Dr. Ted Liang
Principal Engineer
SPIE Involvement:
Conference Program Committee | Author | Editor
Publications (39)

SPIE Journal Paper | 31 October 2024
Ted Liang, Hiroki Miyai, Safak Sayan, Michiteru Mizoguchi, Ko Gondaira, Masayasu Nishizawa, Tomohiro Suzuki, Toshiyuki Todoroki, Yuwei Li, Frank Abboud
JM3, Vol. 24, Issue 01, 011006, (October 2024) https://doi.org/10.1117/12.10.1117/1.JMM.24.1.011006
KEYWORDS: Inspection, Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Light sources, Defect detection, Signal to noise ratio, Tin, Printing, Light sources and illumination

Proceedings Article | 23 March 2021 Presentation + Paper
Proceedings Volume 11609, 116090L (2021) https://doi.org/10.1117/12.2588788

Proceedings Article | 23 March 2020 Paper
Proceedings Volume 11323, 1132310 (2020) https://doi.org/10.1117/12.2554496
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Defect detection, Optical inspection, Semiconducting wafers, Deep ultraviolet, EUV optics

SPIE Journal Paper | 27 December 2017 Open Access
JM3, Vol. 16, Issue 04, 041001, (December 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041001
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Optical lithography, Pellicles, Inspection, Optical proximity correction, Free electron lasers, Printing, Scanners

Proceedings Article | 18 March 2016 Open Access Paper
Proceedings Volume 9776, 977602 (2016) https://doi.org/10.1117/12.2225014
KEYWORDS: Extreme ultraviolet, Reticles, Pellicles, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Optical lithography, Inspection, Yield improvement

Proceedings Article | 11 November 2015 Paper
Proceedings Volume 9635, 963509 (2015) https://doi.org/10.1117/12.2202724
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Particles, Scanners, Semiconducting wafers, Deep ultraviolet, Defect inspection

Proceedings Article | 16 March 2015 Paper
Yow-Gwo Wang, Ryan Miyakawa, Weilun Chao, Markus Benk, Antoine Wojdyla, Alex Donoghue, David Johnson, Kenneth Goldberg, Andy Neureuther, Ted Liang, Patrick Naulleau
Proceedings Volume 9422, 94221C (2015) https://doi.org/10.1117/12.2087532
KEYWORDS: Signal to noise ratio, Phase contrast, Phase shifts, Apodization, Extreme ultraviolet, Inspection, Microscopes, Interference (communication), Absorption, Defect detection

Proceedings Article | 17 April 2014 Paper
C. Gonzalez, W. Slingenbergh, R. Timilsina, J.-H. Noh, M. Stanford, B. Lewis, K. Klein, T. Liang, J. Fowlkes, P. Rack
Proceedings Volume 9048, 90480M (2014) https://doi.org/10.1117/12.2046712
KEYWORDS: Nickel, Helium, Neon, Ruthenium, Ions, Etching, Electron beams, Extreme ultraviolet, Transmission electron microscopy, Monte Carlo methods

Proceedings Article | 20 March 2010 Paper
Sherjang Singh, Ssuwei Chen, Tobias Wähler, Rik Jonckheere, Ted Liang, Robert Chen, Uwe Dietze
Proceedings Volume 7636, 76360Y (2010) https://doi.org/10.1117/12.847026
KEYWORDS: Reflectivity, Ultraviolet radiation, Extreme ultraviolet, Ruthenium, Photomasks, Surface roughness, Extreme ultraviolet lithography, Carbon, Particles, Contamination

Proceedings Article | 20 March 2010 Paper
Grant Kloster, Ted Liang, Todd Younkin, Ernisse Putna, Roman Caudillo, Il-Seok Son
Proceedings Volume 7636, 76360M (2010) https://doi.org/10.1117/12.845740
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Scanning electron microscopy, Line width roughness, Optical lithography, Photoresist materials, Lithography, Metrology

Proceedings Article | 23 September 2009 Paper
Proceedings Volume 7488, 74882H (2009) https://doi.org/10.1117/12.829716
KEYWORDS: Photomasks, Critical dimension metrology, Extreme ultraviolet, Inspection, Defect detection, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, Multilayers, Computer simulations

Proceedings Article | 23 September 2009 Paper
Takeya Shimomura, Ted Liang
Proceedings Volume 7488, 74882F (2009) https://doi.org/10.1117/12.831272
KEYWORDS: Particles, Silicon, Extreme ultraviolet, Ruthenium, Photomasks, Scanning probe microscopy, Inspection, Mask cleaning, Scanning electron microscopy, Atomic force microscopy

Proceedings Article | 11 May 2009 Paper
Andy Ma, Ted Liang, Seh-Jin Park, Guojing Zhang, Tomoya Tamura, Kazunori Omata, Yuta Sato, Hal Kusunose
Proceedings Volume 7379, 73790I (2009) https://doi.org/10.1117/12.824259
KEYWORDS: Inspection, Quartz, Silica, Photomasks, Particles, Extreme ultraviolet lithography, Extreme ultraviolet, Defect detection, Surface roughness, Defect inspection

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 727116 (2009) https://doi.org/10.1117/12.814436
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Optical lithography, Extreme ultraviolet, Particles, Photoresist materials, Line width roughness, Reticles, Semiconducting wafers

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 72711F (2009) https://doi.org/10.1117/12.813846
KEYWORDS: Monochromatic aberrations, Extreme ultraviolet, Inspection, Photomasks, Spherical lenses, Extreme ultraviolet lithography, Near field, Computer simulations, Lithography, Image analysis

Proceedings Article | 17 October 2008 Paper
Takeya Shimomura, Ted Liang
Proceedings Volume 7122, 712226 (2008) https://doi.org/10.1117/12.803065
KEYWORDS: Ruthenium, Extreme ultraviolet, Scanning probe microscopy, Reflectivity, Atomic force microscopy, Photomasks, Silicon, Chemistry, Multilayers, Extreme ultraviolet lithography

Proceedings Article | 22 March 2008 Paper
Jing Wang, David Pui, Chaolong Qi, Se-Jin Yook, Heinz Fissan, Erdem Ultanir, Ted Liang
Proceedings Volume 6922, 69220G (2008) https://doi.org/10.1117/12.756741
KEYWORDS: Particles, Silica, Atmospheric particles, Inspection, Quartz, Gold, Calibration, Standards development, Aerosols, Photomasks

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 673016 (2007) https://doi.org/10.1117/12.746707
KEYWORDS: Data modeling, Photomasks, Printing, Photoresist processing, Nanoimprint lithography, Extreme ultraviolet lithography, Image quality, Optical lithography, Image enhancement, Semiconducting wafers

Proceedings Article | 29 May 2007 Paper
Proceedings Volume 6607, 66070R (2007) https://doi.org/10.1117/12.728941
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Inspection, Extreme ultraviolet, Multilayers, Reflectivity, Etching, Mask making, Metrology, Defect inspection

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 62830G (2006) https://doi.org/10.1117/12.681839
KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Reflectivity, Defect inspection, Extreme ultraviolet lithography, Inspection, Ruthenium, Image processing, Optical lithography

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 62830K (2006) https://doi.org/10.1117/12.681844
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Scanning electron microscopy, Printing, Cadmium, Photomicroscopy, Semiconducting wafers, Optical lithography

Proceedings Article | 10 May 2005 Paper
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.604717
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Deep ultraviolet, Scanning electron microscopy, Atomic force microscopy, Contamination, Defect inspection, Extreme ultraviolet lithography, EUV optics

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569176
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Reflectivity, Metrology, Lithography, Optical lithography, Standards development, Mask making

Proceedings Article | 6 December 2004 Paper
Ted Liang, Eric Frendberg, Daniel Bald, Michael Penn, Alan Stivers
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569210
KEYWORDS: Etching, Quartz, Photomasks, Extreme ultraviolet, Chromium, Scanning electron microscopy, Electron beams, Scanning probe microscopy, Ruthenium, Atomic force microscopy

Proceedings Article | 20 August 2004 Paper
Ted Liang, Alan Stivers, Michael Penn, Dan Bald, Chetan Sethi, Volker Boegli, Michael Budach, Klaus Edinger, Petra Spies
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557788
KEYWORDS: Photomasks, Etching, Electron beams, Extreme ultraviolet, Scanning electron microscopy, Ruthenium, Atomic force microscopy, Gases, Chromium, Spatial resolution

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.558816
KEYWORDS: Multilayers, Extreme ultraviolet lithography, Photomasks, Coating, Reflectivity, Opacity, Cameras, Semiconducting wafers, Systems modeling, Scattering

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518388
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Quartz, Confocal microscopy, Scattering, Particles, Signal detection, Extreme ultraviolet

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468199
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect detection, Particles, Gold, Extreme ultraviolet lithography, Semiconducting wafers, Optical spheres, Multilayers

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467298
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Deep ultraviolet, Oxides, Etching, Extreme ultraviolet lithography, Reflectivity, Contamination, Defect inspection

Proceedings Article | 1 August 2002 Paper
David Brinkley, Roy White, Ron Bozak, Ted Liang, Gang Liu
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476998
KEYWORDS: Photomasks, Extreme ultraviolet, Carbon, Contamination, Atomic force microscopy, Image processing, Quartz, Etching, Reflectivity, Phase shifts

Proceedings Article | 1 July 2002 Paper
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472312
KEYWORDS: Etching, Ions, Photomasks, Gallium, Extreme ultraviolet, Electron beams, Quartz, Atomic force microscopy, Chromium, Platinum

Proceedings Article | 1 July 2002 Paper
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472311
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Reflectivity, Silicon, Deep ultraviolet, Reticles, Semiconducting wafers, Multilayers, Glasses

Proceedings Article | 11 March 2002 Paper
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458303
KEYWORDS: Inspection, Reflectivity, Extreme ultraviolet lithography, Photomasks, Deep ultraviolet, Chromium, Image transmission, Optical inspection, Image enhancement, Ruthenium

Proceedings Article | 20 August 2001 Paper
Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436668
KEYWORDS: Photomasks, Etching, Extreme ultraviolet, Metals, Reflectivity, Extreme ultraviolet lithography, Optical lithography, Chromium, Tin, Oxides

Proceedings Article | 22 January 2001 Paper
Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410699
KEYWORDS: Photomasks, Inspection, Charged-particle lithography, Extreme ultraviolet, Reticles, Reflectivity, Semiconducting wafers, Silicon, Ultraviolet radiation, Chromium

Proceedings Article | 22 January 2001 Paper
Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410675
KEYWORDS: Chromium, Photomasks, Etching, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Multilayers, Inspection, Silicon, Semiconducting wafers

Proceedings Article | 19 July 2000 Paper
Pei-yang Yan, Guojing Zhang, Patrick Kofron, Jeffrey Powers, Mark Tran, Ted Liang, Alan Stivers, Fu-Chang Lo
Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392025
KEYWORDS: Etching, Metals, Photomasks, Oxides, Inspection, Extreme ultraviolet lithography, Extreme ultraviolet, Reflectivity, Tantalum, Chromium

Proceedings Article | 30 December 1999 Paper
Avijit Ray-Chaudhuri, Gregory Cardinale, Aaron Fisher, Pawitter Mangat, Ted Liang, Donald Sweeney
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373378
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Multilayers, Photomasks, Optical proximity correction, Line edge roughness, Coating, Mask making, Scanning electron microscopy, Imaging systems

Proceedings Article | 27 May 1996 Paper
Ted Liang, Franco Cerrina, Thomas Lucatorto
Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240473
KEYWORDS: X-rays, Photomasks, Inspection, X-ray lithography, Microscopes, Spatial resolution, Objectives, Carbon, X-ray imaging, Transmission electron microscopy

Showing 5 of 39 publications
Proceedings Volume Editor (2)

SPIE Conference Volume | 4 December 2023

SPIE Conference Volume | 9 December 2022

Conference Committee Involvement (27)
International Conference on Extreme Ultraviolet Lithography 2025
21 September 2025 | Monterey, California, United States
Photomask Technology 2025
21 September 2025 | Monterey, California, United States
Optical and EUV Nanolithography XXXVIII
24 February 2025 | San Jose, California, United States
Photomask Technology 2024
30 September 2024 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2024
30 September 2024 | Monterey, California, United States
Optical and EUV Nanolithography XXXVII
26 February 2024 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2023
2 October 2023 | Monterey, California, United States
Photomask Technology 2023
2 October 2023 | Monterey, California, United States
Optical and EUV Nanolithography XXXVI
27 February 2023 | San Jose, California, United States
Photomask Technology 2022
26 September 2022 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2022
26 September 2022 | Monterey, California, United States
Optical and EUV Nanolithography XXXV
25 April 2022 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2021
27 September 2021 | Online Only, United States
Extreme Ultraviolet (EUV) Lithography XII
22 February 2021 | Online Only, California, United States
International Conference on Extreme Ultraviolet Lithography 2020
21 September 2020 | Online Only, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2019
16 September 2019 | Monterey, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography II
28 February 2011 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography
22 February 2010 | San Jose, California, United States
Showing 5 of 27 Conference Committees
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