Dr. Takeshi Yamane
SPIE Involvement:
Author
Publications (42)

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Metrology, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Edge roughness, Defect inspection

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Lithographic illumination, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Tantalum, Semiconducting wafers

Proceedings Article | 12 June 2018 Paper
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Visualization, Inspection, Atomic force microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical alignment, Semiconducting wafers, Tolerancing

Proceedings Article | 19 March 2018 Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Wafer-level optics, Multilayers, Image processing, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical alignment, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 13 July 2017 Paper
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Multilayers, Image processing, Particles, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Critical dimension metrology, Semiconducting wafers

Showing 5 of 42 publications
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