Mr. Takashi Yasui Profile

Takashi Yasui

Engineer at Panasonic Corp

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Author

Publications (5)

Proceedings Article | 20 August 2004 Paper

Actinic aerial image measurement for qualification of defect on 157-nm photomask

Takashi Yasui, Iwao Higashikawa, Peter Kuschnerus, Wolfgang Degel, Klaus Boehm, Axel Zibold, Yuji Kobiyama, Jan-Peter Urbach, Christof Schilz, Silvio Teuber Semmler

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557762

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Semiconductors, Metrology, Wafer-level optics, Image quality, Lithographic illumination, CCD cameras, Binary data

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Proceedings Article | 17 December 2003 Paper

Development of phase-shift and transmittance metrology system for 157-nm PSMs

Hal Kusunose, Takashi Yasui, Iwao Higashikawa

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518033

KEYWORDS: Transmittance, Phase measurement, Photomasks, Interferometers, Quartz, Lithography, Ultraviolet radiation, Deep ultraviolet, Charge-coupled devices, Metrology

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Proceedings Article | 28 August 2003 Paper

Actinic aerial image measurement tool for 157-nm mask qualification

Takashi Yasui, Iwao Higashikawa, Peter Kuschnerus, Thomas Engel, Axel Zibold, Claudia Hertfelder, Yuji Kobiyama, Jan-Peter Urbach, Christof Schilz, Armin Semmler

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504215

KEYWORDS: Photomasks, Binary data, CCD image sensors, CCD cameras, Image quality, Semiconducting wafers, Vacuum ultraviolet, Lithography, Vibration control, Optical resolution

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Proceedings Article | 28 August 2003 Paper

Actinic aerial image measurement tool for 157-nm lithography

Peter Kuschnerus, Thomas Engel, Axel Zibold, Claudia Hertfelder, Takashi Yasui, Iwao Higashikawa, Christof Schilz, Armin Semmler

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504064

KEYWORDS: Photomasks, Lithography, Lithographic illumination, Reticles, Binary data, CCD cameras, Semiconducting wafers, Printing, Optical alignment, Charge-coupled devices

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Proceedings Article | 27 December 2002 Paper

Aerial image measurement system for 157-nm lithography

Klaus Eisner, Peter Kuschnerus, Jan-Peter Urbach, Christof Schilz, Thomas Engel, Axel Zibold, Takashi Yasui, Iwao Higashikawa

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467353

KEYWORDS: Photomasks, Lithography, Phase shifts, CCD cameras, Vacuum ultraviolet, Binary data, CCD image sensors, Microelectronics, Reticles, Lithographic illumination

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