Dr. Tetsuro Hanawa
Senior Engineer at Renesas Technology Corp
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Polymers, Photoresist processing, Semiconducting wafers, Lithography, Coating, Photomasks, Chemical analysis, Critical dimension metrology, Fluorine, Scanners

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Polarization, Photomasks, Electromagnetism, Image filtering, Diffraction, Optical lithography, Magnetism, Lithography, Apodization, Radiometric corrections

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Photomasks, Critical dimension metrology, Photography, Resolution enhancement technologies, Printing, Immersion lithography, Logic, Transmittance, Scanning electron microscopy, Image processing

Proceedings Article | 26 March 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Semiconducting wafers, Coating, Silicon, Head-mounted displays, Immersion lithography, Manufacturing, Fluorine, Particles, Calcium, Prototyping

Proceedings Article | 12 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical proximity correction, Photomasks, Opacity, Scanning electron microscopy, Photography, Optical lithography, Image transmission, Imaging systems, Image acquisition, Chromium

Showing 5 of 20 publications
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