Mr. Tetsu Kohyama Profile

Tetsu Kohyama

Imec Lithography Manager at Nihon Entegris G.K.

SPIE Involvement:

Conference Program Committee | Author

Proceedings Article | 9 April 2024 Paper

Updated UPE filter design for point-of-use EUV CAR photoresist filtration for defect improvement

Tetsu Kohyama, Philippe Foubert

Proceedings Volume 12957, 129571K (2024) https://doi.org/10.1117/12.3009768

KEYWORDS: Tunable filters, Extreme ultraviolet lithography, Photoresist materials, Design, Bridges, Extreme ultraviolet, Semiconducting wafers, Optical lithography, Particles, Wafer inspection

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Proceedings Article | 9 April 2024 Paper

An update on the improvement in optimization of point-of-use filtration of metal oxide photoresists

T. Kohyama, K. Choudry, Jan Doise, Shu-Hao Chang, Michael Kocsis, Peter De Schepper, Philippe Foubert

Proceedings Volume 12957, 129571J (2024) https://doi.org/10.1117/12.3009767

KEYWORDS: Tunable filters, Metal oxides, Bridges, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Optical lithography, Defect inspection, Wafer inspection

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Proceedings Article | 1 May 2023 Presentation + Paper

Continued optimization of point-of-use filtration for metal oxide photoresists to reduce defect density

T. Kohyama, Shu-Hao Chang, Jan Doise, Michael Kocsis, Peter De Schepper, Philippe Foubert

Proceedings Volume 12498, 124980A (2023) https://doi.org/10.1117/12.2657509

KEYWORDS: Tunable filters, Metal oxides, Particles, Bridges, Extreme ultraviolet, Photoresist materials, Extreme ultraviolet lithography, Semiconducting wafers, Contamination, Quantum processes

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Proceedings Article | 25 May 2022 Poster + Presentation + Paper

Selective contaminant removal in EUV photoresists using a tailored functionality filter

Tetsu Kohyama, Jad Jaber

Proceedings Volume 12055, 120550Q (2022) https://doi.org/10.1117/12.2613987

KEYWORDS: Photoresist materials, Polymers, Extreme ultraviolet lithography, Stochastic processes, Extreme ultraviolet, Semiconducting wafers, Optical lithography, Yield improvement, Photons, Lithography

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Proceedings Article | 25 May 2022 Paper

Establishing a filter evaluation methodology targeting polymer purification of EUV lithography materials

Joey Yang, Sally Huang, Testu Kohyama

Proceedings Volume 12055, 1205504 (2022) https://doi.org/10.1117/12.2613910

KEYWORDS: Polymers, Stochastic processes, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Photoresist developing, Lithography, Absorption, Semiconductors

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Proceedings Article | 23 March 2020 Paper

A novel filter screening methodology for Si hardmask materials in EUV lithography

T. Kohyama, Kozue Miura

Proceedings Volume 11326, 113261X (2020) https://doi.org/10.1117/12.2551644

KEYWORDS: Polymers, Silicon, Extreme ultraviolet lithography, Optical lithography, Coating, Extreme ultraviolet, Yield improvement, Etching, Lithography, Particles

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Proceedings Article | 25 March 2019 Paper

Bridging the defect gap in EUV photoresist

T. Kohyama, Fumiya Kaneko, Alketa Gjoka, Jad Jaber

Proceedings Volume 10960, 109601V (2019) https://doi.org/10.1117/12.2514969

KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Polymers, Optical lithography, Yield improvement, Bridges, Photons, Photoresist developing, High volume manufacturing, Lithography

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Proceedings Article | 25 March 2019 Paper

Filter technology developments to address defectivity in leading-edge photoresists

T. Kohyama, F. Kaneko, K. Miura, A. Gjoka, J. Jaber

Proceedings Volume 10960, 109601X (2019) https://doi.org/10.1117/12.2514974

KEYWORDS: Photoresist materials, Particles, Manufacturing, Metals, Adsorption, Filtering (signal processing), Optical lithography, Chemistry, Lithography, Extreme ultraviolet lithography

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Proceedings Article | 13 March 2018 Paper

The intrinsic role of membrane morphology to reduce defectivity in advanced photochemicals

Tetsu Kohyama, Aiwen Wu, Kozue Miura, Yasushi Ohyashiki

Proceedings Volume 10586, 1058617 (2018) https://doi.org/10.1117/12.2297389

KEYWORDS: Polymers, Yield improvement, Lithography, Manufacturing, Semiconducting wafers, Industrial chemicals, Chromatography

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Proceedings Article | 13 March 2018 Paper

Targeted removal of metallic contamination from lithography solvents using membrane purifiers

Aiwen Wu, Tetsu Kohyama, James Hamzik, Saksatha Ly, Jad Jaber

Proceedings Volume 10586, 1058618 (2018) https://doi.org/10.1117/12.2297395

KEYWORDS: Metals, Ions, Lithography, Contamination, Adsorption, Photoresist materials, Semiconducting wafers

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Proceedings Article | 27 March 2017 Paper

Development of novel purifiers with appropriate functional groups based on solvent polarities at bulk filtration

Tetsu Kohyama, Fumiya Kaneko, Saksatha Ly, James Hamzik, Jad Jaber, Yoshiaki Yamada

Proceedings Volume 10146, 101461J (2017) https://doi.org/10.1117/12.2257388

KEYWORDS: Metals, Polymers, Manufacturing, Contamination, Process control, Surface plasmons, Lithography, Potassium, Chemical reactions, Iron, Adsorption

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Proceedings Article | 19 March 2012 Paper

The filter adsorption mechanism in photoresist materials

Tetsu Kohyama

Proceedings Volume 8325, 83252I (2012) https://doi.org/10.1117/12.916082

KEYWORDS: Adsorption, Photoresist materials, Polymers, Particles, Liquids, Sodium, Yield improvement, Manufacturing, Metals, Carbon

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Showing 5 of 12 publications

Conference Committee Involvement (1)

Advances in Patterning Materials and Processes XLI

26 February 2024 | San Jose, California, United States

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