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Tatsuo Fukui
at Nikon Corp
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Author
Publications (1)
Proceedings Article | 24 May 2004 Paper
Overlay measurement tool up to 70-nm design rule
Takeshi Endo, Tomoaki Yamada, Hiroshi Aoki, Tatsuo Fukui
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.535007
KEYWORDS: Overlay metrology, Aspheric lenses, Distortion, Semiconducting wafers, Lithography, Monochromatic aberrations, Optical components, Etching, Wavefront aberrations, Manufacturing
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