Dr. Thomas Henkel Profile

Dr. Thomas Henkel

at Qimonda Dresden GmbH & Co OHG

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 2 May 2008 Paper

Assessment and application of focus drilling for DRAM contact hole fabrication

Christoph Noelscher, Franck Jauzion-Graverolle, Thomas Henkel

Proc. SPIE. 6792, 24th European Mask and Lithography Conference

KEYWORDS: Chromatic aberrations, Lithography, Calibration, Scanners, Colorimetry, Photomasks, Optical fiber cables, Computer aided design, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 1 April 2008 Paper

AltPSM contact hole application at DRAM 4xnm nodes with dry 193nm lithography

Christoph Noelscher, Thomas Henkel, Franck Jauzion-Graverolle, Mario Hennig, Nicolo Morgana, Ralph Schlief, Molela Moukara, Roderick Koehle, Ralf Neubauer

Proc. SPIE. 6924, Optical Microlithography XXI

KEYWORDS: Lithography, Atrial fibrillation, Calibration, Etching, 3D modeling, Printing, Photomasks, Optical proximity correction, Mask making, 193nm lithography

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Proceedings Article | 18 June 2007 Paper

3D simulations of electromagnetic fields in nanostructures using the time-harmonic finite-element method

Sven Burger, Lin Zschiedrich, Frank Schmidt, Roderick Köhle, Thomas Henkel, Bernd Küchler, Christoph Nölscher

Proc. SPIE. 6617, Modeling Aspects in Optical Metrology

KEYWORDS: Nanostructures, Diffraction, Optical lithography, Etching, Computer simulations, Finite element methods, Photomasks, Chemical elements, Electromagnetism, Radio propagation

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Proceedings Article | 5 November 2005 Paper

Comparative study of simulations and experiments for contact array patterns on attenuated phase shifting mask

Thomas Henkel, Martin Sczyrba, Christoph Noelscher

Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Phase shifting, 3D acquisition, Calibration, Scanners, Error analysis, 3D modeling, Photomasks, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 17 December 2003 Paper

High-accuracy simulation-based optical proximity correction

Martin Keck, Thomas Henkel, Ralf Ziebold, Christian Crell, Jörg Thiele

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Data modeling, Manufacturing, Scanning electron microscopy, Printing, Data processing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

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