Prof. Takeo Watanabe Profile

Prof. Takeo Watanabe

Director, Professor at Univ of Hyogo

SPIE Involvement:

Author

Publications (62)

Proceedings Article | 26 October 2020 Presentation + Paper

Resist pattern inspection for defect reduction in sub-15 nm templates

Takeharu Motokawa, Machiko Suenaga, Kazuki Hagihara, Noriko Iida nee Sakurai, Ryu Komatsu, Hideaki Sakurai, Shingo Kanamitsu, Keisuke Tsuda, Tetsuo Harada, Takeo Watanabe

Proc. SPIE. 11518, Photomask Technology 2020

KEYWORDS: Microscopes, Coherence imaging, Inspection, Electron microscopes, Scanning electron microscopy, Scatterometry, Double patterning technology, High volume manufacturing, Nanoimprint lithography, Defect inspection

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Proceedings Article | 26 September 2019 Presentation + Paper

Development of an EUV and OoB Reflectometer at NewSUBARU synchrotron light facility

Keisuke Tsuda, Tetsuo Harada, Takeo Watanabe

Proc. SPIE. 11148, Photomask Technology 2019

KEYWORDS: Mirrors, Ultraviolet radiation, Reflectometry, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Monochromators, Vacuum ultraviolet, Plasma, Light

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Proceedings Article | 3 October 2018 Presentation + Paper

In-situ measurement of outgassing generated from EUV metal oxide nanoparticles resist during electron irradiation

Y. Minami, S. Takahashi, H. Minami, Y. Matsumoto, M. Kadoi, A. Sekiguchi, T. Watanabe

Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018

KEYWORDS: Oxides, Contamination, Nanoparticles, Metals, Particles, Mass spectrometry, Extreme ultraviolet, Extreme ultraviolet lithography

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Proceedings Article | 3 October 2018 Paper

Development of absorption-coefficient-measurement method of EUV resist by direct-resist coating on a photodiode

Shota Niihara, Tetsuo Harada, Takeo Watanabe

Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018

KEYWORDS: Polymethylmethacrylate, Deep ultraviolet, Silicon, Coating, Photodiodes, Reflectometry, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography, Absorption

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Proceedings Article | 3 October 2018 Presentation + Paper

Reflectance measurement of EUV mirrors with s- and p-polarized light using polarization control units

Tetsuo Harada, Takeo Watanabe

Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018

KEYWORDS: Multilayers, Polarization, Reflectivity, Polarizers, Reflectometry, Extreme ultraviolet, Extreme ultraviolet lithography, Polarization control

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Proceedings Article | 19 March 2018 Paper

A study on enhancing EUV resist sensitivity (2)

Atsushi Sekiguchi, Yoko Matsumoto, Mariko Isono, Michiya Naito, Yoshiyuki Utsumi, Tetsuo Harada, Takeo Watanabe

Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX

KEYWORDS: Polymers, Metals, Diffusion, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography, Tellurium, Prototyping, Tin, Absorption

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Proceedings Article | 26 October 2017 Paper

A study on enhancing EUV resist sensitivity (2)

Atsushi Sekiguchi, Yoko Matsumoto, Michiya Naito, Yoshiyuki Utsumi, Tetsuo Harada, Takeo Watanabe

Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017

KEYWORDS: Polymers, Metals, Diffusion, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography, Tellurium, Prototyping, Tin, Absorption

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Proceedings Article | 16 October 2017 Paper

Development of the negative-tone molecular resists for EB/EUVL having high EUV absorption capacity and molecular design method

Takashi Sato, Tomoaki Takigawa, Yuta Togashi, Takumi Toida, Masatoshi Echigo, Tetsuo Harada, Takeo Watanabe, Hiroto Kudo

Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017

KEYWORDS: Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Absorption

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Proceedings Article | 13 July 2017 Paper

Observation of EUVL mask using coherent EUV scatterometry microscope with high-harmonic-generation EUV source

Daiki Mamezaki, Tetsuo Harada, Yutaka Nagata, Takeo Watanabe

Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology

KEYWORDS: Microscopes, Diffraction, Mirrors, Phase shift keying, CCD cameras, Scatterometry, Photomasks, Extreme ultraviolet, Charge-coupled devices, Extreme ultraviolet lithography

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Proceedings Article | 24 March 2017 Paper

In-situ measurement of outgassing generated from EUV resist including metal oxide nanoparticles during electron irradiation

Seiji Takahashi, Yoichi Minami, Mikio Kadoi, Yoko Matsumoto, Atsushi Sekiguchi, Takeo Watanabe

Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII

KEYWORDS: Oxides, Imaging systems, Nanoparticles, Polymers, Metals, Ions, Mass spectrometry, Extreme ultraviolet lithography, Analytical research, Semiconducting wafers, Zirconium dioxide

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Proceedings Article | 24 March 2017 Paper

A study on enhancing EUV resist sensitivity

Atsushi Sekiguchi, Tetsuo Harada, Takeo Watanabe

Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII

KEYWORDS: Nanoparticles, Polymers, Metals, Silicon, Coating, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Synchrotron radiation, Thin film coatings, Zirconium dioxide, Absorption

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Proceedings Article | 25 October 2016 Paper

Observation results of actual phase defects using micro coherent EUV scatterometry microscope

Hiraku Hashimoto, Tetsuo Harada, Takeo Watanabe

Proc. SPIE. 9985, Photomask Technology 2016

KEYWORDS: Microscopes, Scattering, Particles, Inspection, Atomic force microscopy, Scatterometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Phase shifts

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Proceedings Article | 25 October 2016 Paper

Development of actual EUV mask observation method for micro coherent EUV scatterometry microscope

T. Harada, H. Hashimoto, T. Watanabe

Proc. SPIE. 9985, Photomask Technology 2016

KEYWORDS: Microscopes, Diffraction, Multilayers, Speckle, CCD cameras, Scatterometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Signal detection

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Proceedings Article | 18 March 2016 Paper

EUV resist outgassing analysis for the new platform resists at EIDEC

Eishi Shiobara, Yukiko Kikuchi, Shinji Mikami, Takeshi Sasami, Takashi Kamizono, Shinya Minegishi, Takakazu Kimoto, Toru Fujimori, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshita, Satoshi Tanaka

Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII

KEYWORDS: Mirrors, Contamination, Metals, Germanium, Silicon, Hydrogen, Reflectivity, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Chemical elements, Zirconium

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The suppression of outgassing from the EUV resist is one of the significant challenges, which has to be addressed for realizing EUV lithography (EUVL). The outgassing might be the main contributor involved in the contamination of the mirror optics in scanners. This may result in reflectivity losses. The pragmatic outgassing test that utilizes the witness sample (WS) was used as a general method to quantify the outgassing level for commercially available chemically amplified resists (CAR). There are two types of contaminations. The first type of contamination involves a cleanable contamination that mainly comprises hydrocarbons that can be removed by the hydrogen radical cleaning. Another type of contamination includes the noncleanable contamination that remains on the WS even after hydrogen radical cleaning. Several outgas qualification results were evaluated at the EIDEC [1, 2]. The data indicated that contaminations by the CAR mainly comprised the cleanable contaminations. The data also indicated that there were almost negligible noncleanable contaminations from the CAR. EUV resist communities accelerate the development of high sensitivity resists to compensate the low power of the EUV source. Nonchemically amplified resist (nonCAR) with a new platform is a candidate for high sensitivity resists. The nonCAR includes some types of metal elements with high absorbance for EUV light. There is very limited research on the outgassing characteristics of the nonCAR. In this study, we considered an EUV exposure process in the actual EUV scanner and EUV resists were exposed in a hydrogen environment. A potential risk could result from the reaction of the hydrogen radicals generated by the EUV light with the metal elements in the nonCAR and the metal hydride outgases from the resist. This would result in a noncleanable contamination on the EUV mirror [3]. The knowledge with respect to outgassing from an organic metal complex is insufficient even in a vacuum condition. Hence, the study involved the preparation of certain types of organic metal complexes as model materials. Then, the outgassing evaluations for the materials were carried out as a fundamental studies in a vacuum condition. The results were reported in this study.

SPIE Journal Paper | 18 February 2016

Phase imaging results of phase defect using micro-coherent extreme ultraviolet scatterometry microscope

Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita, Takeo Watanabe

JM3 Vol. 15 Issue 02

KEYWORDS: Extreme ultraviolet, Microscopes, Diffraction, Extreme ultraviolet lithography, Photomasks, CCD cameras, Phase imaging, Scatterometry, Reflection, Coherence imaging

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Proceedings Article | 9 November 2015 Paper

Phase imaging results of phase defect using micro coherent EUV scatterometry microscope

Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita, Takeo Watanabe

Proc. SPIE. 9635, Photomask Technology 2015

KEYWORDS: Microscopes, Diffraction, Coherence imaging, Phase contrast, Reflection, CCD cameras, Phase imaging, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Reconstruction algorithms

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Proceedings Article | 9 July 2015 Paper

Development of a reflectometer for a large EUV mirror in NewSUBARU

Haruki Iguchi, Hiraku Hashimoto, Masaki Kuki, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII

KEYWORDS: Mirrors, Multilayers, Switching, Reflectivity, Reflectometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Spherical lenses

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Proceedings Article | 9 July 2015 Paper

EUV mask observations using a coherent EUV scatterometry microscope with a high-harmonic-generation source

Takahiro Fujino, Yusuke Tanaka, Tetsuo Harada, Yutaka Nagata, Takeo Watanabe, Hiroo Kinoshita

Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII

KEYWORDS: Microscopes, Diffraction, Mirrors, CCD cameras, Scatterometry, 3D metrology, Relays, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

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Proceedings Article | 13 March 2015 Paper

Analysis of EUV resist outgassing depended on the dosage

E. Shiobara, I. Takagi, Y. Kikuchi, T. Sasami, S. Minegishi, T. Fujimori, T. Watanabe, T. Harada, H. Kinoshita, S. Inoue

Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI

KEYWORDS: Mirrors, Contamination, Data modeling, Scanners, Spectroscopy, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Systems modeling, EUV optics

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Proceedings Article | 13 March 2015 Paper

Study of Dill's B parameter measurement of EUV resist

Atsushi Sekiguchi, Yoko Matsumoto, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI

KEYWORDS: Chemical species, Electrons, Silicon, Coating, Transmittance, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Hybrid fiber optics, Absorption

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SPIE Journal Paper | 24 June 2014

Observation of phase defect on extreme ultraviolet mask using an extreme ultraviolet microscope

Tsuyoshi Amano, Tsuneo Terasawa, Hidehiro Watanabe, Mitsunori Toyoda, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

JM3 Vol. 13 Issue 02

KEYWORDS: Extreme ultraviolet, Microscopes, Photomasks, Scanning probe microscopy, Quartz, Transmission electron microscopy, Extreme ultraviolet lithography, Phase measurement, Scanning probe microscopes, Optical lithography

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