Dr. Thomas Kämpfe Profile

Dr. Thomas Kämpfe

at Univ Lyon

SPIE Involvement:

Author

Publications (19)

Proceedings Article | 24 May 2022 Poster + Paper

Development of chirp reduction technique for spherical beams interference lithography

Ratish Rao Nagaraj Rao, Thomas Kämpfe, Frederic Celle, Anton Savchenko, Emilie Gamet, Yves Jourlin

Proceedings Volume 12131, 121310T (2022) https://doi.org/10.1117/12.2621360

KEYWORDS: Spherical lenses, Lithography, Semiconducting wafers, Wavefronts, Wavefront aberrations, Fiber lasers, Silicon, Photoresist materials, 3D printing, Laser sources

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SPIE Journal Paper | 9 December 2020 Open Access

Wire-grid polarizer using galvanic growth technology: demonstration of a wide spectral and angular bandwidth component with high extinction ratio (Erratum)

Isabelle Verrier, Thomas Kämpfe, Frederic Celle, Anthony Cazier, Koceïla Yadel, Markus Guttmann, Barbara Matthis, Janne Laukkanen, Frédéric Lacour, Colette Veillas, Stéphanie Reynaud, Olivier Parriaux, Yves Jourlin

OE, Vol. 59, Issue 12, 129801, (December 2020) https://doi.org/10.1117/12.10.1117/1.OE.59.12.129801

KEYWORDS: Polarizers, Optical engineering, Physics, Optical testing, Mathematics

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Proceedings Article | 2 April 2020 Presentation + Paper

Moiré effects in subwavelength gratings: apodized structures for visible band optical applications

Andrei Ushkov, Isabelle Verrier, Thomas Kampfe, Yves Jourlin

Proceedings Volume 11364, 1136415 (2020) https://doi.org/10.1117/12.2559292

KEYWORDS: Numerical simulations, Modulation, Diffraction gratings, Lithography, Plasmonics, Photoresist materials, Nanostructures, Moire patterns, Apodization

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Proceedings Article | 19 September 2018 Paper

Plasmonic resonances in metal covered 2D hexagonal gratings fabricated by interference lithography

Andrei Ushkov, Maxime Bichotte, Isabelle Verrier, Thomas Kampfe, Yves Jourlin

Proceedings Volume 10775, 1077516 (2018) https://doi.org/10.1117/12.2323763

KEYWORDS: Photoresist materials, Lithography, Plasmonics, Photoresist developing, Metals, Diffraction gratings, Plasmons, Polarization, Nanolithography, Numerical simulations

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Proceedings Article | 9 May 2018 Presentation + Paper

Cost effective LED-based multi-spot projection system for medical 3D volume measurement systems

Thomas Kämpfe, Shamus Husheer, Michael Vervaeke, Mathias Heckele, Isabelle Verrier, Yves Jourlin

Proceedings Volume 10680, 1068011 (2018) https://doi.org/10.1117/12.2307628

KEYWORDS: Projection systems, 3D modeling, Lithium

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Proceedings Article | 29 April 2016 Paper

Improvement of solar absorption using submicrometric gratings

M. Bichotte, T. Kämpfe, W. Iff, F. Celle, S. Reynaud, T. Pouit, A. Soum-Glaude, A. Le Gal, L. Dubost, Y. Jourlin

Proceedings Volume 9898, 98980O (2016) https://doi.org/10.1117/12.2225072

KEYWORDS: Photoresist materials, Absorption, Diffraction gratings, Sputter deposition, Multilayers, Silicon, Semiconducting wafers, Reflectors, Optical lithography, Absorbance, Reflectivity, Solar energy, Nitrogen, Refractive index, Temperature metrology, Receivers

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SPIE Journal Paper | 28 April 2015

Wire-grid polarizer using galvanic growth technology: demonstration of a wide spectral and angular bandwidth component with high extinction ratio

OE, Vol. 54, Issue 04, 047105, (April 2015) https://doi.org/10.1117/12.10.1117/1.OE.54.4.047105

KEYWORDS: Optical gratings, Polarization gratings, Design, Refractive index, Polarizers, Polarization, Gold, Metals, Photoresist materials, Lithography

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SPIE Journal Paper | 8 October 2014

Segmented subwavelength silicon gratings manufactured by high productivity microelectronic technologies for linear to radial/azimuthal polarization conversion

Thomas Kämpfe, Pierre Sixt, Denis Renaud, Armelle Lagrange, Fabrice Perrin, Olivier Parriaux

OE, Vol. 53, Issue 10, 107105, (October 2014) https://doi.org/10.1117/12.10.1117/1.OE.53.10.107105

KEYWORDS: Polarization, Silicon, Microelectronics, Semiconducting wafers, Photomasks, Transformers, Prototyping, Manufacturing, Chemical elements, Amorphous silicon

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Proceedings Article | 2 May 2014 Paper

Wide band, wide angular width wire-grid polarizer using galvanic growth technology

Yves Jourlin, Markus Guttmann, Frédéric Lacour, Janne Laukkanen, Koceila Yadel, Frédéric Celle, Colette Veillas, Thomas Kämpfe, Barbara Matthis, Olivier Parriaux

Proceedings Volume 9130, 913008 (2014) https://doi.org/10.1117/12.2051429

KEYWORDS: Polarization, Gold, Polarizers, Metals, Photoresist materials, Diffraction gratings, Optical design, Lithography, Dielectric polarization, Photomasks

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Proceedings Article | 2 May 2014 Paper

Linear to radial/azimuthal polarization converter in transmission using form birefringence in a segmented silicon grating manufactured by high productivity microelectronic technologies

T. Kaempfe, P. Sixt, D. Renaud, A. Lagrange, F. Perrin, O. Parriaux

Proceedings Volume 9130, 91300W (2014) https://doi.org/10.1117/12.2052156

KEYWORDS: Polarization, Silicon, Photomasks, Semiconducting wafers, Microelectronics, Transformers, Amorphous silicon, Prototyping, Chromium, Manufacturing

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Proceedings Article | 14 February 2011 Paper

Design and fabrication of a highly off-axis binary multi-phase-level computer-generated hologram based on an effective medium approach

Wiebke Freese, Thomas Kämpfe, Ernst-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 7927, 792710 (2011) https://doi.org/10.1117/12.875007

KEYWORDS: Computer generated holography, Diffraction, Binary data, Etching, Silica, Calibration, Optical design, Diffraction gratings, Reactive ion etching, Optical components

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Proceedings Article | 16 February 2010 Paper

Multi-phase-level diffractive elements realized by binary effective medium patterns

Wiebke Freese, Thomas Kämpfe, Ernst-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 7591, 75910Z (2010) https://doi.org/10.1117/12.843526

KEYWORDS: Computer generated holography, Binary data, Diffraction, Optical components, Quantization, Chromium, Beam shaping, Electron beams, Lithography, Reflectivity

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Proceedings Article | 14 May 2008 Paper

Comparison of different simulation methods for multiplane computer generated holograms

Thomas Kämpfe, Florian Hudelist, Andrew Waddie, Mohammad Taghizadeh, Ernst-Bernhard Kley, Andreas Tunnermann

Proceedings Volume 6992, 69920M (2008) https://doi.org/10.1117/12.781916

KEYWORDS: Computer generated holography, Spatial frequencies, Chemical elements, Fourier transforms, Optical components, Signal to noise ratio, Refractive index, Wave propagation, Beam splitters, Computer simulations

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Proceedings Article | 6 February 2008 Paper

Highly dispersive dielectric transmission gratings with 100% diffraction efficiency

Tina Clausnitzer, Thomas Kämpfe, Frank Brückner, Roland Heinze, Ernst-Bernhard Kley, Andreas Tünnermann, Olivier Parriaux, Alexandre Tishchenko

Proceedings Volume 6883, 68830U (2008) https://doi.org/10.1117/12.767783

KEYWORDS: Diffraction gratings, Diffraction, Reflection, Interfaces, Silica, Reflectivity, Dielectrics, Coating, Optical design, Antireflective coatings

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Proceedings Article | 20 October 2005 Paper

Design and fabrication of refractive and diffractive micro optical elements used in holographic recording setups

T. Kaempfe, E.-B. Kley, A. Tuennermann

Proceedings Volume 5965, 596503 (2005) https://doi.org/10.1117/12.625195

KEYWORDS: Dielectrics, Holography, Dielectric filters, Gaussian beams, Optical filters, Beam shaping, Interference (communication), Holograms, Optical components, Spatial frequencies

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Proceedings Article | 15 October 2005 Paper

High-efficiency transmission gratings for unpolarized illumination: an intelligible analysis of the diffraction process

T. Clausnitzer, T. Kämpfe, E.-B. Kley, A. Tuennermann, U. Peschel, A. Tishchenko, O. Parriaux

Proceedings Volume 5962, 596219 (2005) https://doi.org/10.1117/12.625170

KEYWORDS: Diffraction gratings, Diffraction, Wave propagation, Light wave propagation, Polarization, Waveguides, Silica, Dielectrics, Optical design, Geometrical optics

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Proceedings Article | 26 August 2005 Paper

Laser beam filtering by refractive or diffractive microstructures

T. Kaempfe, E.-B. Kley, A. Tuennermann

Proceedings Volume 5874, 58740O (2005) https://doi.org/10.1117/12.617335

KEYWORDS: Dielectrics, Dielectric filters, Gaussian beams, Optical filters, Interference (communication), Gaussian filters, Spatial frequencies, Etching, Binary data, Silica

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Proceedings Article | 18 August 2005 Paper

Hybrid approach to the design of refractive beam shaping elements

T. Kaempfe, E.-B. Kley, A. Tuennermann

Proceedings Volume 5876, 58760J (2005) https://doi.org/10.1117/12.617395

KEYWORDS: Beam shaping, Electroluminescence, Chemical elements, Signal to noise ratio, Geometrical optics, Optical components, Transform theory, Fourier transforms, Lithography, Wavefronts

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Proceedings Article | 22 January 2005 Paper

Dielectric pinholes for laser-beam filtering

Thomas Kaempfe, Ernst Kley, Andreas Tuennermann

Proceedings Volume 5720, (2005) https://doi.org/10.1117/12.590473

KEYWORDS: Optical filters, Dielectrics, Dielectric filters, Gaussian beams, Etching, Spatial frequencies, Interference (communication), Gaussian filters, Laser damage threshold, Silica

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Showing 5 of 19 publications

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