Prof. Takeo Watanabe Profile

Prof. Takeo Watanabe

Special Assistant to the President, Professor at Univ of Hyogo

SPIE Involvement:

Author

Publications (72)

Proceedings Article | 22 November 2023 Presentation

EUV resists fundamental studies at NewSUBARU synchrotron light facility especially on EUV high-NA lithography

Takeo Watanabe, Shinji Yamakawa, Tetsuo Harada

Proceedings Volume PC12750, PC1275008 (2023) https://doi.org/10.1117/12.2687071

KEYWORDS: X-rays, Extreme ultraviolet, Synchrotrons, Lithography, Extreme ultraviolet lithography, Line width roughness, Transmittance, Synchrotron technology, Industry, Imaging systems

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Proceedings Article | 22 November 2023 Presentation

Research activities on EUV mask at NewSUBARU synchrotron light facility for the advanced EUV lithography

Takeo Watanabe, Tetsuo Harada, Shinji Yamakawa

Proceedings Volume PC12751, PC127510N (2023) https://doi.org/10.1117/12.2687002

KEYWORDS: Scatterometry, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Reflectometry, Synchrotron technology, Microscopes, Light sources, Industry, Imaging systems

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Proceedings Article | 21 November 2023 Paper

The x-ray absorption spectroscopy analysis of the negative-tone PAG bound resist

Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

Proceedings Volume 12750, 127500Y (2023) https://doi.org/10.1117/12.2687118

KEYWORDS: X-rays, Chemical analysis, Absorption spectroscopy, Extreme ultraviolet, Polymers, Line width roughness, Thin films, Sulfur, Silicon, Semiconducting wafers

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Proceedings Article | 21 November 2023 Poster + Paper

Comparison of photoresist sensitivity between KrF, EB, and EUV exposure

Yosuke Ohta, Atsushi Sekiguchi, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe, Hiroki Yamamoto

Proceedings Volume 12750, 1275018 (2023) https://doi.org/10.1117/12.2691211

KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Photoresist developing, Quantum correlations, Film thickness, Chemically amplified resists, Quantum experiments, Ultraviolet radiation, Quantum numbers, Electrons

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Proceedings Article | 29 September 2023 Paper

Carbon/boron multilayer for beyond EUV lithography

Umi Fujimoto, Tetsuo Harada, Shinji Yamakawa, Takeo Watanabe

Proceedings Volume 12915, 129150M (2023) https://doi.org/10.1117/12.2688244

KEYWORDS: Multilayers, Reflectivity, Carbon, Interfaces, Lanthanum, Extreme ultraviolet lithography, Argon, Lithography, Boron, Refractive index

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Proceedings Article | 1 December 2022 Poster + Paper

The measurement of the refractive index n and k value of the EUV resist which used EUV reflectivity measurement method

A. Sekiguchi, Y. Ohta, T. Harada, T. Watanabe

Proceedings Volume 12292, 122920U (2022) https://doi.org/10.1117/12.2644821

KEYWORDS: Extreme ultraviolet lithography, Absorption, Photoresist materials, Reflection, Polymers, Synchrotron radiation

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Proceedings Article | 23 August 2021 Paper

Beyond EUV measurement at NewSUBARU synchrotron light facility

Takuto Fujii, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

Proceedings Volume 11908, 119080T (2021) https://doi.org/10.1117/12.2600986

KEYWORDS: Reflectivity, Mirrors, Multilayers, Reflectometry, Molybdenum, Coating, Extreme ultraviolet lithography, Optical testing, Lithography, Extreme ultraviolet

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Proceedings Article | 23 August 2021 Paper

Damage-less removal of surface contamination using atomic hydrogen generated on heated tungsten mesh

Akira Heya, Tetsuo Harada, Masahito Niibe, Koji Sumitomo, Takeo Watanabe

Proceedings Volume 11908, 119080S (2021) https://doi.org/10.1117/12.2597935

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Proceedings Article | 23 August 2021 Paper

Fundamental research activities on EUV lithography at NewSUBARU synchrotron light facility

T. Watanabe, T. Harada, S. Yamakawa

Proceedings Volume 11908, 1190807 (2021) https://doi.org/10.1117/12.2600896

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Proceedings Article | 23 August 2021 Paper

Hydrogen damage and cleaning evaluation of Mo/Si multilayer using high-power EUV irradiation tool

Tetsuo Harada, Ayato Ohgata, Shinji Yamakawa, Takeo Watanabe

Proceedings Volume 11908, 119080U (2021) https://doi.org/10.1117/12.2601080

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Proceedings Article | 26 October 2020 Presentation + Paper

Resist pattern inspection for defect reduction in sub-15 nm templates

Takeharu Motokawa, Machiko Suenaga, Kazuki Hagihara, Noriko Iida nee Sakurai, Ryu Komatsu, Hideaki Sakurai, Shingo Kanamitsu, Keisuke Tsuda, Tetsuo Harada, Takeo Watanabe

Proceedings Volume 11518, 115180H (2020) https://doi.org/10.1117/12.2572389

KEYWORDS: Inspection, Defect inspection, Scanning electron microscopy, Double patterning technology, Nanoimprint lithography, High volume manufacturing, Electron microscopes, Scatterometry, Microscopes, Coherence imaging

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Proceedings Article | 26 September 2019 Presentation + Paper

Development of an EUV and OoB Reflectometer at NewSUBARU synchrotron light facility

Keisuke Tsuda, Tetsuo Harada, Takeo Watanabe

Proceedings Volume 11148, 111481N (2019) https://doi.org/10.1117/12.2540815

KEYWORDS: Extreme ultraviolet, Reflectometry, Synchrotrons, Extreme ultraviolet lithography, Plasma, Light, Ultraviolet radiation, Vacuum ultraviolet, Mirrors, Monochromators

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Proceedings Article | 3 October 2018 Presentation + Paper

In-situ measurement of outgassing generated from EUV metal oxide nanoparticles resist during electron irradiation

Y. Minami, S. Takahashi, H. Minami, Y. Matsumoto, M. Kadoi, A. Sekiguchi, T. Watanabe

Proceedings Volume 10809, 108091W (2018) https://doi.org/10.1117/12.2503255

KEYWORDS: Metals, Extreme ultraviolet, Oxides, Contamination, Nanoparticles, Extreme ultraviolet lithography, Mass spectrometry, Particles

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Proceedings Article | 3 October 2018 Presentation + Paper

Reflectance measurement of EUV mirrors with s- and p-polarized light using polarization control units

Tetsuo Harada, Takeo Watanabe

Proceedings Volume 10809, 108091T (2018) https://doi.org/10.1117/12.2502009

KEYWORDS: Reflectivity, Reflectometry, Extreme ultraviolet, Polarizers, Polarization, Polarization control, Multilayers, Extreme ultraviolet lithography

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Proceedings Article | 3 October 2018 Paper

Development of absorption-coefficient-measurement method of EUV resist by direct-resist coating on a photodiode

Shota Niihara, Tetsuo Harada, Takeo Watanabe

Proceedings Volume 10809, 108091Y (2018) https://doi.org/10.1117/12.2502267

KEYWORDS: Photodiodes, Extreme ultraviolet, Transmittance, Absorption, Coating, Polymethylmethacrylate, Extreme ultraviolet lithography, Deep ultraviolet, Silicon, Reflectometry

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Proceedings Article | 19 March 2018 Paper

A study on enhancing EUV resist sensitivity (2)

Atsushi Sekiguchi, Yoko Matsumoto, Mariko Isono, Michiya Naito, Yoshiyuki Utsumi, Tetsuo Harada, Takeo Watanabe

Proceedings Volume 10583, 1058320 (2018) https://doi.org/10.1117/12.2294598

KEYWORDS: Extreme ultraviolet, Metals, Absorption, Extreme ultraviolet lithography, Polymers, Tin, Tellurium, Diffusion, Prototyping, Transmittance

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Proceedings Article | 26 October 2017 Paper

A study on enhancing EUV resist sensitivity (2)

Atsushi Sekiguchi, Yoko Matsumoto, Michiya Naito, Yoshiyuki Utsumi, Tetsuo Harada, Takeo Watanabe

Proceedings Volume 10450, 104501E (2017) https://doi.org/10.1117/12.2280377

KEYWORDS: Metals, Extreme ultraviolet, Absorption, Extreme ultraviolet lithography, Polymers, Tin, Tellurium, Diffusion, Prototyping, Transmittance

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Proceedings Article | 16 October 2017 Paper

Development of the negative-tone molecular resists for EB/EUVL having high EUV absorption capacity and molecular design method

Takashi Sato, Tomoaki Takigawa, Yuta Togashi, Takumi Toida, Masatoshi Echigo, Tetsuo Harada, Takeo Watanabe, Hiroto Kudo

Proceedings Volume 10450, 104501H (2017) https://doi.org/10.1117/12.2280514

KEYWORDS: Extreme ultraviolet, Absorption, Extreme ultraviolet lithography, Lithography

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Proceedings Article | 13 July 2017 Paper

Observation of EUVL mask using coherent EUV scatterometry microscope with high-harmonic-generation EUV source

Daiki Mamezaki, Tetsuo Harada, Yutaka Nagata, Takeo Watanabe

Proceedings Volume 10454, 1045413 (2017) https://doi.org/10.1117/12.2275400

KEYWORDS: Extreme ultraviolet, Photomasks, Diffraction, Extreme ultraviolet lithography, Microscopes, Phase shift keying, CCD cameras, Mirrors, Scatterometry, Charge-coupled devices

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Proceedings Article | 24 March 2017 Paper

In-situ measurement of outgassing generated from EUV resist including metal oxide nanoparticles during electron irradiation

Seiji Takahashi, Yoichi Minami, Mikio Kadoi, Yoko Matsumoto, Atsushi Sekiguchi, Takeo Watanabe

Proceedings Volume 10143, 1014327 (2017) https://doi.org/10.1117/12.2257939

KEYWORDS: Metals, Oxides, Nanoparticles, Extreme ultraviolet lithography, Mass spectrometry, Analytical research, Zirconium dioxide, Ions, Polymers, Semiconducting wafers, Imaging systems

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Proceedings Article | 24 March 2017 Paper

A study on enhancing EUV resist sensitivity

Atsushi Sekiguchi, Tetsuo Harada, Takeo Watanabe

Proceedings Volume 10143, 1014322 (2017) https://doi.org/10.1117/12.2255650

KEYWORDS: Extreme ultraviolet, Metals, Extreme ultraviolet lithography, Zirconium dioxide, Absorption, Synchrotrons, Polymers, Nanoparticles, Synchrotron radiation, Transmittance, Coating, Thin film coatings, Silicon

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Proceedings Article | 25 October 2016 Paper

Observation results of actual phase defects using micro coherent EUV scatterometry microscope

Hiraku Hashimoto, Tetsuo Harada, Takeo Watanabe

Proceedings Volume 9985, 99850K (2016) https://doi.org/10.1117/12.2246945

KEYWORDS: Extreme ultraviolet, Scatterometry, Microscopes, Extreme ultraviolet lithography, Photomasks, Atomic force microscopy, Particles, Scattering, Inspection, Phase shifts

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Proceedings Article | 25 October 2016 Paper

Development of actual EUV mask observation method for micro coherent EUV scatterometry microscope

T. Harada, H. Hashimoto, T. Watanabe

Proceedings Volume 9985, 99851T (2016) https://doi.org/10.1117/12.2242809

KEYWORDS: Extreme ultraviolet, Photomasks, Microscopes, Diffraction, Scatterometry, Extreme ultraviolet lithography, Speckle, Signal detection, CCD cameras, Multilayers

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Proceedings Article | 18 March 2016 Paper

EUV resist outgassing analysis for the new platform resists at EIDEC

Eishi Shiobara, Yukiko Kikuchi, Shinji Mikami, Takeshi Sasami, Takashi Kamizono, Shinya Minegishi, Takakazu Kimoto, Toru Fujimori, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshita, Satoshi Tanaka

Proceedings Volume 9776, 97762H (2016) https://doi.org/10.1117/12.2219424

KEYWORDS: Contamination, Extreme ultraviolet, Extreme ultraviolet lithography, Metals, Hydrogen, Chemical elements, Mirrors, Reflectivity, Zirconium, Aluminum, Silicon, Germanium

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The suppression of outgassing from the EUV resist is one of the significant challenges, which has to be addressed for realizing EUV lithography (EUVL). The outgassing might be the main contributor involved in the contamination of the mirror optics in scanners. This may result in reflectivity losses. The pragmatic outgassing test that utilizes the witness sample (WS) was used as a general method to quantify the outgassing level for commercially available chemically amplified resists (CAR). There are two types of contaminations. The first type of contamination involves a cleanable contamination that mainly comprises hydrocarbons that can be removed by the hydrogen radical cleaning. Another type of contamination includes the noncleanable contamination that remains on the WS even after hydrogen radical cleaning. Several outgas qualification results were evaluated at the EIDEC [1, 2]. The data indicated that contaminations by the CAR mainly comprised the cleanable contaminations. The data also indicated that there were almost negligible noncleanable contaminations from the CAR. EUV resist communities accelerate the development of high sensitivity resists to compensate the low power of the EUV source. Nonchemically amplified resist (nonCAR) with a new platform is a candidate for high sensitivity resists. The nonCAR includes some types of metal elements with high absorbance for EUV light. There is very limited research on the outgassing characteristics of the nonCAR. In this study, we considered an EUV exposure process in the actual EUV scanner and EUV resists were exposed in a hydrogen environment. A potential risk could result from the reaction of the hydrogen radicals generated by the EUV light with the metal elements in the nonCAR and the metal hydride outgases from the resist. This would result in a noncleanable contamination on the EUV mirror [3]. The knowledge with respect to outgassing from an organic metal complex is insufficient even in a vacuum condition. Hence, the study involved the preparation of certain types of organic metal complexes as model materials. Then, the outgassing evaluations for the materials were carried out as a fundamental studies in a vacuum condition. The results were reported in this study.

SPIE Journal Paper | 18 February 2016

Phase imaging results of phase defect using micro-coherent extreme ultraviolet scatterometry microscope

Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita, Takeo Watanabe

JM3, Vol. 15, Issue 02, 021007, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021007

KEYWORDS: Extreme ultraviolet, Microscopes, Diffraction, Extreme ultraviolet lithography, Photomasks, CCD cameras, Phase imaging, Scatterometry, Reflection, Coherence imaging

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Proceedings Article | 9 November 2015 Paper

Phase imaging results of phase defect using micro coherent EUV scatterometry microscope

Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita, Takeo Watanabe

Proceedings Volume 9635, 96351E (2015) https://doi.org/10.1117/12.2205304

KEYWORDS: Microscopes, Extreme ultraviolet, Phase contrast, Phase imaging, Extreme ultraviolet lithography, Coherence imaging, Diffraction, Photomasks, CCD cameras, Reconstruction algorithms, Reflection

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Proceedings Article | 9 July 2015 Paper

Development of a reflectometer for a large EUV mirror in NewSUBARU

Haruki Iguchi, Hiraku Hashimoto, Masaki Kuki, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 9658, 965819 (2015) https://doi.org/10.1117/12.2199014

KEYWORDS: Reflectometry, Mirrors, Extreme ultraviolet, Reflectivity, Photomasks, Spherical lenses, Switching, Multilayers, Extreme ultraviolet lithography, Synchrotrons

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Proceedings Article | 9 July 2015 Paper

EUV mask observations using a coherent EUV scatterometry microscope with a high-harmonic-generation source

Takahiro Fujino, Yusuke Tanaka, Tetsuo Harada, Yutaka Nagata, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 9658, 965818 (2015) https://doi.org/10.1117/12.2194253

KEYWORDS: Extreme ultraviolet, Diffraction, Photomasks, Mirrors, Extreme ultraviolet lithography, Microscopes, 3D metrology, CCD cameras, Relays, Scatterometry

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Proceedings Article | 13 March 2015 Paper

Analysis of EUV resist outgassing depended on the dosage

E. Shiobara, I. Takagi, Y. Kikuchi, T. Sasami, S. Minegishi, T. Fujimori, T. Watanabe, T. Harada, H. Kinoshita, S. Inoue

Proceedings Volume 9422, 942210 (2015) https://doi.org/10.1117/12.2085692

KEYWORDS: Contamination, Extreme ultraviolet lithography, Extreme ultraviolet, Mirrors, Reflectivity, Systems modeling, Spectroscopy, Data modeling, Scanners, EUV optics

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Proceedings Article | 13 March 2015 Paper

Study of Dill's B parameter measurement of EUV resist

Atsushi Sekiguchi, Yoko Matsumoto, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 9422, 94222L (2015) https://doi.org/10.1117/12.2082883

KEYWORDS: Transmittance, Extreme ultraviolet, Absorption, Coating, Hybrid fiber optics, Extreme ultraviolet lithography, Electrons, Absorbance, Chemical species, Silicon

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SPIE Journal Paper | 24 June 2014 Open Access

Observation of phase defect on extreme ultraviolet mask using an extreme ultraviolet microscope

Tsuyoshi Amano, Tsuneo Terasawa, Hidehiro Watanabe, Mitsunori Toyoda, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

JM3, Vol. 13, Issue 02, 023012, (June 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.2.023012

KEYWORDS: Extreme ultraviolet, Microscopes, Photomasks, Scanning probe microscopy, Quartz, Transmission electron microscopy, Extreme ultraviolet lithography, Phase measurement, Scanning probe microscopes, Optical lithography

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