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Dr. Tim Helbig
at Carl Zeiss SMT GmbH
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Publications (1)
Proceedings Article | 11 November 2022 Presentation
Enabling process optimization for EUV phase shift masks using AIMS(R) EUV phase metrology
Renzo Capelli, Nathan Wilcox, Sven Krannich, Dinumol Devasia, Grizelda Kersteen, Arvind Sundaramurthy, Chang Ju Choi, Sandro Hoffmann, Zachary Rice, Patrick Straney, Klaus Gwosch, Markus Koch, Tim Helbig
Proceedings Volume PC12293, PC122930K (2022) https://doi.org/10.1117/12.2645004
KEYWORDS: Photomasks, Extreme ultraviolet, Metrology, Phase shifts, Semiconducting wafers, Phase measurement, Standards development, Scanners, Refraction, Product engineering
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