

KEYWORDS: Photomasks, Phase shifts, Lithography, Reticles, Opacity, Critical dimension metrology, Logic devices, Resolution enhancement technologies, Image enhancement, Lithographic illumination

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Proceedings Article | 26 June 2003 Paper

Paper

Improved outline phase-shifting mask (OL-PSM) for reduction of the mask error enhancement factor

Akio Misaka, Takahiro Matsuo, Masaru Sasago

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485319

KEYWORDS: Photomasks, Resolution enhancement technologies, Phase shifting, Phase shifts, Lithography, Critical dimension metrology, Image enhancement, Optical lithography, Printing, Semiconducting wafers

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Proceedings Article | 14 September 2001 Paper

Paper

Investigation of attenuated phase-shifting mask material for 157-nm lithography

Toshio Onodera, Takahiro Matsuo, Toshiro Itani, Hiroaki Morimoto

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435642

KEYWORDS: Transmittance, Photomasks, Lithography, Chromium, Tantalum, Phase shifts, Atrial fibrillation, Etching, Thin films, Resolution enhancement technologies

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Proceedings Article | 22 January 2001 Paper

Paper

Materials for an attenuated phase-shifting mask in 157-nm lithography

Takahiro Matsuo, Toshio Onodera, Toshiro Itani, Hiroaki Morimoto, Takashi Haraguchi, Koichiro Kanayama, Tadashi Matsuo, Masao Otaki

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410703

KEYWORDS: Transmittance, Chromium, Laser irradiation, Atrial fibrillation, Vacuum ultraviolet, Phase shifts, Photomasks, Lithography, Defect inspection, Quartz

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Proceedings Article | 19 July 2000 Paper

Paper

CrOxFy as a material for attenuated phase-shift masks in ArF lithography

Keisuke Nakazawa, Takahiro Matsuo, Toshio Onodera, Hiroaki Morimoto, Hiroshi Mohri, Chiaki Hatsuta, Naoya Hayashi

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392100

KEYWORDS: Transmittance, Photomasks, Phase shifts, Lithography, Annealing, Excimer lasers, Interfaces, Fluorine, X-rays, Chromium

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Proceedings Article | 5 July 2000 Paper

Paper

Feasibility study of an embedded transparent phase-shifting mask in ArF lithography

Takahiro Matsuo, Tohru Ogawa, Hiroaki Morimoto

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389033

KEYWORDS: Photomasks, Phase shifts, Lithography, Logic devices, Resolution enhancement technologies, Lithographic illumination, Opacity, Binary data, Scanning electron microscopy

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Proceedings Article | 30 December 1999 Paper

Paper

ZrSiO: a new and robust material for attenuated phase-shift mask in ArF lithography

Toshio Onodera, Takahiro Matsuo, Keisuke Nakazawa, Junji Miyazaki, Tohru Ogawa, Hiroaki Morimoto, Takashi Haraguchi, Nobuhiko Fukuhara, Tadashi Matsuo, Masao Otaki, Susumu Takeuchi

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373329

KEYWORDS: Lithographic illumination, Resolution enhancement technologies, Photomasks, Lithography, Reticles, Transmittance, Critical dimension metrology, Silicon films, Semiconducting wafers, Oxygen

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Proceedings Article | 25 August 1999 Paper

Paper

Attenuated phase-shifting mask in ArF lithography

Junji Miyazaki, Masaya Uematsu, Keisuke Nakazawa, Takahiro Matsuo, Toshio Onodera, Tohru Ogawa

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360213

KEYWORDS: Transmittance, Photomasks, Lithography, Critical dimension metrology, Reticles, Phase shifts, Laser irradiation, Binary data, Semiconducting wafers, Error analysis

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Proceedings Article | 26 July 1999 Paper

Paper

Challenge to sub-0.1-um pattern fabrication using an alternating phase-shifting mask in ArF lithography

Takahiro Matsuo, Keisuke Nakazawa, Tohru Ogawa

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354342

KEYWORDS: Photomasks, Phase shifts, Lithography, Logic devices, Laser development, Excimer lasers, Photoresist processing, Critical dimension metrology, Optical lithography, Scanning electron microscopy

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Proceedings Article | 18 December 1998 Paper

Paper

Process margin in ArF lithography using an alternating phase-shifting mask

Takahiro Matsuo, Keisuke Nakazawa, Tohru Ogawa

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332866

KEYWORDS: Photomasks, Phase shifts, Lithography, Silicon, Excimer lasers, Laser development, Photoresist processing, Opacity, Silicon films, Scanning electron microscopy

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Proceedings Article | 29 June 1998 Paper

Paper

Polymer design in surface modification resist process for ArF lithography

Takahiro Matsuo, Masayuki Endo, Shigeyasu Mori, Koichi Kuhara, Masaru Sasago, Masamitsu Shirai, Masahiro Tsunooka

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312340

KEYWORDS: Polymers, Chemical vapor deposition, Photoresist processing, Lithography, Image processing, Scanning electron microscopy, Reactive ion etching, Photography, Lithium, Plasma

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Proceedings Article | 29 June 1998 Paper

Paper

High-silicon-concentration TSI process for 193-nm lithography

Shigeyasu Mori, Taku Morisawa, Nobuyuki Matsuzawa, Yuko Kaimoto, Masayuki Endo, Takahiro Matsuo, Koichi Kuhara, Takeshi Ohfuji, Masaru Sasago

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312359

KEYWORDS: Silicon, Etching, Glasses, Lithography, Resistance, Photoresist processing, Liquids, Chemically amplified resists, Image processing, Excimer lasers

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Proceedings Article | 29 June 1998 Paper

Paper

Improved positive surface modification resist process for 193-nm lithography

Masayuki Endo, Takahiro Matsuo, Shigeyasu Mori, Taku Morisawa, Koichi Kuhara, Masaru Sasago, Masamitsu Shirai, Masahiro Tsunooka

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312439

KEYWORDS: Photoresist processing, Polymers, Chemical vapor deposition, Image processing, Lithography, Photolysis, 193nm lithography, Chlorine, Scanning electron microscopy, Etching

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Proceedings Article | 22 May 1995 Paper

Paper

CD control using latent image for lithography

Taichi Koizumi, Takahiro Matsuo, Masayuki Endo, Masaru Sasago

Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209226

KEYWORDS: Critical dimension metrology, Lithography, Silicon, Excimer lasers, Image processing, Photoresist processing, Control systems, Photoresist materials, Atomic force microscope

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Proceedings Article | 1 June 1992 Paper

Paper

Quarter-micron deep-UV lithography with silylation process

Masayuki Endo, Takahiro Matsuo, Kazuhiko Hashimoto, Masaru Sasago, Noboru Nomura

Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59766

KEYWORDS: Lithography, Deep ultraviolet, Excimer lasers, Silicon, Semiconductors, Image resolution, Oxygen, Diffusion, Optical lithography, Electronics

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Proceedings Article | 1 August 1991 Paper

Paper

Hierarchical proximity effect correction for e-beam direct writing of 64-Mbit DRAM

Akio Misaka, Kazuhiko Hashimoto, M. Kawamoto, H. Yamashita, Takahiro Matsuo, Toshihiko Sakashita, Kenji Harafuji, Noboru Nomura

Proceedings Volume 1465, (1991) https://doi.org/10.1117/12.47354

KEYWORDS: X-ray lithography, X-rays, Manufacturing, Scattering, Ion beams, Lithography, Electron beams, Modulation, Data processing, Absorption

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Showing 5 of 20 publications

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