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Dr. Timothy Crimmins
at Intel Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (5)
Proceedings Article | 13 June 2022 Presentation
SEM inspection for logic yield development and control
Proceedings Volume PC12053, PC1205305 (2022) https://doi.org/10.1117/12.2619858
KEYWORDS: Logic, Scanning electron microscopy, Inspection, Defect detection, Semiconductor manufacturing, Semiconducting wafers, Optical inspection, Metrology, Control systems
Proceedings Article | 18 March 2016 Open Access Paper
EUV progress toward HVM readiness
Proceedings Volume 9776, 977602 (2016) https://doi.org/10.1117/12.2225014
KEYWORDS: Extreme ultraviolet, Reticles, Pellicles, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Optical lithography, Inspection, Yield improvement
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Proceedings Article | 4 April 2012 Paper
Transistor architecture impact on wafer inspection
Proceedings Volume 8324, 83240C (2012) https://doi.org/10.1117/12.917009
KEYWORDS: Inspection, Transistors, Diffusion, Metals, Optical lithography, Wafer inspection, Neodymium, Signal processing, Polarization, Silicon
Proceedings Article | 20 April 2011 Paper
Wafer noise models for defect inspection
Proceedings Volume 7971, 79710E (2011) https://doi.org/10.1117/12.879477
KEYWORDS: Line edge roughness, Semiconducting wafers, Signal to noise ratio, Monte Carlo methods, Critical dimension metrology, Interference (communication), Wafer inspection, Inspection, Logic, Surface roughness
Proceedings Article | 2 April 2010 Paper
Defect metrology challenges at the 11-nm node and beyond
Proceedings Volume 7638, 76380H (2010) https://doi.org/10.1117/12.846623
KEYWORDS: Inspection, Scattering, Microscopy, Super resolution, Bridges, Semiconducting wafers, Defect inspection, Deep ultraviolet, Light scattering, Metrology
Conference Committee Involvement (14)
Metrology, Inspection, and Process Control XXXIX
23 February 2025 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVIII
26 February 2024 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVII
27 February 2023 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVI
25 April 2022 | San Jose, California, United States
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
22 February 2021 | Online Only, California, United States
Showing 5 of 14 Conference Committees
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