Takayuki Uchiyama
Director, Lithography at Huawei Technologies Japan KK
SPIE Involvement:
Profile Summary

Research and development of advanced lithography
Experience includes the production engineering of Lithography process and the development of i-line, KrF, ArF and ArF immersion lithography
The chairman of lithography team in Japan of ITRS from 2009 to 2012.
A pioneer in terms of ArF immersion lithography and SMO (source mask co-optimization)
Publications (25)

SPIE Journal Paper | 13 September 2019
JM3 Vol. 18 Issue 03

SPIE Journal Paper | 19 June 2019
JM3 Vol. 18 Issue 02
KEYWORDS: Semiconducting wafers, Palladium, Inspection, Standards development, Scanning electron microscopy, Etching, Lithography, Defect detection, Electron beam lithography, Silicon

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Metrology, Defect detection, Etching, Silicon, Inspection, Scanning electron microscopy, Line edge roughness, Semiconducting wafers, Standards development

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Lithographic illumination, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Tantalum, Semiconducting wafers

Proceedings Article | 20 April 2011 Paper
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Optical lithography, Cadmium, Etching, Resistance, Process control, Logic devices, Spatial resolution, Critical dimension metrology, Semiconducting wafers

Showing 5 of 25 publications
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