CONFERENCE PROCEEDINGS
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Tetsuya Murakami
Principal Technical Specialist at Nihon Pall Ltd.
Publications (3)
Proceedings Article | 27 March 2019 Presentation + Paper
Start-up performance and pattern defectivity improvement using 2nm rated nylon filter developed with lithography filtration expertise
Toru Umeda, Eric Shiu, Takehito Mizuno, Hisashi Nakagawa, Tetsuya Murakami, Shuichi Tsuzuki
Proceedings Volume 10960, 1096018 (2019) https://doi.org/10.1117/12.2515163
KEYWORDS: Coating, Metals, Bridges, Inspection, Semiconducting wafers, Particles, Silicon, Photoresist materials, Lithography, Adsorption
Proceedings Article | 13 March 2018 Paper
Application specific ratings of filters for negative-tone developer
Toru Umeda, Yukihisa Kawada, Kazushi Masuda, Naoya Iguchi, Tetsuya Murakami, Shuichi Tsuzuki
Proceedings Volume 10586, 1058616 (2018) https://doi.org/10.1117/12.2297164
KEYWORDS: Nanoparticles, Particles, Palladium, Inspection, Adsorption, Semiconducting wafers, Metrology, Defect inspection, Extreme ultraviolet lithography, Photoresist developing
Proceedings Article | 27 March 2017 Paper
Metal reduction at bulk chemical filtration
Toru Umeda, Shusaku Daikoku, Shuichi Tsuzuki, Tetsuya Murakami
Proceedings Volume 10146, 1014629 (2017) https://doi.org/10.1117/12.2257937
KEYWORDS: Metals, Sodium, Iron, Semiconductors, Calcium, Chromium, Lithium, Silicon, Semiconducting wafers, Coating, Nickel, Manganese, Chemical analysis
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