Takashi Yasui
Engineer at Panasonic Corp
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 August 2004 Paper
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Semiconductors, Metrology, Wafer-level optics, Image quality, Lithographic illumination, CCD cameras, Binary data

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Transmittance, Phase measurement, Photomasks, Interferometers, Quartz, Lithography, Ultraviolet radiation, Deep ultraviolet, Charge-coupled devices, Metrology

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Photomasks, Lithography, Lithographic illumination, Reticles, Binary data, CCD cameras, Semiconducting wafers, Printing, Optical alignment, Charge-coupled devices

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Photomasks, Binary data, CCD image sensors, CCD cameras, Image quality, Semiconducting wafers, Vacuum ultraviolet, Lithography, Vibration control, Optical resolution

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Photomasks, Lithography, Phase shifts, CCD cameras, Vacuum ultraviolet, Binary data, CCD image sensors, Microelectronics, Reticles, Lithographic illumination

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