Dr. Theodoros Manouras Profile

Dr. Theodoros Manouras

Research Associate at Foundation for Research and Technology-Hellas

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Author

Publications (5)

Proceedings Article | 12 March 2024 Paper

Sub-diffraction limited direct diode laser patterning of methacrylic polymer thin films doped with silver nanoparticles

Alexandra Sinani, Konstantinos Karachousos-Spiliotakopoulos, Vassilis Tangoulis, Theodoros Manouras, Evangelos Angelakos, Christos Riziotis

Proceedings Volume 12873, 128730Q (2024) https://doi.org/10.1117/12.3003577

KEYWORDS: Silver, Nanoparticles, Polymethylmethacrylate, Gold nanoparticles, Thin films, Matrices, Laser ablation, Composites, Semiconductor lasers, Polymers

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Proceedings Article | 31 March 2021 Presentation + Paper

Chemically-amplified backbone scission (CABS) resist for EUV lithography

Theodoros Manouras, Dimitrios Kazazis, Yasin Ekinci

Proceedings Volume 11609, 116090H (2021) https://doi.org/10.1117/12.2584085

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Proceedings Article | 19 March 2018 Presentation + Paper

Ultra-sensitive EUV resists based on acid-catalyzed polymer backbone breaking

Theodoros Manouras, Dimitrios Kazazis, Eleftherios Koufakis, Yasin Ekinci, Maria Vamvakaki, Panagiotis Argitis

Proceedings Volume 10583, 105831R (2018) https://doi.org/10.1117/12.2299853

KEYWORDS: Polymers, Etching, Resistance, Photoresist materials, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Polymer thin films, Thin films, Oxygen

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Proceedings Article | 22 March 2016 Paper

Exploring the potential of Multiphoton Laser Ablation Lithography (MP-LAL) as a reliable technique for sub-50nm patterning

Theodoros Manouras, Evangelos Angelakos, Maria Vamvakaki, Panagiotis Argitis

Proceedings Volume 9777, 97771C (2016) https://doi.org/10.1117/12.2218864

KEYWORDS: Laser ablation, Lithography, Polymers, Multiphoton lithography, Optical lithography, Nickel, Continuous wave operation, Laser development, Multiphoton processes, Laser processing, Polymer thin films, Thin films, Molecules, Semiconductor lasers

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Proceedings Article | 21 March 2016 Paper

New resist materials based on polyacetal main chain scission

Theodoros Manouras, Antonis Olziersky, Panagiotis Argitis

Proceedings Volume 9779, 97791P (2016) https://doi.org/10.1117/12.2230398

KEYWORDS: Electron beam lithography, Photoresist materials, Polymers, Lithography, Extreme ultraviolet, Etching, Resistance, Polymer thin films, Extreme ultraviolet lithography, Thin films, Line edge roughness

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