Dr. Tamer T. Elazhary Profile

Dr. Tamer T. Elazhary

Technology lead at Meta

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Author

Publications (8)

Proceedings Article | 14 October 2010 Paper

Remote sensing CubeSat

Ayman Mahmoud, Tamer Elazhary, Amal Zaki

Proceedings Volume 7826, 78262I (2010) https://doi.org/10.1117/12.865116

KEYWORDS: Satellites, Sensors, Satellite imaging, Image resolution, Modulation transfer functions, Satellite communications, Remote sensing, Signal to noise ratio, Ocean optics, Cameras

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Proceedings Article | 10 March 2010 Paper

Improved process window modeling techniques

Christian Zuniga, Tamer Tawfik

Proceedings Volume 7640, 76403A (2010) https://doi.org/10.1117/12.846792

KEYWORDS: Calibration, Data modeling, Process modeling, Optical proximity correction, Optical calibration, Critical dimension metrology, Data processing, Photoresist processing, Finite element methods, Instrument modeling

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Proceedings Article | 23 September 2009 Paper

Effect of SRAF placement on process window for technology nodes that uses variable etch bias

Ahmed Seoud, Tamer Tawfik

Proceedings Volume 7488, 74883M (2009) https://doi.org/10.1117/12.829742

KEYWORDS: SRAF, Etching, Photovoltaics, Optical proximity correction, Resolution enhancement technologies, Photomasks, Visualization, Semiconducting wafers, Photoresist processing, Statistical analysis

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Proceedings Article | 16 March 2009 Paper

New approach to determine best beam focus

Christian Zuniga, Tamer Tawfik

Proceedings Volume 7274, 72742S (2009) https://doi.org/10.1117/12.814015

KEYWORDS: Diffraction, Calibration, Optical proximity correction, Critical dimension metrology, Optical simulations, Optical lithography, Resolution enhancement technologies, Thin films, Beam analyzers, Process modeling

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Proceedings Article | 16 March 2009 Paper

Modeling mask scattered field at oblique incidence

Tamer Tawfik, Ahmed Morshed, Diaa Khalil

Proceedings Volume 7274, 727433 (2009) https://doi.org/10.1117/12.814018

KEYWORDS: Error analysis, Diffraction, Photomasks, Panoramic photography, Image analysis, Critical dimension metrology, Scattering, Resolution enhancement technologies, Fiber optic illuminators, Optical lithography

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Proceedings Article | 17 October 2008 Paper

Characterizing OPC model accuracy versus lens induced polarization effects in hyper NA immersion lithography

Tamer Tawfik, Edita Tejnil

Proceedings Volume 7122, 712245 (2008) https://doi.org/10.1117/12.801516

KEYWORDS: Optical proximity correction, Polarization, Calibration, Data modeling, Systems modeling, Apodization, Immersion lithography, Lithography, Polarizers, Wave plates

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Proceedings Article | 17 October 2008 Paper

Toward faster OPC convergence: advanced analysis for OPC iterations and simulation environment

Mohamed Bahnas, Mohamed Al-Imam, Tamer Tawfik

Proceedings Volume 7122, 712248 (2008) https://doi.org/10.1117/12.801878

KEYWORDS: Optical proximity correction, Photomasks, Optical simulations, Semiconducting wafers, Computer simulations, Silicon, SRAF, Signal attenuation, Manufacturing, Image processing

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Proceedings Article | 21 March 2007 Paper

Optimizing gate layer OPC correction and SRAF placement for maximum design manufacturability

Travis Brist, Le Hong, Ayman Yehia, Tamer Tawfik, Shumay Shang, Kyohei Sakajiri, John Sturtevant

Proceedings Volume 6521, 65211L (2007) https://doi.org/10.1117/12.712748

KEYWORDS: SRAF, Optical proximity correction, Critical dimension metrology, Manufacturing, Photomasks, Model-based design, Antimony, Design for manufacturability, Optimization (mathematics), Resolution enhancement technologies

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Showing 5 of 8 publications

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