Dr. Tianming Bao Profile

Dr. Tianming Bao

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Publications (6)

Proceedings Article | 22 May 2009 Paper

Enabling accurate gate profile control with inline 3D-AFM

Tianming Bao, Andrew Lopez, Dean Dawson

Proceedings Volume 7378, 73781G (2009) https://doi.org/10.1117/12.824203

KEYWORDS: Metrology, 3D metrology, Line width roughness, Transmission electron microscopy, Etching, Critical dimension metrology, Line edge roughness, 3D modeling, Process control, Transistors

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Proceedings Article | 24 March 2009 Paper

Applications of AFM in semiconductor R&D and manufacturing at 45 nm technology node and beyond

Moon-Keun Lee, Minjung Shin, Tianming Bao, Chul-Gi Song, Dean Dawson, Dong-Chul Ihm, Vladimir Ukraintsev

Proceedings Volume 7272, 72722R (2009) https://doi.org/10.1117/12.813389

KEYWORDS: Metrology, Atomic force microscopy, Critical dimension metrology, Silicon, Transmission electron microscopy, Transistors, Photomasks, Process control, Image processing, Optical filters

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Proceedings Article | 1 December 2008 Paper

Improving sidewall profile metrology with enhanced 3D-AFM

Tianming Bao, Lars Mininni, Dean Dawson

Proceedings Volume 7140, 71400H (2008) https://doi.org/10.1117/12.804482

KEYWORDS: Metrology, Atomic force microscopy, Line width roughness, Line edge roughness, Scanners, Critical dimension metrology, Actuators, Silicon, Profiling, 3D metrology

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Proceedings Article | 25 March 2008 Paper

Improving dry etch control for contact plugs in advanced DRAM manufacturing

Tianming Bao, Yuval Bar, David Fong, Mukund Godbole

Proceedings Volume 6922, 69223G (2008) https://doi.org/10.1117/12.770789

KEYWORDS: Atomic force microscopy, Etching, Metrology, Semiconducting wafers, Dry etching, Process control, 3D metrology, Manufacturing, Scanning electron microscopy, Plasma etching

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Proceedings Article | 5 April 2007 Paper

Improved dimension and shape metrology with versatile atomic force microscopy

Mark Caldwell, Tianming Bao, John Hackenberg, Brian McLain, Omar Munoz, Tab Stephens, Victor Vartanian

Proceedings Volume 6518, 65181L (2007) https://doi.org/10.1117/12.708813

KEYWORDS: Atomic force microscopy, Etching, Critical dimension metrology, 3D metrology, Metrology, Copper, Semiconducting wafers, Scanning electron microscopy, Process control, Transmission electron microscopy

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Proceedings Article | 20 October 2006 Paper

Advanced CD AFM metrology for 3D critical shape and dimension control of photomask etch processing

Tianming Bao, Azeddine Zerrade

Proceedings Volume 6349, 63493Z (2006) https://doi.org/10.1117/12.684767

KEYWORDS: Atomic force microscopy, Critical dimension metrology, Photomasks, Etching, Metrology, Quartz, 3D metrology, Scanning electron microscopy, Process control, Silicon

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Showing 5 of 6 publications

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