Thomas Schmöller
Manager/Application Engineering at Synopsys GmbH
SPIE Involvement:
Publications (37)

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Data modeling, 3D modeling, Scanning electron microscopy, Source mask optimization, Computational lithography, Optical proximity correction, Optimization (mathematics), Photoresist processing

SPIE Journal Paper | 19 February 2016
JM3 Vol. 15 Issue 01
KEYWORDS: Optical lithography, Etching, Extreme ultraviolet lithography, Metals, Lithography, Critical dimension metrology, 3D modeling, Stochastic processes, Cadmium, Extreme ultraviolet

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Data modeling, Calibration, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Nanoimprint lithography, Photoresist processing, Stochastic processes

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Optical lithography, Cadmium, Etching, Metals, 3D modeling, Extreme ultraviolet, Extreme ultraviolet lithography, Stochastic processes, 3D vision

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Data modeling, Calibration, Etching, 3D modeling, Integrated modeling, Photomasks, Optical proximity correction, Photoresist processing, Semiconducting wafers

Showing 5 of 37 publications
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