Dr. Thuc Dam
Sr. Staff CAE at Synopsys Inc
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, Lithography, Extreme ultraviolet, Electroluminescence, Reflectivity, Critical dimension metrology, Light scattering

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Source mask optimization, Photomasks, Semiconducting wafers, Lithography, Nanoimprint lithography, Resolution enhancement technologies, Photovoltaics, Optical proximity correction, Optimization (mathematics), Scanning electron microscopy

Proceedings Article | 4 April 2017 Presentation + Paper
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Optical proximity correction, Optical lithography, Manufacturing, Photomasks, Semiconducting wafers, Atrial fibrillation, Source mask optimization, Image processing

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: 3D modeling, Optical proximity correction, Optical lithography, Data modeling, Computational lithography, Optimization (mathematics), Photoresist processing, Source mask optimization, Scanning electron microscopy

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Photomasks, Lithography, Source mask optimization, Photovoltaics, Calibration, Lens design, Process modeling, Performance modeling, Neck, Directed self assembly

Showing 5 of 26 publications
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