Mr. Takayuki Takano Profile

Takayuki Takano

at AIST

SPIE Involvement:

Author

Publications (9)

SPIE Journal Paper | 1 July 2009

Demonstration of fabricating a needle array by the combination of x-ray grayscale mask with the lithografie, galvanoformung, abformung process

Harutaka Mekaru, Takayuki Takano, Koichi Awazu, Masaharu Takahashi, Ryutaro Maeda

JM3, Vol. 8, Issue 03, 033010, (July 2009) https://doi.org/10.1117/12.10.1117/1.3158617

KEYWORDS: X-rays, Photomasks, Polymethylmethacrylate, X-ray lithography, Silicon, Scanning electron microscopy, X-ray technology, Nickel, X-ray imaging, Self-assembled monolayers

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Proceedings Article | 24 July 2008 Paper

Design and fabrication of TES microcalorimeters for x-ray astrophysics in Japan

Yuichiro Ezoe, Tomotaka Yoshino, Kazuma Mukai, Hiroshi Yoshitake, Hiroki Akamatsu, Kumi Ishikawa, Takayuki Takano, Ryutaro Maeda, Yoshitaka Ishisaki, Noriko Yamasaki, Kazuhisa Mitsuda, Takaya Ohashi

Proceedings Volume 7021, 70211X (2008) https://doi.org/10.1117/12.788155

KEYWORDS: Gold, Silicon, X-rays, Etching, Deep reactive ion etching, X-ray astronomy, Semiconducting wafers, Sensors, X-ray technology, Photoresist materials

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Proceedings Article | 9 January 2008 Paper

A novel fabrication method of needle array combined x-ray gray mask with LIGA process

Harutaka Mekaru, Takayuki Takano, Koichi Awazu, Masaharu Takahashi, Ryutaro Maeda

Proceedings Volume 6800, 68001R (2008) https://doi.org/10.1117/12.753858

KEYWORDS: X-rays, Photomasks, Polymethylmethacrylate, X-ray lithography, Silicon, X-ray technology, Nickel, Scanning electron microscopy, Photoresist processing, Etching

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Proceedings Article | 9 January 2008 Paper

Measurements of silicon dry-etching rates and profiles in MEMS foundries and their application to MEMS design software

T. Takano, T. Ikehara, R. Maeda

Proceedings Volume 6800, 68001X (2008) https://doi.org/10.1117/12.759374

KEYWORDS: Etching, Photomasks, Silicon, Microelectromechanical systems, Deep reactive ion etching, Semiconducting wafers, Photoresist materials, Oxides, Databases, Plasma

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SPIE Journal Paper | 1 January 2008

Fabrication and evaluation of a grayscale mask for x-ray lithography using MEMS technology

Harutaka Mekaru, Takayuki Takano, Koichi Awazu, Masaharu Takahashi, Ryutaro Maeda

JM3, Vol. 7, Issue 01, 013009, (January 2008) https://doi.org/10.1117/12.10.1117/1.2894817

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Proceedings Article | 3 October 2007 Paper

The first light of a single-stage MEMS x-ray optic

Masaki Koshiishi, Yuichiro Ezoe, Makoto Mita, Yoshitomo Maeda, Kazuhisa Mitsuda, Masaki Suzuki, Takeyuki Osawa, Akio Hoshino, Yoshitaka Ishisaki, Takayuki Takano, Ryutaro Maeda

Proceedings Volume 6688, 668814 (2007) https://doi.org/10.1117/12.733912

KEYWORDS: X-ray optics, Mirrors, X-rays, Silicon, Wafer-level optics, Microelectromechanical systems, Semiconducting wafers, Etching, Reflectivity, Reflection

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Proceedings Article | 21 March 2007 Paper

Three-dimensional X-ray lithography using a silicon mask with inclined absorbers

Harutaka Mekaru, Takayuki Takano, Koichi Awazu, Masaharu Takahashi, Ryutaro Maeda

Proceedings Volume 6517, 651735 (2007) https://doi.org/10.1117/12.711824

KEYWORDS: X-rays, X-ray lithography, Photomasks, Silicon, Polymethylmethacrylate, Scanning electron microscopy, X-ray technology, Etching, Microelectromechanical systems, X-ray imaging

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Proceedings Article | 13 June 2006 Paper

Recent development of micropore optics using MEMS technologies

Yuichiro Ezoe, Masaki Koshiishi, Makoto Mita, Kazuhisa Mitsuda, Yoshitaka Ishisaki, Akio Hoshino, Zhen Yang, Takayuki Takano, Harutaka Mekaru, Ryutaro Maeda

Proceedings Volume 6266, 62661B (2006) https://doi.org/10.1117/12.670736

KEYWORDS: Silicon, Semiconducting wafers, Etching, Microelectromechanical systems, X-rays, X-ray optics, Wafer-level optics, Mirrors, Optics manufacturing, Oxides

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Proceedings Article | 19 January 2006 Paper

Conception and design of a thermal valveless micropump

G. Manzoni, S. Heisig, T. Takano, C. Kocer, H. Goto, T. Mihara, R. Maeda

Proceedings Volume 6036, 60360I (2006) https://doi.org/10.1117/12.638467

KEYWORDS: Microfluidics, Diodes, Terbium, Differential equations, Thermal modeling, Semiconducting wafers, 3D modeling, Fluid dynamics, Antimony, Calibration

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Showing 5 of 9 publications

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