Teppei Yamada
at Osaka Univ
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 28 June 2019 Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Oxides, Nanoparticles, Metals, X-rays, Reflectivity, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Zirconium dioxide

Proceedings Article | 12 October 2018 Presentation
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Oxides, Nanoparticles, Polymers, Metals, Diffusion, Extreme ultraviolet lithography, Line edge roughness, Zirconium dioxide, Stochastic processes, Chemically amplified resists

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