Dr. Thomas Cecil
Principal Engineer at Synopsys Inc
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Data modeling, Photomasks, Lithography, Machine learning, Optical proximity correction, Convolution, Network architectures, Inverse problems, Calibration

Proceedings Article | 24 March 2017 Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical proximity correction, Lithography, Photomasks, Computational lithography, Lithium, 193nm lithography, Chemical elements, SRAF

Proceedings Article | 16 March 2016 Paper
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Optical proximity correction, Photomasks, Lithography, Computer programming, Resolution enhancement technologies, Model-based design, Optical lithography, 193nm lithography, Atrial fibrillation, Software development

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Photomasks, Lithography, Optical lithography, Optical proximity correction, Chromium, Model-based design, Logic, Optimization (mathematics), Semiconducting wafers, Critical dimension metrology

Proceedings Article | 1 October 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Optical proximity correction, Image quality, Optimization (mathematics), Nanoimprint lithography, Image enhancement, Image processing, Design for manufacturing, Resolution enhancement technologies, Neodymium, Nano opto mechanical systems

Showing 5 of 22 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top