Mr. Thomas Käsebier Profile

Thomas Käsebier

at Friedrich-Schiller-Univ Jena

SPIE Involvement:

Author

Publications (21)

Proceedings Article | 13 March 2024 Presentation

Presentation

Wafer-scale fabrication of low-loss lithium niobate integrated photonic devices

Reinhard Geiss, Andre Steinbach, Mohammadreza Younesi, Johannes Mühlenstädt, Thomas Käsebier, Frank Setzpfandt, Thomas Siefke, Thomas Pertsch, Falk Eilenberger

Proceedings Volume PC12889, PC128890Q (2024) https://doi.org/10.1117/12.3000981

KEYWORDS: Lithium niobate, Fabrication, Integrated photonics, Waveguides, Quantum technology applications, Quantum processes, Wafer-level optics, Thin films, Semiconducting wafers, Quantum technologies

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Proceedings Article | 26 April 2019 Presentation + Paper

Presentation + Paper

Black-silicon-structured back-illuminated Ge-on-Si photodiode arrays

David Schmelz, Martin Steglich, Kay Dietrich, Thomas Käsebier, Uwe Zeitner

Proceedings Volume 11031, 1103109 (2019) https://doi.org/10.1117/12.2520432

KEYWORDS: Photodiodes, Silicon, Mirrors, Absorption, Back illuminated sensors, Quantum efficiency, Photodetectors, Short wave infrared radiation, Germanium

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Proceedings Article | 31 October 2016 Paper

Paper

Anti-reflective sub-wavelength structures at a wavelength of 441.6 nm for phase masks of near-field lithography

Jinyu Li, Huoyao Chen, Stefanie Kroker, Thomas Käsebier, Zhengkun Liu, Keqiang Qiu, Ying Liu, Ernst-Bernhard Kley, Xiangdong Xu, Yilin Hong, Shaojun Fu

Proceedings Volume 10022, 100220T (2016) https://doi.org/10.1117/12.2246381

KEYWORDS: Electron beam lithography, Antireflective coatings, Lithography, Near field, Photomasks, Interfaces, Reflectivity, Glasses, Diffraction, Stray light

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Proceedings Article | 31 October 2016 Paper

Paper

Design of soft x-ray varied-line-spacing grating based on electron beam lithography-near field lithography

Dakui Lin, Huoyao Chen, Stefanie Kroker, Thomas Käsebier, Zhengkun Liu, Keqiang Qiu, Ying Liu, Ernst-Bernhard Kley, Xiangdong Xu, Yilin Hong, Shaojun Fu

Proceedings Volume 10022, 100220S (2016) https://doi.org/10.1117/12.2246356

KEYWORDS: Lithography, X-rays, Silica, Photomasks, X-ray lithography, Electron beam lithography, Optical design, Electron beams, Photoresist materials, Diffraction

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Proceedings Article | 15 September 2016 Paper

Paper

Self-organized, effective medium black silicon antireflection structures for silicon optics in the mid-infrared

Martin Steglich, Thomas Käsebier, Ernst-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 9927, 992704 (2016) https://doi.org/10.1117/12.2236293

KEYWORDS: Silicon, Antireflective coatings, Mid-IR, Reactive ion etching, Interfaces, Etching, Transmittance, Coating, Optics manufacturing, Scattering

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Proceedings Article | 21 April 2016 Paper

Paper

Large area gold coated nano-needles fabricated by proximity mask aligner lithography for plasmonic AR-structures

Yannick Bourgin, Dirk Michaelis, Thomas Käsebier, Peter Dannberg, Uwe Zeitner

Proceedings Volume 9884, 98842I (2016) https://doi.org/10.1117/12.2227129

KEYWORDS: Photomasks, Plasmonics, Lithography, Nanolithography, Semiconducting wafers, Reflection, Gold, Nanostructures, Chromium, Apertures, Polymers, Absorption, Polarization, Lithographic illumination, Glasses

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Proceedings Article | 18 March 2015 Paper

Paper

Double-sided diffractive photo-mask for sub-500nm resolution proximity i-line mask-aligner lithography

Yannick Bourgin, Thomas Siefke, Thomas Käsebier, Ernst-Bernhard Kley, Uwe Zeitner

Proceedings Volume 9426, 94260E (2015) https://doi.org/10.1117/12.2085777

KEYWORDS: Photomasks, Polarizers, Lithography, Etching, Lithographic illumination, Chromium, Photomicroscopy, Silica, Ion beams, Reactive ion etching

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Proceedings Article | 19 February 2014 Paper

Paper

Investigation on the angular dependent reflectance of coupled high-contrast gratings

Stefanie Kroker, Thomas Käsebier, Ernst-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 8995, 89950B (2014) https://doi.org/10.1117/12.2039711

KEYWORDS: Reflectivity, Silicon, Reflectors, Optical components, Silica, Refractive index, Tolerancing, Light wave propagation, Resonators, Fabry–Perot interferometers

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Proceedings Article | 15 March 2013 Paper

Paper

High contrast gratings for high-precision metrology

Stefanie Kroker, Stefan Steiner, Thomas Käsebier, Ernst-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 8633, 86330M (2013) https://doi.org/10.1117/12.2006074

KEYWORDS: Reflectivity, Silicon, Light scattering, Mirrors, Crystals, Metrology, Optical coatings, Optical components, Beam splitters, Diffraction gratings

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Proceedings Article | 15 March 2013 Paper

Paper

Asymmetric direction selective filter elements based on high-contrast gratings

Stefan Steiner, Stefanie Kroker, Thomas Käsebier, Daniel Voigt, Jörg Fuchs, Frank Fuchs, Ernst-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 8633, 86330Z (2013) https://doi.org/10.1117/12.2003930

KEYWORDS: Refractive index, Silicon, Optical filters, Diffraction gratings, Picosecond phenomena, Optical design, Diffraction, Silica, Binary data, Semiconductors

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Proceedings Article | 17 September 2012 Paper

Paper

Resolution limits of transmission optics for x-ray astronomy

Christoph Braig, Vadim Burwitz, Thomas Käsebier, Ernst-Bernhard Kley, Peter Predehl, Andreas Tünnermann

Proceedings Volume 8443, 844341 (2012) https://doi.org/10.1117/12.925542

KEYWORDS: Spatial resolution, X-rays, X-ray optics, Zone plates, Lenses, Point spread functions, Fresnel lenses, Mirrors, X-ray astronomy, Image segmentation

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Proceedings Article | 2 May 2012 Paper

Paper

Black silicon photovoltaics

Kevin Füchsel, Matthias Kroll, Thomas Käsebier, Martin Otto, Thomas Pertsch, Ernst-Bernhard Kley, Ralf Wehrspohn, Norbert Kaiser, Andreas Tünnermann

Proceedings Volume 8438, 84380M (2012) https://doi.org/10.1117/12.923748

KEYWORDS: Silicon, Nanostructuring, Solar cells, Nanolithography, Silicon films, Transparent conductors, Oxides, Etching, Interfaces, Reflectivity

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Proceedings Article | 2 May 2012 Paper

Paper

Black silicon for solar cell applications

Matthias Kroll, Martin Otto, Thomas Käsebier, Kevin Füchsel, Ralf Wehrspohn, Ernst-Bernhard Kley, Andreas Tünnermann, Thomas Pertsch

Proceedings Volume 8438, 843817 (2012) https://doi.org/10.1117/12.922380

KEYWORDS: Silicon, Solar cells, Absorption, Reflectivity, Interfaces, Optical coatings, Dielectrics, Antireflective coatings, Nanostructures, Etching

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Proceedings Article | 23 February 2012 Paper

Paper

High frequency binary amorphous silicon grating working as wire grid polarizer for UV applications

Thomas Weber, Thomas Käsebier, Stefanie Kroker, Ernst-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 8270, 82700F (2012) https://doi.org/10.1117/12.906618

KEYWORDS: Polarizers, Silicon, Amorphous silicon, Ultraviolet radiation, Diffraction gratings, Refractive index, Optical testing, Etching, Optical properties, Mineralogy

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Proceedings Article | 23 February 2012 Paper

Paper

Diffractive optical elements based on subwavelength high-contrast gratings

Stefanie Kroker, Thomas Käsebier, Thomas Weber, Stefan Steiner, Frank Fuchs, Ernst-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 8270, 82700P (2012) https://doi.org/10.1117/12.908145

KEYWORDS: Reflectivity, Silicon, Tolerancing, Silica, Modulation, Reflectors, Polarization, Optical components, Diffractive optical elements, Diffraction gratings

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Proceedings Article | 23 February 2012 Paper

Paper

Tuning the reflectivity of high-contrast gratings based on silicon and silica by means of wet etching with hydrofluoric acid

Tassilo Jacobitz, Stefanie Kroker, Thomas Käsebier, Ernst-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 8270, 82700U (2012) https://doi.org/10.1117/12.908240

KEYWORDS: Etching, Silica, Reflectivity, Silicon, Tolerancing, Wet etching, Ions, Oxides, HF etching, Thin films

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Proceedings Article | 16 February 2012 Paper

Paper

Novel direction selective filter elements based on high-contrast gratings

Stefan Steiner, Stefanie Kroker, Thomas Käsebier, Frank Fuchs, Ernst-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 8270, 827007 (2012) https://doi.org/10.1117/12.908184

KEYWORDS: Diffraction gratings, Silicon, Optical filters, Silica, Dielectrics, Dielectric filters, Refractive index, Diffraction, Sensors, Absorption

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Proceedings Article | 13 September 2011 Paper

Paper

Effects of metallic nanoparticle arrays in Si solar cell structures

Tino Benkenstein, Michael Flämmich, Torsten Harzendorf, Thomas Käsebier, Dirk Michaelis, Maria Oliva, Christoph Wächter, Uwe Zeitner

Proceedings Volume 8110, 81100D (2011) https://doi.org/10.1117/12.894385

KEYWORDS: Absorption, Particles, Silicon, Nanoparticles, Solar cells, Scattering, Silver, Plasmonics, Atomic force microscopy, Interfaces

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Proceedings Article | 18 May 2010 Paper

Paper

Optical modeling of needle like silicon surfaces produced by an ICP-RIE process

Matthias Kroll, Thomas Käsebier, Martin Otto, Roland Salzer, Ralf Wehrspohn, Ernst-Bernhard Kley, Andreas Tünnermann, Thomas Pertsch

Proceedings Volume 7725, 772505 (2010) https://doi.org/10.1117/12.854596

KEYWORDS: Silicon, Etching, Semiconducting wafers, Reflectivity, Scattering, Absorption, Light scattering, Surface finishing, Reflection, Reactive ion etching

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Proceedings Article | 18 May 2010 Paper

Paper

Nanostructured SIS solar cells

K. Fuechsel, U. Schulz, N. Kaiser, T. Käsebier, E.-B. Kley, A. Tünnermann

Proceedings Volume 7725, 772502 (2010) https://doi.org/10.1117/12.854694

KEYWORDS: Silicon, Nanostructuring, Solar cells, Oxides, Transparent conductors, Electrodes, Antireflective coatings, Sputter deposition, Tin, Reflectivity

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Proceedings Article | 20 October 2005 Paper

Paper

Novel fabrication technique of continuous profiles for microoptics and integrated optics

Thomas Käsebier, Holger Hartung, Ernst-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 5965, 596504 (2005) https://doi.org/10.1117/12.625111

KEYWORDS: Photomasks, Binary data, Photoresist materials, Waveguides, Lithography, Fabrication, Optical lithography, Etching, Coating, Dry etching

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Showing 5 of 21 publications

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