Dr. Takayuki Abe
Marketing at NuFlare Technology Inc
Publications (11)

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Data modeling, Modulation, Scattering, Data processing, Software development, Photomasks, Electron beam melting, Critical dimension metrology, Forward error correction, Data corrections

SPIE Journal Paper | 1 October 2008
JM3 Vol. 7 Issue 04
KEYWORDS: Critical dimension metrology, Forward error correction, Computed tomography, Semiconducting wafers, Convolution, Modulation, Integrated circuits, Photomasks, Lithography, Error analysis

SPIE Journal Paper | 1 April 2008
JM3 Vol. 7 Issue 02
KEYWORDS: Critical dimension metrology, Computed tomography, Forward error correction, Convolution, Modulation, Fourier transforms, Semiconducting wafers, Erbium, Lithography, Numerical analysis

Proceedings Article | 1 August 2002 Paper
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Electron beams, Optical amplifiers, Computing systems, Amplifiers, Control systems, Photomasks, Beam shaping, Optical proximity correction, Critical dimension metrology, Data communications

Proceedings Article | 21 July 2000 Paper
Proc. SPIE. 3997, Emerging Lithographic Technologies IV
KEYWORDS: Electron beams, Diffusion, Control systems, Microelectronics, Photomasks, Mask making, Analytical research, Critical dimension metrology, HVAC controls, Vestigial sideband modulation

Showing 5 of 11 publications
Conference Committee Involvement (10)
Photomask and Next Generation Lithography Mask Technology XIX
17 April 2012 |
Photomask and Next Generation Lithography Mask Technology XVII
13 April 2010 |
Photomask and Next Generation Lithography Mask Technology XVII
13 April 2010 |
Photomask and Next Generation Lithography Mask Technology XVI
8 April 2009 |
Photomask and Next Generation Lithography Mask Technology XV
16 April 2008 |
Showing 5 of 10 Conference Committees
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