We report the development of terahertz intersubband photodetectors based on GaN/AlGaN quantum wells, covering the frequency range that is fundamentally inaccessible to existing III-V semiconductor devices due to Reststrahlen absorption. Two different approaches have been employed to mitigate the deleterious effects of the intrinsic polarization fields of nitride heterostructures: the use of suitably designed double-step quantum wells, and epitaxial growth on semipolar GaN substrates. Promising results are obtained with both approaches, which could be extended to other device applications as a way to utilize the intrinsic advantages of nitride semiconductors for THz intersubband optoelectronics.
Measurements of photoluminescence and its dependence on hydrostatic pressure are performed on a set of InN/nGaN superlattices with one InN monolayer, and with different numbers of GaN monolayers (n from 1 to 40). The emission energies, EPL, measured at ambient pressure, are close to the value of the band gap, Eg, in bulk GaN, in agreement with other experimental findings. The pressure dependence of the emission energies, dEPL/dp, however, resembles that of the InN energy gap. Further, the magnitudes of both EPL and dEPL/dp are significantly higher than those obtained from abinitio calculations for 1InN/nGaN superlattices. Some causes of these discrepancies are suggested...Detailed analysis of the electronic band structure of 1InN/5GaN superlattice is performed showing that the built-in electric field plays an important role in the mInN/nGaN structures. It strongly influences the valence- and conduction-band profiles and thus determines the effective band gap.
In this paper we review our progress in developing AlGaN-based deep UV LEDs with internal quantum efficiency
(IQE) in excess of 50%. This is accomplished by growing the active region of the LEDs by plasma-assisted MBE under
a growth mode which promotes the introduction of deep band structure potential fluctuations in the wells beyond the
statistical ones due alloy disorder. AlGaN-based deep UV-LEDs emitting in the wavelength range from 320 nm to 265
were grown by this method and fabricated into devices. By combining high IQE AlGaN QWs in the active region with
polarization field enhanced carrier injection layers, unpackaged deep UV-LEDs emitting at 295 nm and 273 nm were
obtained with optical output power of 0.35 mW and 1.8 mW at 20 mA continuous wave and 100 mA pulsed drive
current, respectively. The maximum external quantum efficiency of these devices was calculated to be 0.4%, a result
consistent with the low extraction efficiency of only 1-2%.
The electron microscope provides a wide range of techniques that are very well suited for structural characterization of
nanophotonic materials and devices. High-resolution electron microscopy (defect identification and strain field analysis),
Z-contrast imaging in the scanning transmission electron microscope (cation distribution), convergent-beam electron
diffraction (local lattice parameter and strain), and off-axis electron holography (internal electrostatic fields), represent
powerful complementary approaches for distinguishing between the often-competing effects of growth conditions and
compositional differences. These various TEM techniques have been used separately or in tandem in our recent
collaborative studies of III-nitride heterostructures and nanostructures, where lattice mismatch, compositional
inhomogeneities and phase separation were all important considerations that can possibly impair the structural quality of
the final material and/or device. Representative applications that illustrate the prospects and some of the problems
include the following: i) relaxed InN quantum dots; ii) deep-UV-emitting AlGaN quantum wells; iii) near-UV light-emitting
diodes based on InN/GaN quantum wells; and iv) blue-green LEDs based on GaN quantum-dot superlattices.
Due to their large conduction-band offsets, GaN/AlGaN quantum wells can accommodate intersubband transitions at
record short wavelengths throughout the mid-infrared and into the near-infrared spectral regions. As a result, they are
currently the subject of extensive research efforts aimed at extending the spectral reach and functionality of intersubband
optoelectronic devices. Here we review our recent work in this area, based on GaN/AlGaN quantum-well samples
grown by molecular beam epitaxy on sapphire substrates. In particular, we have investigated the intersubband
absorption properties of a wide range of structures, including isolated and coupled quantum wells. Furthermore, we
have developed a new class of ultrafast all-optical switching devices, based on intersubband cross-absorption saturation
in GaN/AlGaN quantum-well waveguides operating at fiber-optic communication wavelengths. Strong self-phase
modulation of ultrafast optical pulses has also been measured in these waveguides, revealing a large refractive-index
nonlinearity which is related to the same intersubband carrier dynamics. Finally, we have demonstrated optically
pumped intersubband light emission from GaN/AlN quantum wells resonantly excited with a pulsed OPO. The
measured room-temperature output spectra are peaked near 2 μm, which represents a new record for the shortest
intersubband emission wavelength from any quantum-well materials system.
Nitride semiconductor quantum structures feature some unique properties for intersubband device development,
including a record large conduction-band offset that allows extending the operating wavelength to the near-infrared
spectral region, and large optical phonon energies that are advantageous for the development of THz devices. In this
paper we review our recent work aimed at the demonstration of novel intersubband device functionalities using these
materials. In particular, we have developed ultrafast all-optical switching devices operating at fiber-optic
communication wavelengths, based on intersubband cross-absorption saturation in GaN/AlN quantum-well waveguides.
Strong self-phase modulation of ultrafast optical pulses has also been measured in these waveguides, revealing a large
intersubband refractive-index nonlinearity which is also promising for all-optical switching applications. Furthermore,
we have demonstrated optically pumped intersubband light emission from GaN/AlN quantum wells at the record short
wavelength of about 2 μm. Finally, we have used a rigorous Monte Carlo model to show that GaN/AlGaN quantum
wells are promising for the development of THz quantum cascade lasers capable in principle of operation without
cryogenic cooling.
In this paper we report the properties of photoconductive detectors fabricated on GaN and AlGaN films produced
by plasma assisted MBE. The spectral dependence of such devices shows a sharp increase over many orders of
magnitude at the gap of the semiconductor but it remains constant at shorter wavelengths consistent with absence of
surface recombination. The mobility-lifetime product, which is the intrinsic figure of merit of the photoconductive gain,
decreases monotonically with the resistivity of GaN films. This result is attributed to the existence of exponential tails
due to potential fluctuations arising from stacking faults, point defects and impurities. In the case of AlGaN alloys
similar dependence of the mobility-lifetime product on film resistivity has been observed. However, the mobility-lifetime
product for films with AlN mole fraction close to 50% is about two orders of magnitude higher than that of GaN films
with comparable resistivity. This result was accounted for by the longer lifetime of the photogenerated carriers due to the
partial atomic ordering in these alloys. The band structure of the ordered and random domains form a type-II
heterostructure and thus photogenerated electrons and holes in these detectors are physically separated, leading to an
increase in recombination lifetime.
The longitudinal component of the polarization field inherent in polar materials, combined with constrained carrier motion along the quantum wells, causes formation of equilibrium plasma nano-sheaths at intersections of quantum wells. The induced short range (nm) potentials of peak voltages much larger than the thermal carrier energy cause wavefunction localization, which further reduces the dimensionality of the carrier behavior. The associated energy band-bending causes enhanced carrier accumulation at quantum wedges and quantum tips formed by intersecting quantum wells. In addition, the total carrier number over the QW length increases, manifesting spontaneous intrinsic pumping due to polarization. As a result, the spontaneous emission is localized at quantum wedges, and the total emission exceeds that from a flat quantum well of similar parameters, as experimentally observed. The sheath potentials are sufficiently high for 1-D or 0-D carrier localization at quantum wedges and quantum tips.
A novel theoretical approach combining scattering theory with supercritical angle transmission is introduced for treating light incidence on nanotextured surfaces. The theory is used to evaluate enhanced light extraction from interfaces with sub-wavelength feature sizes, where the ray tracing approach breaks down. A unified analytic formula covering the transition from periodic to random surface texturing is obtained. The results will be compared with experimental enhanced light extraction results from GaN textured interfaces. The extraction efficiency is studied as a function of the average feature size and the rms deviation from the average values. It is argued that enhanced extraction occurs due to both supercritical transmission for single wave incidence, and the quick randomization of the incident wave-vector directions via internal scattering.
In this paper we propose a new type of nitride LED structure based on “wrinkled” rather than flat Multiple Quantum Wells (MQWs) grown along the polar [0001] direction. We show that this novel approach of employing “wrinkled” MQWs leads to the improvement of both the internal quantum efficiency as well the extraction efficiency.
Identical GaN/AlGaN MQWs with well and barrier widths of 7 nm, were grown on both the textured and the smooth GaN templates by plasma-assisted MBE and their optical properties were evaluated by photoluminescence (PL) and cathodoluminescence (CL) measurements. The PL spectra of the smooth and “wrinkled” MQWs have significant differences. The PL from the smooth quantum wells has a single peak at 396 nm, consistent with the expected red-shift from the PL spectra of the bulk GaN films due to the quantum confined Stark effect (QCSE). The PL peak from the wrinkled QWs occurs at 358 nm, which is blue-shifted with respect to the PL spectra of the bulk GaN films, a result consistent with QWs having a square configuration. Furthermore, we found that the integrated photoluminescence intensity from the “wrinkled” multiple quantum wells (WMQWs) was about 700 times higher than that of the smooth MQWs. We attribute this significant enhancement of the photoluminescence from the WMQWs partly to enhancement in light extraction through the textured surface and partly to enhanced spontaneous emission rate. We believe that the increase in the internal quantum efficiency is due to the reduction of the QCSE, since the quantum wells are not perpendicular to polar [0001] direction. Further enhancement in internal quantum efficiency is expected due to quantum carrier confinement from "wedge" electronic eigen-modes. The latter has its origin to the transition in the carrier behavior from 2D to 1D due to the V-shaped intersecting planes of the quantum wells, and thus the "wedges" behave as quantum wires, which cause localization and trapping of excitons.
This paper reviews progress in the heteroepitaxial growth of Ill-Nitride semiconductors. The growth of wurtzite and zinc-blende allotropic forms of GaN on various substrates with hexagonal and cubic symmetry respectively were discussed. In particular we addressed the growth on the various faces of sapphire, 6H-SiC and (001) Si. It has been shown that the kinetics of growth by plasma-MBE or ammonia-MBE are different. Specifically, in plasma-assisted MBE smooth films are obtained under group-III rich conditions of growth. On the other hand in ammonia-MBE smooth films are obtained under nitrogen rich conditions of growth. High quality films were obtained on 6H-SiC without the employment of any buffer. The various nucleation steps used to improve the two dimensional growth as well as to control the film polarity were discussed. The n- and p-doping of GaN were addressed. The concept of increasing the solubility of Mg in GaN by simultaneously bombarding the surface of the growing film with a flux of electrons (co-doping GaN with Mg and electrons) was discussed. The influence of the strength of Al-N, Ga-N and In-N bonds on the kinetics of growth of nitride alloys was pointed out. Specifically, it was shown that in both the nitrogen-rich and group-III rich growth regimes, the incorporation probability of aluminum is unity for the investigated temperature range of 750-800° C. On the other hand the incorporation probability of gallium is constant but less than unity only in the nitrogen-rich regime of growth. In the group-III regime the incorporation probability of gallium decreases monotonically with the total group-III flux, due to the competition with aluminum for the available active nitrogen. Alloy phenomena such as phase separation and atomic ordering and the influence of these phenomena to the optical properties were addressed. InGaN alloys are thermodynamically unstable against phase separation. At compositions above 30% they tend to undergo partial phase separation. Furthermore, InGaN alloys were found to undergo 1x1 monolayer cation ordering. AlGaN alloys do not show evidence of phase separation but they were found to undergo multiple type of superlattice ordering. Under nitrogen-rich growth conditions they show one monolayer periodicity, while under group-III rich growth it was found that the structure is a superposition of a seven monolayer and twelve monolayer superlattices. Finally, the growth of heterostructures and MQWs and the use of the MBE method for the fabrication of optical, electronic and electromechanical devices were discussed.
III-nitride VCSEL structures designed for electron-beam pumping have been grown by molecular beam epitaxy (MBE). The structures consist of a sapphire substrate on which an AlN/GaN distributed Bragg reflector (DBR) with peak reflectance >99% at 402 nm is deposited. The active region consists of a 2-(lambda) cavity with 25 In0.1Ga0.9N/GaN multiquantum wells (MQWs) whose emission coincides with the high reflectance region of the DBR. The thicknesses of the InGaN wells and the GaN barriers are 35 angstrom and 75 angstrom respectively. The top reflector consists of a silver metallic mirror which prevents charging effects during electron-beam pumping. The structure was pumped from the top- side with a cw electron-beam using a modified cathodoluminescence (CL) system mounted on a scanning electron microscope chamber. Light output was collected from the polished sapphire substrate side. Measurements performed at 100 K showed intense emission at 407 nm with narrowing of the linewidth with increasing beam current. A narrow emission linewidth of 0.7 nm was observed indicating the onset of stimulated emission.
In this paper, we report on the growth by molecular beam epitaxy (MBE), the fabrication and the characterization of GaN diodes on HVPE n+-GaN/sapphire and ELO-HVPE n+-GaN/sapphire substrates. Specifically, such diodes were fabricated in the form of vertical schottky diodes or p-n junctions. In both cases we have seen a dramatic decrease in the leakage current in the reverse direction which is consistent with the reduction of threading dislocations in the active area of the device. The lowest leakage current measured at -5 V bias was approximately 10-8 A/cm2 for p-n junctions grown on ELO-HVPE n+-GaN/sapphire substrates. The spectral response of the vertical schottky diodes were evaluated and compared to similar devices grown wholely by MBE on sapphire substrates. The device grown on HVPE n+-GaN/sapphire substrate shows nearly ideal responsivity below 355 nm but also poorer visible light rejection than the fully grown MBE device. The observed exponential tail in the spectral response of the vertical schottky grown on the HVPE n+-GaN/sapphire substrate is attributed to the absorption and collection in the thick n+ GaN substrate.
Vertical geometry Schottky barrier photodiodes have been fabricated on n-GaN films grown by molecular beam epitaxy (MBE). Vertical mesas were fabricated by RIE and Schottky barriers were achieved by depositing Ni/Pt/Au metal contacts. I-V measurements show near ideal diode behavior, with reverse saturation current density of 1 X 109 A/cm2. Doping concentration and barrier height were determined to be 9 X 1016 cm-3 and 1.0V respectively, using C-V measurements. The diodes were then evaluated as UV photodiodes. The responsivity was measured to be 0.18A/W, corresponding to a quantum efficiency of 70 percent. Spectral response showed a sharp transition at 365 nm, and more than five orders of magnitude visible light rejection. Low frequency noise measurements indicate that 1/f noise is the dominant source of noise. The detectivity was determined to be 1.3 X 10-9 W/Hz1/2.
We report for the first time, fabrication of photoconducting UV detectors made from GaN films grown by molecular beam epitaxy. Semi-insulating GaN films were grown by the method of electron cyclotron resonance microwave plasma-assisted molecular beam epitaxy. Photoconductive devices with interdigitated electrodes were fabricated and their photoconducting properties were investigated. In this paper we report on the performance of the detectors in terms of UV responsivity, gain-quantum efficiency product, spectral response, and response time. We have measured responsivity of 125A/W and gain-quantum efficiency product of 600 at 254nm and 25V. The response time was measured to be on the order of 20ns for our detectors, corresponding to a bandwidth of 25Mhz. The spectral response showed a sharp long-wavelength cutoff at 265nm, and remained constant in the 200nm to 365nm range. The response of the detectors to low-energy x-rays was measured and found to be linear for x- rays with energies ranging from 60kVp to 90kVp.
Langmuir probe measurements and optical emission spectroscopy were employed to characterize electron cyclotron resonance plasmas with two different magnetic field configurations. The plasma ternperature was directly measured by a thermocouple immersed inside the plasmas. To deposit diamond at low pressure( lOOmTorr) it is required for the feed sources to contain a large amount of carbon as well as OH radicals. However, the C, H, and 0 ratios still fall into the "diamond domain" of Bachmann's diagram. The oxygen addition to the CHiJH2 plasma leads to the improvement of diamond films prepared at 800mTorr, which is due to the OH radicals formed in the plasma. The addition of oxygen does not increase the plasma temperature. Our results of ECR diamond deposition under various pressures support that neutral-neutral reactions dominate in diamond growth process.
Optically smooth diamond films were deposited on Al and Si substrates by the ECR-PACVD method. The films on Al were grown on relatively low temperatures and pressures from CH3OH/H2O and were found to have highly defective nanocrystalline structure. The films on c-Si were grown at higher temperatures and pressures from CH4/H2/O2 and were found to consist of highly oriented (100) faceted crystals. The optical constants of the diamond films on c-Si are similar to those of natural diamond.
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