Takashi Kamikubo
Chief Specialist at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 13 July 2017 Paper
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Neural networks, Yield improvement, Convolutional neural networks, Critical dimension metrology, Electron beam lithography, Electron beams, Lithography, Artificial intelligence, Machine learning

Proceedings Article | 13 July 2017 Paper
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Metrology, Thermal effects, Photomasks, Temperature metrology, Time metrology, Thermal modeling, Mathematics, Backscatter, Beam shaping, Vestigial sideband modulation

Proceedings Article | 25 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Photomasks, Lithography, Electron beams, Logic, Electron beam melting, Line edge roughness, Electron beam lithography, Extreme ultraviolet, Optical lithography, LCDs

SPIE Journal Paper | 23 March 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Critical dimension metrology, Beam shaping, Vestigial sideband modulation, Photomasks, Diffusion, Glasses, Line edge roughness, Error analysis, Thermal modeling, Temperature metrology

Proceedings Article | 9 July 2015 Paper
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Critical dimension metrology, Modulation, Temperature metrology, Computer simulations, Photomasks, Quartz, Thermal modeling, Diffusion, Roentgenium, Electron beam lithography

Showing 5 of 26 publications
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