Dr. Tim Fühner
R&D Engineer at Synopsys Inc
SPIE Involvement:
Author
Area of Expertise:
computational lithography , artificial intelligence , optimization
Websites:
Publications (37)

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Multilayers, Optical lithography, Data modeling, Atomic force microscopy, Photomasks, Extreme ultraviolet, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 19 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Scattering, Light scattering, Manufacturing, Near field, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 23 March 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Image segmentation, Interfaces, Manufacturing, Electroluminescence, Bridges, Photomasks, Directed self assembly, Critical dimension metrology, Optimization (mathematics)

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Polymethylmethacrylate, Cadmium, Polymers, Interfaces, Computer simulations, Monte Carlo methods, Directed self assembly, Molecular interactions, Critical dimension metrology

SPIE Journal Paper | 2 December 2013
JM3 Vol. 13 Issue 01
KEYWORDS: Photomasks, Diffraction, Artificial neural networks, Data modeling, Optical lithography, Systems modeling, Lithography, Polarization, Neurons, Optical simulations

Showing 5 of 37 publications
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