Dr. Takeshi Koshiba Profile

Dr. Takeshi Koshiba

at Toshiba Corp

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 26 March 2010 Paper

High resolution positive-working molecular resist attached with alicyclic acid-leaving group

Arisa Yamada, Shigeki Hattori, Satoshi Saito, Koji Asakawa, Takeshi Koshiba, Tetsuro Nakasugi

Proceedings Volume 7639, 76390S (2010) https://doi.org/10.1117/12.851392

KEYWORDS: Etching, Lithography, Molecules, Resistance, Scanning electron microscopy, Line width roughness, Oxygen, Quantum efficiency, Photoresist processing, Polymers

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SPIE Journal Paper | 1 October 2009

Process liability evaluation for extreme ultraviolet lithography

Hajime Aoyama, Kazuo Tawarayama, Yuusuke Tanaka, Daisuke Kawamura, Yukiyasu Arisawa, Taiga Uno, Takashi Kamo, Toshihiko Tanaka, Toshiro Itani, Hiroyuki Tanaka, Yumi Nakajima, Ryoichi Inanami, Kosuke Takai, Koji Murano, Takeshi Koshiba, Kohji Hashimoto, Ichiro Mori

JM3, Vol. 8, Issue 04, 041508, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238542

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Point spread functions, Semiconducting wafers, Lithography, Photoresist processing, Semiconductors, Projection systems, Tungsten

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Proceedings Article | 18 March 2009 Paper

A study of filling process for UV nanoimprint lithography using a fluid simulation

Ikuo Yoneda, Yasutada Nakagawa, Shinji Mikami, Hiroshi Tokue, Takumi Ota, Takeshi Koshiba, Masamitsu Ito, Koji Hashimoto, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 7271, 72712A (2009) https://doi.org/10.1117/12.813654

KEYWORDS: Nanoimprint lithography, Ultraviolet radiation, Photoresist processing, Capillaries, Lithography, Diffusion, Nitrogen, Semiconductors, Line edge roughness, Ranging

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Proceedings Article | 18 March 2009 Paper

Process liability evaluation for EUVL

Proceedings Volume 7271, 727120 (2009) https://doi.org/10.1117/12.813484

KEYWORDS: Photomasks, Critical dimension metrology, Extreme ultraviolet lithography, Point spread functions, Semiconducting wafers, Logic, Lithography, Electronic design automation, Projection systems, Mask making

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Proceedings Article | 1 December 2008 Paper

What is the strongest candidate in lithography for 2x nm HP and beyond?　

Kohji Hashimoto, Ikuo Yoneda, Takeshi Koshiba, Shinji Mikami, Takumi Ota, Masamitsu Ito, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 7140, 71400A (2008) https://doi.org/10.1117/12.810264

KEYWORDS: Lithography, Nanoimprint lithography, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Double patterning technology, Photomasks, Manufacturing, Signal processing, Optical lithography

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Proceedings Article | 26 March 2008 Paper

Novel molecular resist based on an amorphous truxene derivative

Shigeki Hattori, Satoshi Saito, Koji Asakawa, Takeshi Koshiba, Tetsuro Nakasugi

Proceedings Volume 6923, 69230J (2008) https://doi.org/10.1117/12.770944

KEYWORDS: Molecules, Scanning electron microscopy, Silicon, Lithography, Electron beams, Line edge roughness, Thin films, Microscopes, Solids, Crystals

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Proceedings Article | 14 March 2008 Paper

Study of nanoimprint lithography for applications toward 22nm node CMOS devices

Ikuo Yoneda, Shinji Mikami, Takumi Ota, Takeshi Koshiba, Masamitsu Ito, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 6921, 692104 (2008) https://doi.org/10.1117/12.771149

KEYWORDS: Nanoimprint lithography, Optical alignment, Multilayers, Line edge roughness, Lithography, CMOS devices, Metals, Inspection, Overlay metrology, Semiconducting wafers

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Proceedings Article | 16 March 2007 Paper

Recent progress of a character projection-type low-energy electron-beam direct writing system

Kouhei Noguchi, Katsuhide Watanabe, Hidetoshi Kinoshita, Hiroyuki Shinozaki, Yasushi Kojima, Satoshi Morita, Fumihiko Nakamura, Norihiro Yamaguchi, Kazuhiko Kushitani, Tetsuro Nakasugi, Takeshi Koshiba, Takumi Oota

Proceedings Volume 6517, 65172I (2007) https://doi.org/10.1117/12.712118

KEYWORDS: Amplifiers, Semiconducting wafers, Data conversion, Distortion, Electron beam direct write lithography, Optical alignment, Control systems, Electrons, Data processing, Process control

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Proceedings Article | 15 March 2007 Paper

A study of voltage contrast image using Monte Carlo simulation

T. Ota, T. Koshiba, T. Nakasugi

Proceedings Volume 6517, 651712 (2007) https://doi.org/10.1117/12.711405

KEYWORDS: Monte Carlo methods, Virtual colonoscopy, Silicon, Scattering, Polymethylmethacrylate, Electron beams, Computing systems, Scanning electron microscopy, Lithography, 3D image processing

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Proceedings Article | 15 March 2007 Paper

Alignment method of low-energy electron-beam direct writing system EBIS using voltage contrast image

Takeshi Koshiba, Takumi Ota, Tetsuro Nakasugi, Fumihiko Nakamura, Katsuhide Watanabe, Kazuyoshi Sugihara

Proceedings Volume 6517, 651713 (2007) https://doi.org/10.1117/12.711368

KEYWORDS: Virtual colonoscopy, Optical alignment, Signal detection, Silicon, Metals, Image analysis, Overlay metrology, Lithography, Distortion, Back end of line

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Proceedings Article | 24 March 2006 Paper

A character projection low energy electron beam direct writing system for device of small production lot with a variety of design

Fumihiko Nakamura, Katsuhide Watanabe, Hidetoshi Kinoshita, Hiroyuki Shinozaki, Yasushi Kojima, Satoshi Morita, Kouhei Noguchi, Norihiro Yamaguchi, Hisashi Isokawa, Kazuhiko Kushitani, Takayuki Satoh, Takeshi Koshiba, Takumi Oota, Tetsuro Nakasugi, Hiroyuki Mizuno

Proceedings Volume 6151, 61512A (2006) https://doi.org/10.1117/12.655963

KEYWORDS: Semiconducting wafers, Electron beam direct write lithography, Control systems, Electron beams, Vestigial sideband modulation, Data conversion, Beam shaping, Photomasks, Optical alignment, Amplifiers

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Showing 5 of 11 publications

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