Dr. Thomas V. Pistor Profile

Dr. Thomas V. Pistor

CEO at Panoramic Technology Inc

SPIE Involvement:

Author

Publications (23)

Proceedings Article | 24 March 2017 Presentation + Paper

Rigorous 3D electromagnetic simulation of ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask

Stuart Sherwin, Thomas Pistor, Andrew Neureuther, Patrick Naulleau

Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII

KEYWORDS: Thin films, Optical lithography, Etching, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetic simulation

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SPIE Journal Paper | 15 May 2015

Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach

Mihir Upadhyaya, Vibhu Jindal, Adarsh Basavalingappa, Henry Herbol, Jenah Harris-Jones, Il-Yong Jang, Kenneth Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle, Thomas Pistor, Gregory Denbeaux

JM3 Vol. 14 Issue 02

KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Chemical species, Inspection, Computer simulations, Interfaces, Transmission electron microscopy, Modeling and simulation, Waveguides

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Proceedings Article | 18 March 2015 Paper

Investigating deprotection-induced shrinkage and retro-grade sidewalls in NTD resists

Thomas Pistor, Chenchen Wang, Yan Wang, Lei Yuan, Jongwook Kye, Yixu Wu, Sohan Mehta, Paul Ackmann

Proc. SPIE. 9426, Optical Microlithography XXVIII

KEYWORDS: Atrial fibrillation, Signal attenuation, Electrons, Distortion, Atomic force microscopy, Scanning electron microscopy, Photoresist materials, Photomasks, Panoramic photography, Semiconducting wafers

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Proceedings Article | 16 March 2015 Paper

Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach

Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI

KEYWORDS: Multilayers, Waveguides, Chemical species, Inspection, Computer simulations, Transmission electron microscopy, Monte Carlo methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

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Proceedings Article | 8 April 2011 Paper

Photoresist shrinkage effects at EUV

Thomas Pistor, Thomas Wallow, Christopher Anderson, Patrick Naulleau

Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II

KEYWORDS: Lithography, Electron beams, Silicon, Distortion, 3D modeling, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Lanthanum, Current controlled current source

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Proceedings Article | 6 December 2010 Paper

Impact of substrate surface scratches on the laser damage resistance of multilayer coatings

S. Roger Qiu, Justin Wolfe, Anthony Monterrosa, William Steele, Nick Teslich, Michael Feit, Thomas Pistor, Christopher Stolz

Proc. SPIE. 7842, Laser-Induced Damage in Optical Materials: 2010

KEYWORDS: Mirrors, Multilayers, Silica, Etching, Laser induced damage, Dielectrics, Resistance, Optical coatings, Laser damage threshold, Surface finishing

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Proceedings Article | 31 December 2009 Paper

Modeling of light intensification by conical pits within multilayer high reflector coatings

S. Roger Qiu, Justin Wolfe, Anthony Monterrosa, Michael Feit, Thomas Pistor, Christopher Stolz

Proc. SPIE. 7504, Laser-Induced Damage in Optical Materials: 2009

KEYWORDS: Mirrors, Multilayers, Finite-difference time-domain method, Silica, Waveguides, Laser induced damage, Coating, Resistance, Computer simulations, High reflection coatings

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Proceedings Article | 10 June 2004 Paper

Electric-field enhancement by nodular defects in multilayer coatings irradiated at normal and 45° incidence

Christopher Stolz, Francois Genin, Thomas Pistor

Proc. SPIE. 5273, Laser-Induced Damage in Optical Materials: 2003

KEYWORDS: Multilayers, Silica, Polarization, Reflection, Laser induced damage, Optical coatings, Reflectivity, 3D modeling, Finite element methods, Panoramic photography

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Proceedings Article | 17 December 2003 Paper

Bias optimization through simulation for contact array pattern

Thomas Pistor, Ksenia Berger

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Cadmium, Computer simulations, 3D modeling, 3D metrology, Finite element methods, Photomasks, Critical dimension metrology, Panoramic photography, Semiconducting wafers, 3D image processing

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Proceedings Article | 16 July 2002 Paper

Rigorous electromagnetic simulation of stepper alignment

Thomas Pistor, Robert Socha

Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI

KEYWORDS: Thin films, Finite-difference time-domain method, Polarization, Reflection, Scattering, Optical alignment, Semiconducting wafers, Binary data, Electromagnetic simulation, Chemical mechanical planarization

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Proceedings Article | 11 March 2002 Paper

Rigorous 3D simulation of phase defects in alternating phase-shifting masks

Thomas Pistor

Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology

KEYWORDS: Scattering, Etching, Quartz, Inspection, Printing, Photoresist materials, Photomasks, Visibility, Phase shifts, Defect inspection

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Proceedings Article | 14 September 2001 Paper

Rigorous electromagnetic simulation applied to alignment systems

Yunfei Deng, Thomas Pistor, Andrew Neureuther

Proc. SPIE. 4346, Optical Microlithography XIV

KEYWORDS: Diffraction, Refractive index, Polarization, Silicon, Wave propagation, Nanoimprint lithography, Optical alignment, Analytical research, Semiconducting wafers, Electromagnetic simulation

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Proceedings Article | 14 September 2001 Paper

Accuracy issues in the finite difference time domain simulation of photomask scattering

Thomas Pistor

Proc. SPIE. 4346, Optical Microlithography XIV

KEYWORDS: Thin films, Finite-difference time-domain method, Scattering, Quartz, Reflectivity, Computing systems, Photomasks, Electromagnetic simulation, Electromagnetic scattering, Phase shifts

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Proceedings Article | 14 September 2001 Paper

LAVA web-based remote simulation: enhancements for education and technology innovation

Sang Il Lee, Ka Chun Ng, Takashi Orimoto, Jason Pittenger, Toshi Horie, Konstantinos Adam, Mosong Cheng, Ebo Croffie, Yunfei Deng, Frank Gennari, Thomas Pistor, Garth Robins, Mike Williamson, Bo Wu, Lei Yuan, Andrew Neureuther

Proc. SPIE. 4346, Optical Microlithography XIV

KEYWORDS: Human-machine interfaces, Lithography, Etching, Diffusion, Computer simulations, Printing, Near field, Java, Photomasks, Optical simulations

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Proceedings Article | 5 September 2001 Paper

Simulation of image quality issues at low k1 for 100-nm lithography

Andrew Neureuther, Konstantinos Adam, Shoji Hotta, Thomas Pistor, Garth Robins, Yunfei Deng

Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII

KEYWORDS: Lithography, Monochromatic aberrations, Quartz, Printing, Image quality, Near field, Photomasks, Extreme ultraviolet, Spherical lenses, Phase shifts

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Proceedings Article | 5 September 2001 Paper

Atomic force metrology and 3D modeling of microtrenching in etched photomask features

Bradley Todd, Kirk Miller, Thomas Pistor

Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII

KEYWORDS: Lithography, Metrology, Etching, Quartz, 3D modeling, Atomic force microscopy, Photomasks, Wet etching, Reactive ion etching, Phase shifts

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Proceedings Article | 22 August 2001 Paper

Atomic force metrology and 3D modeling of microtrenching in etched photomask features

Bradley Todd, Edward Miller, Thomas Pistor

Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV

KEYWORDS: Lithography, Metrology, Etching, Quartz, Manufacturing, Atomic force microscopy, Photomasks, Reactive ion etching, Optics manufacturing, Phase shifts

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With the acceptance of etched phase shift photomasks by most major semiconductor manufacturers, it is necessary to build a significant number of these masks in a cost-effective and controlled manner. Optical methods of metrology used for many years in the photomask industry for binary masks are unsuitable for certain metrology applications related to etched phase shift photomask manufacture and repair. Atomic Force Metrology (AFM), Scanning Electron Microscope (SEM) metrology and optical methods, in combination, are now providing the necessary metrology tools to characterize etched phase shift masks and generate metrology for phase defect repair. Modeling methods such as electromagnetic modeling (EM) are providing insight into the effect of non- ideal processing on the final printed wafer image and the aerial image presented by a lithography system. This paper uses AFM metrology and EM modeling to explore the details of micro-trenching that occurs at the base of vertical walls on etched phase shift masks. Results of etch profiles obtained using AFM metrology are correlated with EM modeling of 320nm - 720nm etched structures in alternating aperture phase shift masks for use with KrF 4x reduction steppers. Three generically different etch processes were used to create the measured structures on six different masks. These six masks were manufactured by four different mask makers. The metrology and EM modeling results clearly differentiate each of the generic etch processes with the ICP + Iso etches showing 50% less micro-trenching relative to three of the four RIE-only etch processes. The simulation predicts the process window changes resulting from modeled micro-trenching relative to an ideal etch case. The models chosen for simulation represent the real etched results observed with the AFM. Comparisons of micro-trenching lengths measured during these experiments with the results of trenching bias across different etched space widths as reported by McCallum, et al. suggest that micro-trenching is a universal phenomenon occurring during quartz etches. It is proposed that micro- trenching more correctly defines the geometries responsible for trenching bias. Depth detail taken from the vicinity of an unusually shaped phase bump defect show the effect of local geometry on the extent to which trenching occurs. Trenching is more than 50% greater at the base of concave or acute defects as compared to convex defects. Further investigation of local trenching sheds light on the reason why phase bump defects near or touching a vertical trench wall appear more difficult to repair.

Proceedings Article | 20 August 2001 Paper

Models for characterizing the printability of buried EUV defects

Yunfei Deng, Thomas Pistor, Andrew Neureuther

Proc. SPIE. 4343, Emerging Lithographic Technologies V

KEYWORDS: Point spread functions, Data modeling, Scattering, Light scattering, 3D modeling, Near field, Photomasks, Extreme ultraviolet, Semiconducting wafers, Radio propagation

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Proceedings Article | 22 January 2001 Paper

Effects of shifter edge topography on through focus performance

Shoji Hotta, Thomas Pistor, Konstantinos Adam, Andrew Neureuther

Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Photomask technology

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Proceedings Article | 5 July 2000 Paper

Modeling oblique incidence effects in photomasks

Thomas Pistor, Andrew Neureuther, Robert Socha

Proc. SPIE. 4000, Optical Microlithography XIII

KEYWORDS: Polarization, Scattering, Inspection, 3D modeling, Photomasks, Optical proximity correction, Binary data, Electromagnetic simulation, Electromagnetic scattering, Phase shifts

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Proceedings Article | 25 June 1999 Paper

Calculating aerial images from EUV masks

Thomas Pistor, Andrew Neureuther

Proc. SPIE. 3676, Emerging Lithographic Technologies III

KEYWORDS: Diffraction, Mirrors, Coherence (optics), Imaging systems, Near field, Photomasks, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Semiconducting wafers

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Proceedings Article | 7 July 1997 Paper

Simulation of reflective notching with TEMPEST

Thomas Pistor, Andrew Neureuther

Proc. SPIE. 3051, Optical Microlithography X

KEYWORDS: Antireflective coatings, Polarization, Reflectivity, 3D printing, Printing

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Proceedings Article | 7 July 1997 Paper

Simulating photomask edge roughness and corner rounding

Konstantinos Adam, Robert Socha, Thomas Pistor, Andrew Neureuther

Proc. SPIE. 3050, Metrology, Inspection, and Process Control for Microlithography XI

KEYWORDS: Lithography, Deep ultraviolet, Imaging systems, Glasses, Computer simulations, Printing, Photomasks, Semiconducting wafers, Electromagnetism, Edge roughness

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Showing 5 of 23 publications

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