Dr. Thomas Scherübl
Head Field of Business Tuning and Strategy SMS at Carl Zeiss SMS Ltd
SPIE Involvement:
Conference Program Committee | Author
Publications (44)

Proceedings Article | 3 October 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Reticles, Optical lithography, Scanners, 3D modeling, Photomasks, Line width roughness, Critical dimension metrology, Semiconducting wafers, Failure analysis

Proceedings Article | 5 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Reticles, Metrology, Deep ultraviolet, Calibration, Databases, Image registration, Photomasks, Extreme ultraviolet, Overlay metrology

Proceedings Article | 5 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Image processing, Error analysis, Manufacturing, Reliability, Inspection, Image analysis, Image enhancement, Neodymium, Tolerancing, Back end of line

SPIE Journal Paper | 27 October 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Scanners, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Deep ultraviolet, Atomic force microscopy, Manufacturing

Proceedings Article | 17 October 2014 Paper
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Lithography, Lithographic illumination, Scanners, Ions, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Showing 5 of 44 publications
Conference Committee Involvement (19)
Photomask Technology
26 September 2021 | Monterey, California, United States
Photomask Technology
21 September 2020 | Online Only, California, United States
Photomask Technology
16 September 2019 | Monterey, California, United States
Photomask Technology
17 September 2018 | Monterey, California, United States
Photomask Technology
11 September 2017 | Monterey, California, United States
Showing 5 of 19 Conference Committees
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