Mr. Takamitsu Furukawa Profile

Takamitsu Furukawa

at SELETE

SPIE Involvement:

Author

Publications (19)

Proceedings Article | 28 May 2004 Paper

157-nm chromeless phase lithography for 45-nm SRAM gate

Toshifumi Suganaga, Kunio Watanabe, Seiji Matsuura, Takuya Hagiwara, Takamitsu Furukawa, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534897

KEYWORDS: Nanoimprint lithography, Lithography, Photomasks, Line edge roughness, Lithographic illumination, Resolution enhancement technologies, Photoresist processing, Transmittance, Semiconductors, Fabrication

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Proceedings Article | 28 May 2004 Paper

157-nm lithography with extremely high numerical aperture lens for 45-nm technology node

Toshifumi Suganaga, Jeung-Woo Lee, Eiji Kurose, Toshiyuki Ishimaru, Takamitsu Furukawa, Toshiro Itani, Kiyoshi Fujii, Julian Cashmore, Malcolm Gower

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535119

KEYWORDS: Nanoimprint lithography, Line edge roughness, Lithography, Photomasks, Tolerancing, Phase shifting, Binary data, Objectives, Resolution enhancement technologies, Lithographic illumination

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Proceedings Article | 14 May 2004 Paper

Advances in resist pattern transfer process using 157-nm lithography

Takamitsu Furukawa, Takuya Hagiwara, Etsurou Kawaguchi, Kentaro Matsunaga, Toshifumi Suganaga, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535177

KEYWORDS: Reactive ion etching, Lithography, Photomasks, Photoresist processing, Etching, Binary data, Semiconductors, Optical lithography, Lithographic illumination, Line edge roughness

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Proceedings Article | 14 May 2004 Paper

The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials

Takuji Ishikawa, Tetsuhiro Kodani, Meiten Koh, Tsukasa Moriya, Takayuki Araki, Hirokazu Aoyama, Tsuneo Yamashita, Minoru Toriumi, Takuya Hagiwara, Takamitsu Furukawa, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533901

KEYWORDS: Polymers, Transparency, Lithography, Fluorine, Absorbance, Photomasks, Standards development, Phase shifts, Polymer thin films, Absorption

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Proceedings Article | 14 May 2004 Paper

Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography

Takuya Hagiwara, Takamitsu Furukawa, Toshiro Itani, Kiyoshi Fujii, Takuji Ishikawa, Meiten Koh, Tetsuhiro Kodani, Tsukasa Moriya, Tsuneo Yamashita, Takayuki Araki, Minoru Toriumi, Hirokazu Aoyama

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535098

KEYWORDS: Polymers, Absorption, Lithography, Resistance, Absorbance, Line edge roughness, Fluorine, Industrial chemicals, Transparency, Chlorine

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Proceedings Article | 14 May 2004 Paper

Airborne contamination control for 157-nm lithography: influence of ammonia contamination

Hidefumi Matsui, Junichi Kitano, Kosuke Yoshihara, Etsurou Kawaguchi, Takamitsu Furukawa, Kentaro Matsunaga, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534975

KEYWORDS: Contamination, Lithography, Polymers, Coating, Transmittance, Adsorption, Contamination control, Critical dimension metrology, Polymer thin films, Spectroscopy

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Proceedings Article | 26 June 2003 Paper

157-nm lithography for 65-nm node SRAM-gate

Toshifumi Suganaga, Shigeo Irie, Seiro Miyoshi, Jae-Hwan Kim, Kunio Watanabe, Eiji Kurose, Takamitsu Furukawa, Takuya Hagiwara, Toshiyuki Ishimaru, Toshiro Itani

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485376

KEYWORDS: Optical proximity correction, Lithography, Transmittance, Photoresist processing, Resolution enhancement technologies, Silicon, Reactive ion etching, Photomasks, Monochromatic aberrations, Optical simulations

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