Dr. Takeo Nakano Profile

Dr. Takeo Nakano

at Tokyo Electron Yamanashi Ltd

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Author

Publications (6)

Proceedings Article | 1 April 2016 Paper

Numerical placement analysis in hole multiplication patterns for directed self-assembly

K. Yamamoto, T. Nakano, M. Muramatsu, H. Genjima, T. Tomita, K. Matsuzaki, T. Kitano

Proceedings Volume 9777, 97771Q (2016) https://doi.org/10.1117/12.2218596

KEYWORDS: Directed self assembly, Lithography, Numerical analysis, Critical dimension metrology, Polymethylmethacrylate, Double patterning technology, Picosecond phenomena, Error analysis, Polymers, Computer simulations, Optical lithography

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Proceedings Article | 20 March 2015 Paper

Driving DSA into volume manufacturing

Mark Somervell, Takashi Yamauchi, Soichiro Okada, Tadatoshi Tomita, Takanori Nishi, Shinichiro Kawakami, Makoto Muramatsu, Etsuo Iijima, Vinayak Rastogi, Takeo Nakano, Fumiko Iwao, Seiji Nagahara, Hiroyuki Iwaki, Makiko Dojun, Koichi Yatsuda, Toshikatsu Tobana, Ainhoa Romo Negreira, Doni Parnell, Benjamen Rathsack, Kathleen Nafus, Jean-Luc Peyre, Takahiro Kitano

Proceedings Volume 9425, 94250Q (2015) https://doi.org/10.1117/12.2085776

KEYWORDS: Etching, Semiconducting wafers, Optical lithography, Polymethylmethacrylate, Line edge roughness, Manufacturing, Image processing, Ecosystems, Line width roughness, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

Computational analysis of hole placement errors for directed self-assembly

K. Yamamoto, T. Nakano, M. Muramatsu, T. Tomita, K. Matsuzaki, T. Kitano

Proceedings Volume 9423, 94231X (2015) https://doi.org/10.1117/12.2085084

KEYWORDS: Particles, Tolerancing, Polymethylmethacrylate, Critical dimension metrology, Error analysis, Data acquisition, Polymers, Computer simulations, Picosecond phenomena, Directed self assembly

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Proceedings Article | 28 March 2014 Paper

Simulation analysis of directed self-assembly for hole multiplication in guide pattern

M. Muramatsu, T. Nakano, T. Tomita, K. Yamamoto, K. Matsuzaki, T. Kitano

Proceedings Volume 9049, 904921 (2014) https://doi.org/10.1117/12.2045865

KEYWORDS: Polymethylmethacrylate, Picosecond phenomena, 3D modeling, Particles, Scanning transmission electron microscopy, Photomasks, Monte Carlo methods, Scanning electron microscopy, Lithography, Directed self assembly

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Proceedings Article | 27 March 2014 Paper

High-volume manufacturing equipment and processing for directed self-assembly applications

Mark Somervell, Takashi Yamauchi, Soichiro Okada, Tadatoshi Tomita, Takanori Nishi, Etsuo Iijima, Takeo Nakano, Takumi Ishiguro, Seiji Nagahara, Hiroyuki Iwaki, Makiko Dojun, Mariko Ozawa, Koichi Yatsuda, Toshikatsu Tobana, Ainhoa Romo Negreira, Doni Parnell, Shinchiro Kawakami, Makoto Muramatsu, Benjamen Rathsack, Kathleen Nafus, Jean-Luc Peyre, Takahiro Kitano

Proceedings Volume 9051, 90510N (2014) https://doi.org/10.1117/12.2045975

KEYWORDS: Semiconducting wafers, Etching, Polymethylmethacrylate, Thin film coatings, High volume manufacturing, Ecosystems, Lithography, Manufacturing, Manufacturing equipment, Directed self assembly

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Proceedings Article | 26 March 2013 Paper

Dissipative particle dynamics study on directed self-assembly in holes

T. Nakano, M. Matsukuma, K. Matsuzaki, M. Muramatsu, T. Tomita, T. Kitano

Proceedings Volume 8680, 86801J (2013) https://doi.org/10.1117/12.2011069

KEYWORDS: Polymers, Particles, Monte Carlo methods, Computer simulations, Polymethylmethacrylate, Lithography, Fabrication, Semiconductors, Nanolithography, Directed self assembly

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Showing 5 of 6 publications

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