Thomas Jakubski
at Advanced Mask Technology Ctr GmbH & Co KG
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 27 May 2009 Paper
Thomas Jakubski, Michal Piechoncinski, Raphael Moses, Bharathi Bugata, Heiko Schmalfuss, Ines Köhler, Jan Lisowski, Jens Klobes, Robert Fenske
Proceedings Volume 7470, 74700V (2009) https://doi.org/10.1117/12.835193
KEYWORDS: Inspection, Inspection equipment, Instrument modeling, Photomasks, Factory automation, Manufacturing, Reticles, System integration, Interfaces, Rule based systems

Proceedings Article | 17 October 2008 Paper
Björn Sass, Ralf Schubert, Thomas Jakubski, Sebastian Mauermann, Pavel Nesladek, Andreas Wiswesser, Karl-Heinz Gindra, Ray Malone
Proceedings Volume 7122, 71220E (2008) https://doi.org/10.1117/12.801080
KEYWORDS: Sensors, Photomasks, Etching, Plasma, Critical dimension metrology, Radio frequency circuits, Resistance, Dry etching, Process control, Plasma etching

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